公开(公告)号：US20200025801A1

公开(公告)日：2020-01-23

申请号：US16586763

申请日：2019-09-27

Applicant: Intel Corporation

Inventor： Pooya Tadayon ,  Mark Bohr ,  Joe Walczyk

IPC: G01R1/073 ,  H01L23/14 ,  G01R31/28 ,  H01L21/027 ,  H01L21/48 ,  H01L23/32 ,  H01L23/48

Abstract: An electrical-test apparatus is provided, which includes a MEMS array. In an example, the MEMS array comprises a plurality of tester interconnect structures cantilevered from first terminals on a first side of a substrate. The tester interconnect structures may have a first diameter. In an example, the MEMS array comprises a plurality of through-substrate vias that extend through the substrate, the vias having a second diameter larger than the first diameter. In an example, individual ones of the vias electrically couple individual ones of the tester interconnect structures to corresponding ones of second terminals on a second side of the substrate.

公开(公告)号：US10192783B2

公开(公告)日：2019-01-29

申请号：US15266819

申请日：2016-09-15

Applicant: Intel Corporation

Inventor： Abhijit Jayant Pethe ,  Tahir Ghani ,  Mark Bohr ,  Clair Webb ,  Harry Gomez ,  Annalisa Cappellani

IPC: H01L21/70 ,  H01L21/768 ,  H01L29/66 ,  H01L29/78 ,  H01L21/28 ,  H01L21/311 ,  H01L23/522 ,  H01L23/532

Abstract: Gate contact structures disposed over active portions of gates and methods of forming such gate contact structures are described. For example, a semiconductor structure includes a substrate having an active region and an isolation region. A gate structure has a portion disposed above the active region and a portion disposed above the isolation region of the substrate. Source and drain regions are disposed in the active region of the substrate, on either side of the portion of the gate structure disposed above the active region. A gate contact structure is disposed on the portion of the gate structure disposed above the active region of the substrate.

公开(公告)号：US09831306B2

公开(公告)日：2017-11-28

申请号：US15024750

申请日：2013-12-19

Applicant: INTEL CORPORATION

Inventor： Milton Clair Webb ,  Mark Bohr ,  Tahir Ghani ,  Szuya S. Liao

IPC: H01L29/06 ,  H01L29/66 ,  H01L29/78 ,  H01L21/768 ,  H01L21/8238 ,  H01L23/535 ,  H01L27/092 ,  H01L29/417

CPC classification number: H01L29/0649 ,  H01L21/76895 ,  H01L21/823821 ,  H01L21/823878 ,  H01L23/535 ,  H01L27/0924 ,  H01L29/41791 ,  H01L29/66545 ,  H01L29/66795 ,  H01L29/785

Abstract: Self-aligned gate edge and local interconnect structures and methods of fabricating self-aligned gate edge and local interconnect structures are described. In an example, a semiconductor structure includes a semiconductor fin disposed above a substrate and having a length in a first direction. A gate structure is disposed over the semiconductor fin, the gate structure having a first end opposite a second end in a second direction, orthogonal to the first direction. A pair of gate edge isolation structures is centered with the semiconductor fin. A first of the pair of gate edge isolation structures is disposed directly adjacent to the first end of the gate structure, and a second of the pair of gate edge isolation structures is disposed directly adjacent to the second end of the gate structure.

公开(公告)号：US12278144B2

公开(公告)日：2025-04-15

申请号：US17211757

申请日：2021-03-24

Applicant: Intel Corporation

Inventor： Abhijit Jayant Pethe ,  Tahir Ghani ,  Mark Bohr ,  Clair Webb ,  Harry Gomez ,  Annalisa Cappellani

IPC: H01L21/768 ,  H01L21/28 ,  H01L21/311 ,  H01L23/522 ,  H01L23/532 ,  H01L29/66 ,  H01L29/78

Abstract: Gate contact structures disposed over active portions of gates and methods of forming such gate contact structures are described. For example, a semiconductor structure includes a substrate having an active region and an isolation region. A gate structure has a portion disposed above the active region and a portion disposed above the isolation region of the substrate. Source and drain regions are disposed in the active region of the substrate, on either side of the portion of the gate structure disposed above the active region. A gate contact structure is disposed on the portion of the gate structure disposed above the active region of the substrate.

公开(公告)号：US11749663B2

公开(公告)日：2023-09-05

申请号：US17742205

申请日：2022-05-11

Applicant: Intel Corporation

Inventor： Wilfred Gomes ,  Mark Bohr ,  Glenn J. Hinton ,  Rajesh Kumar

IPC: H01L21/00 ,  H01L25/18 ,  H01L23/48 ,  H01L23/538 ,  H01L23/00 ,  H01L25/065

CPC classification number: H01L25/18 ,  H01L23/481 ,  H01L23/5386 ,  H01L24/13 ,  H01L24/81 ,  H01L25/0652 ,  H01L2924/1431 ,  H01L2924/1436

Abstract: Techniques and mechanisms for providing interconnected circuitry of an integrated circuit (IC) die stack. In an embodiment, first integrated circuitry of a first IC die is configured to couple, via a first interconnects of the first IC die, to second integrated circuitry of a second IC die. When the first IC die and the second IC die are coupled to one another, second interconnects of the first IC die are further coupled to the second integrated circuitry, wherein the second interconnects are coupled to each of two opposite sides of the first IC die. In another embodiment, the second integrated circuitry includes processor logic, and the first integrated circuitry is configured to cache data for access by the processor logic. In another embodiment, the first integrated circuitry includes a power delivery circuit and an on-package input-output interface to cache data for access by the processor logic at higher bandwidth with lower power consumption.

公开(公告)号：US11462536B2

公开(公告)日：2022-10-04

申请号：US16147538

申请日：2018-09-28

Applicant: Intel Corporation

Inventor： Anupama Bowonder ,  Rishabh Mehandru ,  Mark Bohr ,  Tahir Ghani

IPC: H01L29/76 ,  H01L29/94 ,  H01L27/092 ,  H01L21/8238 ,  H01L29/06 ,  H01L29/08 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78

Abstract: Integrated circuit structures having asymmetric source and drain structures, and methods of fabricating integrated circuit structures having asymmetric source and drain structures, are described. For example, an integrated circuit structure includes a fin, and a gate stack over the fin. A first epitaxial source or drain structure is in a first trench in the fin at a first side of the gate stack. A second epitaxial source or drain structure is in a second trench in the fin at a second side of the gate stack, the second epitaxial source or drain structure deeper into the fin than the first epitaxial source or drain structure.

公开(公告)号：US11201129B2

公开(公告)日：2021-12-14

申请号：US16283582

申请日：2019-02-22

Applicant: Intel Corporation

Inventor： Valery M. Dubin ,  Sridhar Balakrishnan ,  Mark Bohr

IPC: H01L23/00 ,  H01L21/288 ,  H01L21/48

Abstract: Methods, techniques, and structures relating to die packaging. In one exemplary implementation, a die package interconnect structure includes a semiconductor substrate and a first conducting layer in contact with the semiconductor substrate. The first conducting layer may include a base layer metal. The base layer metal may include Cu. The exemplary implementation may also include a diffusion barrier in contact with the first conducting layer and a wetting layer on top of the diffusion barrier. A bump layer may reside on top of the wetting layer, in which the bump layer may include Sn, and Sn may be electroplated. The diffusion barrier may be electroless and may be adapted to prevent Cu and Sn from diffusing through the diffusion barrier. Furthermore, the diffusion barrier may be further adapted to suppress a whisker-type formation in the bump layer.

公开(公告)号：US20200058646A1

公开(公告)日：2020-02-20

申请号：US16103809

申请日：2018-08-14

Applicant: Intel Corporation

Inventor： Wilfred Gomes ,  Mark Bohr ,  Brian S. Doyle

IPC: H01L27/06 ,  H01L29/78 ,  H01L27/108 ,  H01L27/11 ,  H01L23/522

Abstract: Disclosed herein are structures and methods for large integrated circuit (IC) dies, as well as related assemblies and devices. For example, in some embodiments, an IC die may include: a first subvolume including first electrical structures, wherein the first electrical structures include devices in a first portion of a device layer of the IC die; a second subvolume including second electrical structures, wherein the second electrical structures include devices in a second portion of the device layer of the IC die; and a third subvolume including electrical pathways between the first subvolume and the second subvolume; wherein the IC die has an area greater than 750 square millimeters.

公开(公告)号：US12100705B2

公开(公告)日：2024-09-24

申请号：US17825664

申请日：2022-05-26

Applicant: Intel Corporation

Inventor： Yih Wang ,  Rishabh Mehandru ,  Mauro J. Kobrinsky ,  Tahir Ghani ,  Mark Bohr ,  Marni Nabors

IPC: H01L27/06 ,  H01L21/768 ,  H01L21/8234 ,  H01L23/522 ,  H01L27/088 ,  H01L29/66 ,  H01L29/78

CPC classification number: H01L27/0688 ,  H01L21/76877 ,  H01L21/823431 ,  H01L23/5226 ,  H01L27/0886 ,  H01L29/66545 ,  H01L29/66795 ,  H01L29/785

Abstract: Described herein are apparatuses, methods, and systems associated with a deep trench via in a three-dimensional (3D) integrated circuit (IC). The 3D IC may include a logic layer having an array of logic transistors. The 3D IC may further include one or more front-side interconnects on a front side of the 3D IC and one or more back-side interconnects on a back side of the 3D IC. The deep trench may be in the logic layer to conductively couple a front-side interconnect to a back-side interconnect. The deep trench via may be formed in a diffusion region or gate region of a dummy transistor in the logic layer. Other embodiments may be described and claimed.

公开(公告)号：US11830829B2

公开(公告)日：2023-11-28

申请号：US17836117

申请日：2022-06-09

Applicant: Intel Corporation

Inventor： Wilfred Gomes ,  Mark Bohr ,  Doug Ingerly ,  Rajesh Kumar ,  Harish Krishnamurthy ,  Nachiket Venkappayya Desai

IPC: H01L23/64 ,  H01L21/48 ,  H01L21/56 ,  H01L23/498 ,  H01L23/00 ,  H01L25/065 ,  H01L25/00

CPC classification number: H01L23/645 ,  H01L21/4853 ,  H01L21/565 ,  H01L23/49838 ,  H01L24/16 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/16145 ,  H01L2224/16227 ,  H01L2225/06513 ,  H01L2225/06531 ,  H01L2225/06558 ,  H01L2225/06582 ,  H01L2924/19042

Abstract: Techniques and mechanisms for providing an inductor with an integrated circuit (IC) die. In an embodiment, the IC die comprises integrated circuitry and one or more first metallization layers. The IC die is configured to couple to a circuit device including one or more second metallization layers, where such coupling results in the formation of an inductor which is coupled to the integrated circuitry. One or more loop structures of the inductor each span both some or all of the one or more first metallization layers and some or all of the one or more second metallization layers. In another embodiment, the IC die or the circuit device includes a ferromagnetic material to concentrate a magnetic flux which is provided with the inductor.