公开(公告)号：WO2010104651A1

公开(公告)日：2010-09-16

申请号：PCT/US2010/024344

申请日：2010-02-17

Applicant: IMRA AMERICA, INC. ,  LIU, Bing ,  HU, Zhendong ,  MURAKAMI, Makoto ,  XU, Jingzhou ,  CHE, Yong

Inventor： LIU, Bing ,  HU, Zhendong ,  MURAKAMI, Makoto ,  XU, Jingzhou ,  CHE, Yong

IPC: B23K26/00

CPC classification number: C23C20/04 ,  B41M5/262 ,  B41M5/267 ,  B44F1/10 ,  C23C14/28 ,  C23C14/3435 ,  G02B26/101 ,  Y10T428/24802 ,  Y10T428/24917

Abstract: A method of forming patterns on transparent substrates using a pulsed laser is disclosed. Various embodiments include an ultrashort pulsed laser, a substrate that is transparent to the laser wavelength, and a target plate. The laser beam is guided through the transparent substrate and focused on the target surface. The target material is ablated by the laser and is deposited on the opposite substrate surface. A pattern, for example a gray scale image, is formed by scanning the laser beam relative to the target. Variations of the laser beam scan speed and scan line density control the material deposition and change the optical properties of the deposited patterns, creating a visual effect of gray scale. In some embodiments patterns may be formed on a portion of a microelectronic device during a fabrication process. In some embodiments high repetition rate picoseconds and nanosecond sources are configured to produce the patterns.

Abstract translation: 公开了使用脉冲激光在透明基板上形成图案的方法。 各种实施例包括超短脉冲激光器，对激光波长透明的衬底和靶板。 激光束被引导通过透明基板并聚焦在目标表面上。 目标材料被激光烧蚀并沉积在相对的基板表面上。 通过相对于目标扫描激光束来形成例如灰度图像的图案。 激光束扫描速度和扫描线密度的变化控制材料沉积并改变沉积图案的光学性质，产生灰度的视觉效果。 在一些实施例中，可以在制造过程期间在微电子器件的一部分上形成图案。 在一些实施例中，高重复率皮秒和纳秒源被配置为产生图案。

公开(公告)号：WO2008118533A2

公开(公告)日：2008-10-02

申请号：PCT/US2008/052544

申请日：2008-01-31

Applicant: IMRA AMERICA, INC. ,  HU, Zhendong ,  CHE, Yong ,  LIU, Bing

Inventor： HU, Zhendong ,  CHE, Yong ,  LIU, Bing

IPC: C23C14/26

CPC classification number: C30B23/08 ,  C23C14/083 ,  C23C14/28 ,  C30B29/16

Abstract: A one-step and room-temperature process for depositing nanoparticles or nanocomposite (nanoparticle-assembled) films of metal oxides such as crystalline titanium dioxide (TiO 2 ) onto a substrate surface using ultrafast pulsed laser ablation of Titania or metal titanium target. The system includes a pulsed laser with a pulse duration ranging from a few femtoseconds to a few tens of picoseconds, an optical setup for processing the laser beam such that the beam is focused onto the target surface with an appropriate average energy density and an appropriate energy density distribution, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.

Abstract translation: 用于将金属氧化物如结晶二氧化钛（TiO 2）的纳米粒子或纳米复合材料（纳米粒子组装）膜沉积到基底上的一步和室温方法 表面使用超快脉冲激光烧蚀二氧化钛或金属钛靶。 该系统包括具有从几飞秒到几十皮秒的脉冲持续时间的脉冲激光器，用于处理激光束的光学装置，使得光束以适当的平均能量密度和适当的能量聚焦到目标表面上 密度分布，还有一个真空室，其中安装了靶材和基材，并适当调节背景气体及其压力。

公开(公告)号：EP1767070A2

公开(公告)日：2007-03-28

申请号：EP05759377.4

申请日：2005-06-09

Applicant: Imra America, Inc.

Inventor： CHE, Yong ,  HU, Zhendong

IPC: H05H1/24

CPC classification number: C23C14/28 ,  C23C14/086 ,  H01M4/0426 ,  H01M6/40 ,  H01M10/0472 ,  H01M10/058

Abstract: A method of fabricating a multi-layered thin film electrochemical device is provided. The method comprises: providing a first target material in a chamber; providing a substrate in the chamber; emitting a first intermittent laser beam directed at the first target material to generate a first plasma, wherein each pulse of the first intermittent laser beam has a pulse duration of about 20 fs to about 500 ps; depositing the first plasma on the substrate to form a first thin film; providing a second target material in the chamber; emitting a second intermittent laser beam directed at the second target material to generate a second plasma, wherein each pulse of the second intermittent laser beam has a pulse duration of about 20 fs to about 500 ps; and depositing the second plasma on or above the first thin film to form a second thin film.

公开(公告)号：EP2391455A1

公开(公告)日：2011-12-07

申请号：EP09839437.2

申请日：2009-03-19

Applicant: Imra America, Inc.

Inventor： LIU, Bing ,  HU, Zhendong ,  MURAKAMI, Makoto ,  CHE, Yong

IPC: B02C19/00

CPC classification number: B02C19/18 ,  B01J13/0043 ,  B01J19/121 ,  B22F1/0022 ,  B22F9/04 ,  B22F2999/00 ,  B82Y30/00 ,  B22F2202/11

Abstract: Various embodiments include a method of producing chemically pure and stably dispersed metal and metal-alloy nanoparticle colloids with ultrafast pulsed laser ablation. A method comprises irradiating a metal or metal alloy target submerged in a liquid with ultrashort laser pulses at a high repetition rate, cooling a portion of the liquid that includes an irradiated region, and collecting nanoparticles produced with the laser irradiation and liquid cooling. The method may be implemented with a high repetition rate ultrafast pulsed laser source, an optical system for focusing and moving the pulsed laser beams, a metal or metal alloy target submerged in a liquid, and a liquid circulating system to cool the laser focal volume and collect the nanoparticle products. By controlling various laser parameters, and with optional liquid flow movement, the method provides stable colloids of dispersed metal and metal-alloy nanoparticles. In various embodiments additional stabilizing chemical agents are not required.

公开(公告)号：EP2109694A2

公开(公告)日：2009-10-21

申请号：EP08799669.0

申请日：2008-01-31

Applicant: Imra America, Inc.

Inventor： HU, Zhendong ,  CHE, Yong ,  LIU, Bing

IPC: C23C20/04

CPC classification number: C30B23/08 ,  C23C14/083 ,  C23C14/28 ,  C30B29/16

Abstract: A one-step and room-temperature process for depositing nanoparticles or nanocomposite (nanoparticle-assembled) films of metal oxides such as crystalline titanium dioxide (TiO2) onto a substrate surface using ultrafast pulsed laser ablation of Titania or metal titanium target. The system includes a pulsed laser with a pulse duration ranging from a few femtoseconds to a few tens of picoseconds, an optical setup for processing the laser beam such that the beam is focused onto the target surface with an appropriate average energy density and an appropriate energy density distribution, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.

公开(公告)号：EP2391455B1

公开(公告)日：2018-05-09

申请号：EP09839437.2

申请日：2009-03-19

Applicant: Imra America, Inc.

Inventor： LIU, Bing ,  HU, Zhendong ,  MURAKAMI, Makoto ,  CHE, Yong

IPC: B02C19/00

CPC classification number: B02C19/18 ,  B01J13/0043 ,  B01J19/121 ,  B22F1/0022 ,  B22F9/04 ,  B22F2999/00 ,  B82Y30/00 ,  B22F2202/11

Abstract: Various embodiments include a method of producing chemically pure and stably dispersed metal and metal-alloy nanoparticle colloids with ultrafast pulsed laser ablation. A method comprises irradiating a metal or metal alloy target submerged in a liquid with ultrashort laser pulses at a high repetition rate, cooling a portion of the liquid that includes an irradiated region, and collecting nanoparticles produced with the laser irradiation and liquid cooling. The method may be implemented with a high repetition rate ultrafast pulsed laser source, an optical system for focusing and moving the pulsed laser beams, a metal or metal alloy target submerged in a liquid, and a liquid circulating system to cool the laser focal volume and collect the nanoparticle products. By controlling various laser parameters, and with optional liquid flow movement, the method provides stable colloids of dispersed metal and metal-alloy nanoparticles. In various embodiments additional stabilizing chemical agents are not required.

公开(公告)号：EP2274771B1

公开(公告)日：2015-07-15

申请号：EP09758837.0

申请日：2009-03-11

Applicant: Imra America, Inc.

Inventor： MURAKAMI, Makoto ,  HU, Zhendong ,  LIU, Bing ,  CHE, Yong ,  LIU, Zhenlin ,  UEHARA, Yuzuru

IPC: H01L21/44 ,  C23C14/28 ,  C23C14/08 ,  H01S3/00 ,  H01S3/23 ,  C23C14/56

CPC classification number: C23C14/28 ,  C23C14/08 ,  C23C14/564 ,  H01S3/0057 ,  H01S3/0085 ,  H01S3/2308

公开(公告)号：EP2109694B1

公开(公告)日：2013-06-26

申请号：EP08799669.0

申请日：2008-01-31

Applicant: Imra America, Inc.

Inventor： HU, Zhendong ,  CHE, Yong ,  LIU, Bing

IPC: C23C20/04 ,  C23C20/02

CPC classification number: C30B23/08 ,  C23C14/083 ,  C23C14/28 ,  C30B29/16

公开(公告)号：EP2274771A1

公开(公告)日：2011-01-19

申请号：EP09758837.0

申请日：2009-03-11

Applicant: Imra America, Inc.

Inventor： MURAKAMI, Makoto ,  HU, Zhendong ,  LIU, Bing ,  CHE, Yong ,  LIU, Zhenlin ,  UEHARA, Yuzuru

IPC: H01L21/44

CPC classification number: C23C14/28 ,  C23C14/08 ,  C23C14/564 ,  H01S3/0057 ,  H01S3/0085 ,  H01S3/2308

Abstract: A method of pulsed laser deposition (PLD) capable of continuously tuning formed-film morphology from that of a nanoparticle aggregate to a smooth thin film free of particles and droplets. The materials that can be synthesized using various embodiments of the invention include, but are not limited to, metals, alloys, metal oxides, and semiconductors. In various embodiments a 'burst' mode of ultrashort pulsed laser ablation and deposition is provided. Tuning of the film morphology is achieved by controlling the burst-mode parameters such as the number of pulses and the time-spacing between the pulses within each burst, the burst repetition rate, and the laser fluence. The system includes an ultrashort pulsed laser, an optical system for delivering a focused onto the target surface with an appropriate energy density, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.