Liquid crystal display device
    11.
    发明授权

    公开(公告)号:US10185184B2

    公开(公告)日:2019-01-22

    申请号:US15660254

    申请日:2017-07-26

    Abstract: A liquid crystal display device includes: a TFT substrate having gate lines and data lines arranged thereon, the gate lines extending in a first direction and arranged in a second direction, the data lines extending in the second direction and arranged in the first direction; a counter substrate having a black matrix and a color filter; and liquid crystals put between the TFT substrate and the counter substrate. Columnar spacers are fainted on the counter substrate. Pedestals are formed on portions of the TFT substrate, the portions corresponding to the columnar spacers. A convex portion and a concave portion are present at the top end of the columnar spacer. The pedestal is formed corresponding to the concave portion. The concave portion is opened at the ends thereof and connected to the lateral side of the columnar spacer.

    Liquid crystal display device and manufacturing method thereof
    14.
    发明授权
    Liquid crystal display device and manufacturing method thereof 有权
    液晶显示装置及其制造方法

    公开(公告)号:US09158160B2

    公开(公告)日:2015-10-13

    申请号:US14485711

    申请日:2014-09-13

    Abstract: The present invention prevents the shaving of an alignment film caused by a columnar spacer in a liquid crystal display device of an IPS method using photo-alignment. A plinth higher than a pixel electrode is formed at a part where a columnar spacer formed over a counter substrate touches a TFT substrate. When an alignment film of a double-layered structure is applied over the pixel electrode and the plinth, the thickness of the alignment film over the plinth reduces by a leveling effect. When photo-alignment is applied in the state, a photodegraded upper alignment film over the plinth disappears and a lower alignment film having a high mechanical strength remains. As a result, it is possible to prevent the shaving of the alignment film.

    Abstract translation: 本发明防止了使用光取向的IPS方法的液晶显示装置中的柱状间隔物引起的取向膜的刮削。 在对置基板上形成的柱状间隔件与TFT基板接触的部分,形成比像素电极高的底座。 当在像素电极和底座上施加双层结构的取向膜时,底座上的取向膜的厚度减小了平整效应。 当在该状态下进行光对准时,在底座上的光降解的上取向膜消失,并且残留有机械强度较高的下取向膜。 结果,可以防止取向膜的刮削。

    Semiconductor device
    17.
    发明授权

    公开(公告)号:US11594641B2

    公开(公告)日:2023-02-28

    申请号:US17111810

    申请日:2020-12-04

    Abstract: A semiconductor device includes a gate electrode on a substrate, a gate insulating film on the gate electrode, an oxide semiconductor film via the gate insulating film on the gate electrode, a source electrode and a drain electrode on the oxide semiconductor film, a protective film provided on the source electrode and the drain electrode; and a conductive layer provided on the protective film and overlapped on the oxide semiconductor layer. The protective film includes a first silicon oxide film and a first silicon nitride film. The first oxide film is in contact with the oxide semiconductor layer. The gate insulating film includes a second silicon nitride film and a second silicon oxide film. The second silicon oxide film is in contact with the oxide semiconductor layer. The oxide semiconductor layer has a first region located between the source electrode and the drain electrode in a plan view.

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