公开(公告)号：US20210381568A1

公开(公告)日：2021-12-09

申请号：US17410740

申请日：2021-08-24

Applicant: GOODRICH CORPORATION

Inventor： Peter A. T. Cocks ,  Thomas P. Filburn ,  Ying She ,  Haralambos Cordatos ,  Zissis A. Dardas ,  William P. May

IPC: F16D65/853 ,  B64C25/42

Abstract: A system, and associated method, for reducing oxidation of a friction disk may include a braking assembly comprising the friction disk and a coolant loop coupled to the braking assembly, with the coolant loop being configured to circulate liquid coolant from the braking assembly. That is, the coolant loop may be configured to reduce the temperature of the braking assembly, thus reducing the rate/extent of oxidation of the friction disks and potentially enabling the concentration of oxygen around the braking assembly to be reduced.

公开(公告)号：US10752988B2

公开(公告)日：2020-08-25

申请号：US16164315

申请日：2018-10-18

Applicant: Goodrich Corporation

Inventor： Ying She ,  Brian St. Rock

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/455 ,  C23C16/458 ,  C04B35/83 ,  C23C16/52 ,  F16D65/12

Abstract: A system and method for enhancing a diffusion limited CVI/CVD process is provided. The system may densify a porous structure by flowing a reactant gas around the porous structure. A mass flow controller may be configured to pulse the flow rate of the reactant gas around the porous structure. The mass flow controller may pulse the flow rate from a nominal flow rate to a first flow rate. The mass flow controller may pulse the first flow rate back to the nominal flow rate or to a second flow rate. The mass flow controller may pulse the flow rate between the nominal flow rate, the first flow rate, and the second flow rate, as desired.

公开(公告)号：US10480065B2

公开(公告)日：2019-11-19

申请号：US15709338

申请日：2017-09-19

Applicant: GOODRICH CORPORATION

Inventor： Ying She ,  Naveen G. Menon ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Xiaodan Cai

IPC: C23F1/00 ,  H01L21/306 ,  C23C16/04 ,  C23C16/32 ,  C23C16/44 ,  C04B35/80 ,  C04B35/628 ,  C23C16/455

Abstract: A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

公开(公告)号：US10465282B2

公开(公告)日：2019-11-05

申请号：US15941570

申请日：2018-03-30

Applicant: GOODRICH CORPORATION

Inventor： James Warren Rudolph ,  Ying She ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Brian St. Rock ,  John Linck

IPC: C23C16/04 ,  C23C16/455 ,  C04B35/83 ,  C23C16/52

Abstract: A process for densifying an annular porous structure comprising flowing a reactant gas into an inner diameter (ID) volume and through an ID surface of the annular porous structure, flowing the reactant gas through an outer diameter (OD) surface of the annular porous structure and into an OD volume, flowing the reactant gas from the OD volume through the OD surface of the annular porous structure, and flowing the reactant gas through an ID surface of the annular porous structure and into the ID volume.

公开(公告)号：US20190048462A1

公开(公告)日：2019-02-14

申请号：US16164315

申请日：2018-10-18

Applicant: Goodrich Corporation

Inventor： Ying She ,  Brian St. Rock

IPC: C23C16/04 ,  F16D65/12 ,  C23C16/52 ,  C23C16/458 ,  C23C16/455 ,  C23C16/26 ,  C04B35/83

CPC classification number: C23C16/045 ,  C04B35/83 ,  C04B2235/614 ,  C23C16/26 ,  C23C16/45502 ,  C23C16/45523 ,  C23C16/4557 ,  C23C16/4581 ,  C23C16/4583 ,  C23C16/52 ,  F16D65/126

Abstract: A system and method for enhancing a diffusion limited CVI/CVD process is provided. The system may densify a porous structure by flowing a reactant gas around the porous structure. A mass flow controller may be configured to pulse the flow rate of the reactant gas around the porous structure. The mass flow controller may pulse the flow rate from a nominal flow rate to a first flow rate. The mass flow controller may pulse the first flow rate back to the nominal flow rate or to a second flow rate. The mass flow controller may pulse the flow rate between the nominal flow rate, the first flow rate, and the second flow rate, as desired.

公开(公告)号：US11713281B2

公开(公告)日：2023-08-01

申请号：US17557902

申请日：2021-12-21

Applicant: GOODRICH CORPORATION

Inventor： Ying She ,  Naveen Menon ,  Gavin Charles Richards ,  Zissis A. Dardas ,  Thomas P. Filburn

IPC: C04B35/80 ,  C23C16/455 ,  C23C16/44 ,  C04B35/565 ,  C23C16/32 ,  C23C16/04

CPC classification number: C04B35/80 ,  C04B35/565 ,  C23C16/045 ,  C23C16/325 ,  C23C16/4412 ,  C23C16/45517 ,  C04B2235/46 ,  C04B2235/5244 ,  C04B2235/5248 ,  C04B2235/614

Abstract: Systems for and methods of manufacturing a ceramic matrix composite include introducing a gaseous precursor into an inlet portion of a reaction furnace having a chamber comprising the inlet portion and an outlet portion that is downstream of the inlet portion, and delivering a mitigation agent, such as water vapor or ammonia, into an exhaust conduit in fluid communication with and downstream of the outlet portion of the reaction chamber so as to control chemical reactions occurring with the exhaust chamber. Introducing the gaseous precursor densifies a porous preform, and introducing the mitigation agent shifts the reaction equilibrium to disfavor the formation of harmful and/or pyrophoric byproduct deposits within the exhaust conduit.

公开(公告)号：US11629767B2

公开(公告)日：2023-04-18

申请号：US17410740

申请日：2021-08-24

Applicant: GOODRICH CORPORATION

Inventor： Peter A. T. Cocks ,  Thomas P Filburn ,  Ying She ,  Haralambos Cordatos ,  Zissis A. Dardas ,  William P. May

IPC: F16D65/853 ,  B64C25/42 ,  F16D65/78 ,  F16D121/02

Abstract: A system, and associated method, for reducing oxidation of a friction disk may include a braking assembly comprising the friction disk and a coolant loop coupled to the braking assembly, with the coolant loop being configured to circulate liquid coolant from the braking assembly. That is, the coolant loop may be configured to reduce the temperature of the braking assembly, thus reducing the rate/extent of oxidation of the friction disks and potentially enabling the concentration of oxygen around the braking assembly to be reduced.

公开(公告)号：US11584987B2

公开(公告)日：2023-02-21

申请号：US16927843

申请日：2020-07-13

Applicant: Goodrich Corporation

Inventor： Ying She ,  Brian St. Rock

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/455 ,  C23C16/458 ,  C04B35/83 ,  C23C16/52 ,  F16D65/12

Abstract: A system and method for enhancing a diffusion limited CVI/CVD process is provided. The system may densify a porous structure by flowing a reactant gas around the porous structure. A mass flow controller may be configured to pulse the flow rate of the reactant gas around the porous structure. The mass flow controller may pulse the flow rate from a nominal flow rate to a first flow rate. The mass flow controller may pulse the first flow rate back to the nominal flow rate or to a second flow rate. The mass flow controller may pulse the flow rate between the nominal flow rate, the first flow rate, and the second flow rate, as desired.

公开(公告)号：US10975467B2

公开(公告)日：2021-04-13

申请号：US16598843

申请日：2019-10-10

Applicant: GOODRICH CORPORATION

Inventor： Ying She ,  Naveen G. Menon ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Xiaodan Cai

IPC: C23C16/04 ,  C23C16/32 ,  C23C16/44 ,  C04B35/80 ,  C04B35/628 ,  C23C16/455

Abstract: A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

公开(公告)号：US20200340104A1

公开(公告)日：2020-10-29

申请号：US16927843

申请日：2020-07-13

Applicant: Goodrich Corporation

Inventor： Ying She ,  Brian St. Rock

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/455 ,  C23C16/458 ,  C04B35/83 ,  C23C16/52 ,  F16D65/12

Abstract: A system and method for enhancing a diffusion limited CVI/CVD process is provided. The system may densify a porous structure by flowing a reactant gas around the porous structure. A mass flow controller may be configured to pulse the flow rate of the reactant gas around the porous structure. The mass flow controller may pulse the flow rate from a nominal flow rate to a first flow rate. The mass flow controller may pulse the first flow rate back to the nominal flow rate or to a second flow rate. The mass flow controller may pulse the flow rate between the nominal flow rate, the first flow rate, and the second flow rate, as desired.