11.
    发明专利
    未知

    公开(公告)号:DE1764241A1

    公开(公告)日:1972-04-27

    申请号:DE1764241

    申请日:1968-04-30

    Abstract: 1,245,368. Semiconductor devices. INTERNATIONAL BUSINESS MACHINES CORP. 28 March, 1969 [30 April, 1968], No. 16392/69. Heading H1K. [Also in Division H3] In a monolithic integrated circuit two transistors are formed in a common epitaxial region, which forms a part of each transistor, by means of separate diffused regions, the transistors being connected in a circuit so that in operation the common region functions as the emitter of at least one of the transistors. The transistors are formed simultaneously by diffusing P-type base regions into an N-type epitaxial layer on a P+-type substrate, the epitaxial layer being divided into islands by a P-type isolation diffusion. N-type regions are diffused into the base regions and form the emitters of normally poled transistors and the collectors of inversely poled transistors. The inversely poled transistors exhibit a low gain which may be less than unity if the circuit is gold doped. A memory cell, Fig. 3, comprises five transistors T1 to T5 and two resistors R1 and R2, two of the transistors T3, T4, forming a bi-stable multivibrator, being arranged in a single island and operated so that the common region functions as their emitters, and the other three transistors T1, T2, T5, forming addressing, reading and writing components, being arranged in a second island and operated so that the common region forms the emitters of two of the transistors T1, T2 and the collector of the third transistor T5.

    MONOLITHIC ELECTRIC CIRCUIT
    13.
    发明专利

    公开(公告)号:GB1245368A

    公开(公告)日:1971-09-08

    申请号:GB1639269

    申请日:1969-03-28

    Applicant: IBM

    Abstract: 1,245,368. Semiconductor devices. INTERNATIONAL BUSINESS MACHINES CORP. 28 March, 1969 [30 April, 1968], No. 16392/69. Heading H1K. [Also in Division H3] In a monolithic integrated circuit two transistors are formed in a common epitaxial region, which forms a part of each transistor, by means of separate diffused regions, the transistors being connected in a circuit so that in operation the common region functions as the emitter of at least one of the transistors. The transistors are formed simultaneously by diffusing P-type base regions into an N-type epitaxial layer on a P+-type substrate, the epitaxial layer being divided into islands by a P-type isolation diffusion. N-type regions are diffused into the base regions and form the emitters of normally poled transistors and the collectors of inversely poled transistors. The inversely poled transistors exhibit a low gain which may be less than unity if the circuit is gold doped. A memory cell, Fig. 3, comprises five transistors T1 to T5 and two resistors R1 and R2, two of the transistors T3, T4, forming a bi-stable multivibrator, being arranged in a single island and operated so that the common region functions as their emitters, and the other three transistors T1, T2, T5, forming addressing, reading and writing components, being arranged in a second island and operated so that the common region forms the emitters of two of the transistors T1, T2 and the collector of the third transistor T5.

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