公开(公告)号：US20200371442A1

公开(公告)日：2020-11-26

申请号：US16989328

申请日：2020-08-10

Applicant: Gigaphoton Inc.

Inventor： Yoshiyuki HONDA

IPC: G03F7/20 ,  H05G2/00 ,  G02B5/08 ,  G02B1/14

Abstract: An extreme ultraviolet light generation apparatus includes: a chamber having an internal space in which a laser beam is condensed and plasma generation occurs at a focusing position of the laser beam; a condensing mirror configured to condense extreme ultraviolet light generated through the plasma generation; and a magnetic field generation unit configured to generate a magnetic field. The condensing mirror includes a substrate, a reflective layer, and a protective layer. The protective layer includes a first protective layer disposed in a first region, and a second protective layer disposed in a second region. A material of the first protective layer is less dense than a material of the second protective layer. The material of the second protective layer has a transmittance for the extreme ultraviolet light higher than that of the material of the first protective layer.