公开(公告)号：JP2009138127A

公开(公告)日：2009-06-25

申请号：JP2007316921

申请日：2007-12-07

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： UEDA JIRO ,  KAJITA TORU ,  IIJIMA TAKAHIRO

IPC: C08L33/14 ,  C08F220/32 ,  C08F220/38 ,  C08K5/00 ,  C08L63/00 ,  C09D141/00 ,  C09D163/00 ,  C09D171/02 ,  C09D201/02 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a composition, which can form a cured film having high flatness on a substrate having low surface flatness, and which is for forming an optical device protective film having high transparency and surface hardness, and various excellent resistive characteristics such as heat and pressure resistance, acid resistance, alkali resistance, sputtering resistance, and etching resistance. SOLUTION: The resin composition includes a copolymer containing a polymerization unit derived from a polymerizable unsaturated compound having an oxiranyl or oxetanyl group, and at least one kind of polymerization unit derived from at least one kind of polymerizable unsaturated compound selected from the group consisting of polymerizable unsaturated compounds having an alkoxy thiocarbonyl or alkoxyalkyl thiocarbonyl group, and a solvent. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种组合物，其可以在具有低表面平整度的基材上形成具有高平坦度的固化膜，并且用于形成具有高透明度和表面硬度的光学装置保护膜，以及各种优异的 电阻特性如耐热压性，耐酸性，耐碱性，耐溅射性和耐蚀刻性。 解决方案：树脂组合物包括含有衍生自具有环氧乙烷基或氧杂环丁烷基的可聚合不饱和化合物的聚合单元的共聚物和至少一种衍生自选自下组的可聚合不饱和化合物的聚合单元 由具有烷氧基硫代羰基或烷氧基烷基硫代羰基的可聚合不饱和化合物和溶剂组成。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008310044A

公开(公告)日：2008-12-25

申请号：JP2007157845

申请日：2007-06-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  YOSHIDA SHIN ,  IIJIMA TAKAHIRO

IPC: G03F7/075 ,  C08G59/20 ,  C08G77/14 ,  G02B1/04 ,  G02B3/00 ,  G03F7/023 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which, when used to form an interlayer insulation film under a baking condition of SOLUTION: The radiation-sensitive resin composition comprises [A] a polysiloxane having at least one group selected from the group consisting of an oxiranyl group and an oxetanyl group, and a functional group capable of addition reaction to an oxiranyl group or an oxetanyl group, and [B] a 1,2-quinonediazide compound. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射敏感性树脂组合物，当其在<250℃的烘烤条件下用于形成层间绝缘膜时，可以形成具有高耐热性，高耐溶剂性的层间绝缘膜 ，高透射率和低介电常数，并且当用于形成微透镜时，可以形成具有高透射率和良好熔体形状的微透镜。 解决方案：辐射敏感性树脂组合物包含[A]具有至少一个选自环氧乙烷基和氧杂环丁烷基的基团的聚硅氧烷，以及能够与环氧乙烷基进行加成反应的官能团或 氧杂环丁烷基和[B] 1,2-醌二叠氮化合物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008216491A

公开(公告)日：2008-09-18

申请号：JP2007051870

申请日：2007-03-01

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HAMADA KENICHI ,  HANAMURA MASAAKI ,  IIJIMA TAKAHIRO

IPC: G03F7/023 ,  C08K5/28 ,  C08L33/08 ,  C08L33/10 ,  C08L63/00 ,  G02B3/00 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition that has high radiation-sensitivity, has a developing margin capable of forming a superior pattern shape, even if exceeding the optimum developing time in a developing process and that can easily form a patterned thin film that is superior in adhesiveness. SOLUTION: The radiation-sensitive resin composition contains unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride, an unsaturated compound containing at least one from among an epoxy group or an oxetanyl group, (meth)acrylmorpholine, a compolymer of other unsaturated compounds and 1,2-quinonedizide compound. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性的辐射敏感性树脂组合物，具有能够形成优异图案形状的显影边缘，即使在显影过程中超过最佳显影时间并且可以容易地 形成粘合性优异的图案化薄膜。 解决方案：辐射敏感性树脂组合物含有不饱和羧酸和/或不饱和羧酸酐，包含环氧基或氧杂环丁烷基中的至少一种的不饱和化合物，（甲基）丙烯基吗啉，其它不饱和羧酸的共聚物 化合物和1,2-醌化合物。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008176037A

公开(公告)日：2008-07-31

申请号：JP2007009145

申请日：2007-01-18

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  UCHIIKE KAZUHIRO ,  MITANI KOJI ,  IIJIMA TAKAHIRO

IPC: G03F7/022 ,  G02B1/04 ,  G02B3/00 ,  G03F7/038 ,  G03F7/075

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high radiation sensitivity, having such a development margin that even if developing time exceeds the optimum time in a development step, a good pattern profile can be formed, and capable of easily forming a patterned thin film excellent in adhesion. SOLUTION: The radiation-sensitive resin composition includes [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an unsaturated compound containing an epoxy group and/or an oxetanyl group and (a3) an unsaturated compound other than the components (a1) and (a2), [B] a 1,2-quinonediazide compound and [C] a siloxane oligomer containing a functional group which takes part in a crosslinking reaction with the component [A] under heat. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性的辐射敏感性树脂组合物，具有这样的显影余量，即使在显影步骤中显影时间超过最佳时间，可以形成良好的图案轮廓，并且能够 容易地形成粘附性优异的图案化薄膜。 解决方案：辐射敏感性树脂组合物包含[a]（a1）不饱和羧酸和/或不饱和羧酸酐的共聚物，（a2）含有环氧基和/或氧杂环丁烷基的不饱和化合物 和（a3）不同于组分（a1）和（a2）的不饱和化合物，[B] 1,2-醌二叠氮化合物和[C]含有与组分交联反应的官能团的硅氧烷低聚物 [A]在热。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008156393A

公开(公告)日：2008-07-10

申请号：JP2006343833

申请日：2006-12-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAGAYA KATSUYA ,  HANAMURA MASAAKI ,  HAMADA KENICHI ,  IIJIMA TAKAHIRO

IPC: C08L33/14 ,  C08F220/26 ,  C08K5/28 ,  C08K5/3492 ,  C08L63/00 ,  G02F1/1337 ,  G03F7/004 ,  G03F7/022 ,  G03F7/033 ,  G03F7/038 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having sufficient process margin and good preservation stability and suitably used for forming protrusions of a perpendicularly oriented type liquid crystal display element, to provide the protrusions formed therefrom and to provide the liquid crystal display element having the protrusions. SOLUTION: The radiation-sensitive resin composition for forming the protrusions of the perpendicularly oriented type liquid crystal display element comprises [A] a copolymer obtained by copolymerizing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride with (a2) a specific oxetanyl group-containing unsaturated compound and (a3) an olefinically unsaturated compound other than the (a1) and (a2) and [B] a 1,2-quinone diazide compound. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供具有足够的加工余量和良好的保存稳定性并适合用于形成垂直取向型液晶显示元件的突起的辐射敏感性树脂组合物，以提供由其形成的突起，并提供 具有突起的液晶显示元件。 解决方案：用于形成垂直取向型液晶显示元件的突起的辐射敏感性树脂组合物包括[A]通过使（a1）不饱和羧酸和/或不饱和羧酸酐与（ a2）具体的含氧杂环丁烷基的不饱和化合物和（a3）除（a1）和（a2）和[B] 1,2-醌二叠氮化合物以外的烯属不饱和化合物。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006039140A

公开(公告)日：2006-02-09

申请号：JP2004217720

申请日：2004-07-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KOYAMA TAKAYOSHI ,  IIJIMA TAKAHIRO ,  NAGATSUKA TOMIO

IPC: G03F7/031 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition for colored layer formation which produces neither undissolved matter nor scum on a pattern edge during development, causes neither chipping nor undercut of a pattern edge even under low exposure energy, and gives pixels and a black matrix. SOLUTION: The radiation sensitive resin composition for colored layer formation contains (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photo-radical generator containing a compound represented by formula (1) as an as essential component. In the formula, one of R 1 and R 2 is an alkyl group, an alicyclic group, an oxygen-containing heterocyclic group, a nitrogen-containing heterocyclic group, an oxygen-containing heterocyclic group or a sulfur-containing heterocyclic group; and R 3 -R 6 each denote H or an alkyl group. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供用于着色层形成的辐射敏感组合物，其在显影期间既不产生未溶解的物质也不会在图案边缘上产生浮渣，即使在低曝光能量下也不会造成图案边缘的切痕或底切，并且给出像素 和黑矩阵。 解决方案：用于着色层形成的辐射敏感性树脂组合物包含（A）着色剂，（B）碱溶性树脂，（C）多官能单体和（D）含有由 式（1）作为必要成分。 在该式中，R 1 和R SB 2之一是烷基，脂环族基团，含氧杂环基，含氮杂环基，氧 含杂环基或含硫杂环基; 和R SB 3 -R SB 6各自表示H或烷基。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2008216487A

公开(公告)日：2008-09-18

申请号：JP2007051833

申请日：2007-03-01

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HAMADA KENICHI ,  NAGAYA KATSUYA ,  ONUMA YUUKI ,  IIJIMA TAKAHIRO

IPC: G03F7/075 ,  C08K5/28 ,  C08L33/00 ,  C08L83/02 ,  G02B3/00 ,  G03F7/023 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition that has high radiation sensitivity, has a developing margin which can form superior pattern shape, even if exceeding the optimum developing time in developing process. SOLUTION: The radiation-sensitive resin composition contains unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride, an epoxy group-containing unsaturated compound, an oxetanyl group-containing unsaturated compound, an oxetanyl group-containing unsaturated compound and a copolymer of unsaturated compounds other than the unsaturated compounds, and 1,2-quinonediazide compound, and oxetanyl siloxane oligomer. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性的辐射敏感性树脂组合物，即使超过显影过程中的最佳显影时间，也具有形成优异图案形状的显影余量。 解决方案：辐射敏感性树脂组合物含有不饱和羧酸和/或不饱和羧酸酐，含环氧基的不饱和化合物，含氧杂环丁烷基的不饱和化合物，含氧杂环丁烷基的不饱和化合物和 不饱和化合物以外的不饱和化合物，1,2-醌二叠氮化合物，氧杂环丁烷基硅氧烷低聚物等。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008181095A

公开(公告)日：2008-08-07

申请号：JP2007318576

申请日：2007-12-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MINOWA TAKAKI ,  IIJIMA TAKAHIRO ,  NARUSE HIDENORI ,  HAYASHI TOSHIHITO

IPC: G03F7/038 ,  C08F8/14 ,  C08F290/12 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition for colored layer formation showing excellent developability, specifically a new radiation sensitive composition for colored layer formation capable of forming a fine pattern without causing chipping and undercut of a pattern edge even under low exposure energy, or leaving undissolved matter or generating scum on a pattern edge in development, thereby forming a color filter having high color purity and a black matrix having high light blocking effect. SOLUTION: The radiation sensitive composition comprises (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator, wherein the alkali-soluble resin (B) has a structure obtained by adding an unsaturated monocarboxylic acid or a polybasic acid anhydride to a styrene epoxy resin. The radiation sensitive composition is used for forming a colored layer. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供显示出优异显影性的用于着色层形成的辐射敏感组合物，特别是一种用于着色层形成的新的辐射敏感性组合物，其能够形成精细图案，而不会在低至低的情况下造成图案边缘的切屑和底切 曝光能量，或在显影中的图案边缘上留下未溶解物质或产生浮渣，从而形成色纯度高的滤色片和具有高遮光效果的黑色矩阵。 解决方案：辐射敏感组合物包含（A）着色剂，（B）碱溶性树脂，（C）多官能单体和（D）光聚合引发剂，其中碱溶性树脂（B）具有 通过将不饱和一元羧酸或多元酸酐加入到苯乙烯环氧树脂中而获得的结构。 辐射敏感组合物用于形成着色层。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008015393A

公开(公告)日：2008-01-24

申请号：JP2006188850

申请日：2006-07-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SHIRATO KAORI ,  HIRAI TAKESHI ,  IIJIMA TAKAHIRO

IPC: G03F7/027 ,  C08F290/14 ,  C08G63/52 ,  G02B5/20 ,  G03F7/004 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for colored layer formation which avoids remaining of undissolved matter and scumming on a pattern edge in development and provides a colored layer free from chipping of a pattern edge and undercut even under low exposure energy. SOLUTION: The radiation-sensitive composition for colored layer formation contains (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photoradical generator, wherein the alkali-soluble resin (B) contains a polyester having an alicyclic hydrocarbon skeleton in a main chain and a polymerizable unsaturated bond in a side chain. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于着色层形成的辐射敏感组合物，其避免在显影中留下未溶解物质并在图案边缘上浮渣，并且提供即使在低于下限的图案边缘和底切的着色层 曝光能量。 解决方案：用于着色层形成的辐射敏感组合物包含（A）着色剂，（B）碱溶性树脂，（C）多官能单体和（D）光自由基发生剂，其中碱溶性树脂 （B）含有在主链具有脂环族烃骨架和侧链中的聚合性不饱和键的聚酯。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007249113A

公开(公告)日：2007-09-27

申请号：JP2006076080

申请日：2006-03-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SHIHO KOUJI ,  IIJIMA TAKAHIRO

IPC: G03F7/004 ,  G02F1/1339

Abstract: PROBLEM TO BE SOLVED: To provide spacers having high film hardness, excellent in smoothness of spacer surfaces, less liable to produce residue and scumming on a substrate in an unexposed portion, and less liable to cause image defects such as image persistence and display irregularities, and a radiation-sensitive resin composition for forming the spacers. SOLUTION: The radiation-sensitive resin composition for spacers comprises: (A) conductive particles exemplified by carbon black; (B) an alkali-soluble resin; (C) a polymerizable compound having an ethylenically unsaturated bond; and (D) a photopolymerization initiator. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高膜硬度，间隔表面的平滑度优异的间隔物，在未曝光部分中不易产生残留物和在基板上浮渣，并且不易引起图像残留的图像缺陷和 显示不规则性，以及用于形成间隔物的辐射敏感性树脂组合物。 解决方案：用于间隔物的辐射敏感性树脂组合物包括：（A）以炭黑为例的导电颗粒; （B）碱溶性树脂; （C）具有烯属不饱和键的聚合性化合物; 和（D）光聚合引发剂。 版权所有（C）2007，JPO＆INPIT