中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

16 records (took 0.017 seconds)

    WAFER INDEXING SYSTEM
    12.
    发明专利
    WAFER INDEXING SYSTEM 未知

    公开(公告)号：CA1117653A

    公开(公告)日：1982-02-02

    申请号：CA292298

    申请日：1977-12-02

    Applicant: IBM

    Inventor： VOGEL MARCEL J ,  VOGEL SIEGFRIED F

    IPC: G11C11/14 ,  G01B3/02 ,  G01B11/30 ,  G01N27/04 ,  G01N27/20 ,  G03F7/20 ,  H01F10/00 ,  H01L23/544

    Abstract: WAFER INDEXING SYSTEM A wafer indexing and mapping system is useful for precisely locating artifacts, defects, and fabricated structural components on a wafer. A permanent micrometer grid pattern is applied to the backside of the wafer, for example, a transparent bubble wafer. The grid pattern forms an array of uniform size cells, for example, 40 unit cells wide by 40 unit cells long. Each unit cell is divided into smaller units on each side. Each cell contains a coding or indexing system to identify the row and column of the cell in the grid pattern. The grid pattern contains orientation bars which identify orientation with respect to particular wafer reference lines. The simultaneous viewing of the wafer and the grid pattern permits an accurate permanent mapping of the artifacts, defects, and fabricated structural components on the wafer, as well as on the individual small chips formed by dicing the wafer.

    13.
    发明专利
    未知

    公开(公告)号：FR2385103A1

    公开(公告)日：1978-10-20

    申请号：FR7804189

    申请日：1978-02-08

    Applicant: IBM

    Inventor： VOGEL MARCEL J ,  VOGEL SIEGFRIED F

    IPC: G11C11/14 ,  G01B3/02 ,  G01B11/30 ,  G01N27/04 ,  G01N27/20 ,  G03F7/20 ,  H01F10/00 ,  H01L23/544 ,  G01R31/26 ,  H01L21/66

    Abstract: A wafer indexing and mapping system is useful for precisely locating artifacts, defects, and fabricated structural components on a wafer. A permanent micrometer grid pattern is applied to the backside of the wafer, for example, a transparent bubble wafer. The grid pattern forms an array of uniform size cells, for example, 40 unit cells wide by 40 unit cells long. Each unit cell is divided into smaller units on each side. Each cell contains a coding or indexing system to identify the row and column of the cell in the grid pattern. The grid pattern contains orientation bars which identify orientation with respect to particular wafer reference lines. The simultaneous viewing of the wafer and the grid pattern permits an accurate permanent mapping of the artifacts, defects, and fabricated structural components on the wafer, as well as on the individual small chips formed by dicing the wafer.

Patent Agency Ranking