公开(公告)号：JP2007287821A

公开(公告)日：2007-11-01

申请号：JP2006111664

申请日：2006-04-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SAKAI TATSUYA ,  MATSUKI YASUO ,  TAMAKI KENTARO

IPC: H01L21/316

Abstract: PROBLEM TO BE SOLVED: To provide a method of forming an alumina film which can be easily applied to a large substrate and can reduce cost and enables to form a film well on a substrate having a narrow trench structure by using the osmotic force of a liquid material.
SOLUTION: The method of forming the alumina film comprises a process (1) of applying a composition for forming alumina which contains a complex of an amine compound and an aluminum hydride and an organic solvent to form a coating film, a process (2) of removing the solvent from the coating film formed by the process (1), and a process (3) of heating and/or irradiating light on the coating film under the existence of an oxidizing gas.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种形成氧化铝膜的方法，其可以容易地施加到大的基板上并且可以降低成本并且能够通过使用渗透力在具有窄沟槽结构的基板上形成良好的膜 的液体材料。 ＆lt; P＆gt;解决方案：形成氧化铝膜的方法包括施加含有胺化合物和氢化铝和有机溶剂的络合物的氧化铝组合物以形成涂膜的方法（1） 2）从由工艺（1）形成的涂膜中除去溶剂;以及在氧化气体存在下在涂膜上加热和/或照射光的方法（3）。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007251048A

公开(公告)日：2007-09-27

申请号：JP2006075360

申请日：2006-03-17

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MATSUKI YASUO ,  TAMAKI KENTARO ,  SAKAI TATSUYA

IPC: H05K9/00 ,  G02B1/10 ,  G09F9/00

Abstract: PROBLEM TO BE SOLVED: To provide a method for inexpensively and easily manufacturing an electromagnetic wave shielding film having improved electromagnetic wave shielding properties and transmission properties.
SOLUTION: The manufacturing method of the electromagnetic wave shielding film 7 includes: a process for preparing a transfer base material 4 comprising a metal base material 1 and an insulating film 2 that covers the surface of the metal base material and has a recess 3 to which the lattice-like metal base material is exposed, and plating a metal conductive layer 5 in the recess 3 of the transfer base material 4; a process for laminating a transparent base material 6 on the formation surface of the metal conductive layer 5 in the transfer base material 4 via an adhesive 9; and a process for separating the transfer base material 4 from the transparent base material 6 for transferring the metal conductive layer 5 onto the transparent base material 4 and forming the former on the latter.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种廉价且容易地制造具有改善的电磁波屏蔽性和透射性的电磁波屏蔽膜的方法。 解决方案：电磁波屏蔽膜7的制造方法包括：制备转印基材4的方法，转印基材4包括金属基材1和绝缘膜2，绝缘膜2覆盖金属基材的表面，并具有凹部 3，露出格子状金属基材，在转印基材4的凹部3中镀覆金属导电层5; 通过粘合剂9将透明基材6层叠在转印基材4中的金属导电层5的形成面上的工序; 以及用于将转印基材4与透明基材6分离以将金属导电层5转印到透明基材4上并在其上形成前者的方法。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006328526A

公开(公告)日：2006-12-07

申请号：JP2006031334

申请日：2006-02-08

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SAKAI TATSUYA ,  MATSUKI YASUO ,  KAWAGUCHI KAZUO

IPC: C23C16/18 ,  H01L21/285

Abstract: PROBLEM TO BE SOLVED: To provide a method for easily depositing a metallic film made into a seed layer upon burying metal, particularly copper into a trench in a substrate as an insulator by a plating process, further playing a roll as a barrier layer for preventing the migration of metal atoms to an insulation film and also having excellent adhesion with the insulator. SOLUTION: In the method, a metallic compound on a substrate in which a film of at least one metallic compound selected from a cobalt compound, a ruthenium compound and a tungsten compound is deposited, is sublimed, the sublimed gas is fed to a substrate for depositing a metallic film, so as to be decomposed, thus the metallic film is deposited on the surface of the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种方法，通过电镀工艺将金属（特别是铜）作为绝缘体将金属（特别是铜）埋入基板中的沟槽中以容易地沉积制成种子层的金属膜，进一步将卷作为屏障 层，用于防止金属原子迁移到绝缘膜上，并且与绝缘体具有优异的粘附性。 解决方案：在该方法中，沉积了选自钴化合物，钌化合物和钨化合物中的至少一种金属化合物的膜的基板上的金属化合物升华，将升华的气体供给到 用于沉积金属膜的基板以便被分解，因此金属膜沉积在基板的表面上。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006310448A

公开(公告)日：2006-11-09

申请号：JP2005129404

申请日：2005-04-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SAKAI TATSUYA ,  AKIYAMA MASAHIRO ,  ERIYAMA YUUICHI

IPC: H01L21/316 ,  H01L21/76

Abstract: PROBLEM TO BE SOLVED: To provide a trench embedding composition, as well as a trench embedding method, suitable to be used for embedding silicon oxide in a trench formed in a substrate.
SOLUTION: The trench embedding composition contains (A) silicon oxide particles, (B) binder components containing silicon atoms, and (C) solvent. In the trench embedding method, the trench embedding composition is applied on the substrate comprising a trench, which is then heated and/or irradiated with light.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种适于用于将氧化硅嵌入形成在衬底中的沟槽中的沟槽嵌入组合物以及沟槽嵌入方法。 解决方案：沟槽包埋组合物包含（A）氧化硅颗粒，（B）含硅原子的粘合剂组分和（C）溶剂。 在沟槽嵌入方法中，将沟槽包埋组合物施加在包括沟槽的基板上，然后将其加热和/或用光照射。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005142540A

公开(公告)日：2005-06-02

申请号：JP2004293581

申请日：2004-10-06

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MATSUKI YASUO ,  O DOUKAI ,  SAKAI TATSUYA ,  IWAZAWA HARUO

IPC: H01L21/28 ,  H01L21/288 ,  H01L21/3205

CPC classification number: C23C18/1204 ,  C23C18/14

Abstract: PROBLEM TO BE SOLVED: To provide a composition and a method for forming a silicon-cobalt film at low production costs without requiring an expensive vacuum apparatus or a high-frequency apparatus.
SOLUTION: A composition for forming a silicon-cobalt film contains a silicon compound and a cobalt compound. A silicon-cobalt film is formed by applying this composition to a base and treating it with heat or light.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种低成本生产硅 - 钴膜的组合物和方法，而不需要昂贵的真空装置或高频装置。 解决方案：用于形成硅 - 钴膜的组合物含有硅化合物和钴化合物。 通过将该组合物施加到基底并用热或光进行处理来形成硅 - 钴膜。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004235539A

公开(公告)日：2004-08-19

申请号：JP2003024133

申请日：2003-01-31

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SAKAI TATSUYA ,  SAWADA KATSUTOSHI ,  OKITA KENZO ,  OSHIMA NOBORU

IPC: C08F8/04 ,  C08F232/08 ,  H01L31/04

CPC classification number: Y02E10/50

Abstract: PROBLEM TO BE SOLVED: To provide a solar cell superior to flexibility, crashproof, transparency, and thermal resistance and having a semiconductor film formed by coating a composite for forming a silicon film on a base substance having a lower linear expansion coefficient. SOLUTION: The solar cell has on a base 1 a pair of electrodes 2 and 6, and at least two layers of semiconductor films 3, 4, and 5 having different concentration and/or different kinds of impurity formed between the electrodes 2, 6. Elongations after fracture of the substrate range from 6 to 10% and strengths of fracture of the substrate range from 40 to 50 MPa. At least one layer semiconductor film is formed by a composite for forming a silicon film including a silicon particle (A), a high order silane compound (B), and a silane compound hydride (C). COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004051949A

公开(公告)日：2004-02-19

申请号：JP2003110729

申请日：2003-04-15

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OSHIMA NOBORU ,  SAKAI TATSUYA ,  OKITA KENZO ,  TSUBOUCHI TAKASHI

IPC: C08F4/42 ,  C08F4/70 ,  C08F8/04 ,  C08F232/08

Abstract: PROBLEM TO BE SOLVED: To provide a material soluble in either one of toluene, cyclohexane and their mixture at 25°C, excellent in optical transparency, heat resistance and stiffness, having a small expansion coefficient and suitable for sheets, films and thin films for optical materials. SOLUTION: A cyclic olefin-based addition copolymer is obtained by addition polymerization of a cyclic olefin compound having a side chain substituent of a cyclic structure such as endo-tricyclo[4.3.0.1 2,5 ]deca-3, 7-diene, endo-tricyclo[4.3.0.1 2,5 ]dec-3-ene or the like or hydrogenation after the polymerization, or copolymerization of the compound with another cyclic olefin compound such as bicyclo[2.2.1]hept-2-ene or the like, a cyclic olefin compound having a hydrolyzable silyl group or hydrogenation after the copolymerization. A composition for crosslinking is obtained by adding a specific crosslinking agent to the addition copolymer. A crosslinked product is obtained by crosslinking the composition. The optical materials comprise the copolymer, the composition or the crosslinked product. The method for producing the copolymer is to carry out the addition polymerization by using a specific nickel catalyst. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2013181224A

公开(公告)日：2013-09-12

申请号：JP2012046393

申请日：2012-03-02

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SAKAI TATSUYA ,  NISHIMURA HIDEKI ,  NAKAGAWA YASUSHI ,  YAMAMOTO MASAHIRO ,  AOKI HIDEYUKI ,  SAITO RYUICHI ,  FURUKAWA TAKESHI

IPC: C23C18/10 ,  C07C211/65 ,  C23C18/14 ,  H01L21/28 ,  H01L21/285 ,  H01L21/3205 ,  H01L21/768 ,  H01L23/532

Abstract: PROBLEM TO BE SOLVED: To provide a composition for forming an aluminum body, which does not cause unevenness in a coating film and does not pollute a film deposition apparatus because only a small amount of an alane-amine complex volatilizes in an application step and a heating step.SOLUTION: A composition for forming an aluminum body contains a complex of a first amine compound and a hydrogenated aluminum, and an organic solvent. The vapor pressure of the complex is 5.0 Torr or less at 50°C, and the first amine compound is represented by general formula (1).

Abstract translation: 要解决的问题：提供一种用于形成铝体的组合物，其不会引起涂膜不均匀并且不会污染膜沉积设备，因为在施加步骤中只有少量的丙烯胺 - 胺络合物挥发，并且 加热步骤。解决方案：用于形成铝体的组合物含有第一胺化合物和氢化铝的络合物和有机溶剂。 络合物的蒸气压在50℃为5.0托或更低，第一胺化合物由通式（1）表示。

公开(公告)号：JP2013125766A

公开(公告)日：2013-06-24

申请号：JP2011272112

申请日：2011-12-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA HIDEKI ,  SAKAI TATSUYA ,  YAMAMOTO MASAHIRO ,  SAITO RYUICHI ,  FURUKAWA TSUYOSHI

IPC: H01L21/768 ,  H01L21/28 ,  H01L21/288 ,  H01L21/3205 ,  H01L23/532

Abstract: PROBLEM TO BE SOLVED: To provide a substrate including a recessed part in which an aluminum material is preferentially and favorably embedded, the recessed part having a fine and complex pattern.SOLUTION: A method for manufacturing a substrate including a recessed part in which an aluminum material is embedded includes: a coating step of coating an aluminum material forming composition containing a complex of an amine compound and an aluminum hydride and an organic solvent, on a surface of a substrate having a recessed part on the surface, and then forming a coating layer comprising the aluminum material forming composition on the substrate having the recessed part so as to make a state where the composition is embedded within the recessed part; and an aluminum material forming step of forming an aluminum material by performing at least one of heating and light irradiation to the coating layer.

Abstract translation: 要解决的问题：为了提供一种包括凹部的基板，其中铝材料优先和有利地嵌入其中，凹部具有精细和复杂的图案。 解决方案：一种用于制造包括其中嵌入铝材料的凹部的基板的方法，包括：涂覆含有胺化合物和氢化铝和有机溶剂的络合物的铝材料形成组合物的涂布步骤， 在表面上具有凹部的基板的表面上，然后在具有凹部的基板上形成包含形成铝材的组合物的涂层，以使组成嵌入到凹部内的状态; 以及通过对涂层进行加热和光照射中的至少一种来形成铝材料的铝材料形成步骤。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2013124374A

公开(公告)日：2013-06-24

申请号：JP2011272113

申请日：2011-12-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA HIDEKI ,  SAKAI TATSUYA ,  YAMAMOTO MASAHIRO ,  SAITO RYUICHI ,  FURUKAWA TAKESHI

IPC: C23C18/10 ,  B05D7/24 ,  C23C18/08 ,  C23C18/14 ,  C23C28/00 ,  H01L21/28 ,  H01L21/288 ,  H01L21/3205 ,  H01L21/768 ,  H01L23/532

Abstract: PROBLEM TO BE SOLVED: To manufacture a laminate of a substrate and an aluminum body in a simple manner.SOLUTION: The method of manufacturing the laminate of the substrate and the aluminum body includes: an application step of applying a composition for forming the aluminum body containing a complex of amine compound and aluminum hydride and an organic solvent to a surface of the substrate two or more times to form a coating layer consisting of the composition on the substrate; and an aluminum body-forming step of forming the aluminum body by performing at least one of heating or light irradiation onto the coating layer to obtain the laminate of the substrate and the aluminum body.

Abstract translation: 要解决的问题：以简单的方式制造基底和铝体的层压体。 解决方案：制造基板和铝体的层叠体的方法包括：涂覆步骤，将包含胺化合物和氢化铝和有机溶剂的复合物的铝体的组合物施加到 底物两次或更多次以形成由基底上的组合物组成的涂层; 以及铝体形成步骤，通过对所述涂层进行加热或光照射中的至少一种来形成所述铝体，以获得所述基底和所述铝体的层叠体。 版权所有（C）2013，JPO＆INPIT