Abstract:
A system and method for inspection is disclosed. The design generally employs as many as four design principles, including employing at least one lens from a relatively low dispersion glass, at least one additional lens from an additional material different from the relatively low dispersion glass, generally matching the relatively low dispersion properties of the relatively low dispersion glass. The design also may include at least one further lens from a further material different from and exhibiting a significantly different dispersion power from the relatively low dispersion glass and the additional material. Finally, the design may include lenses positioned to insert a significant amount of color within the objective, a gap, and additional lenses, the gap and additional lenses serving to cancel the color inserted.
Abstract:
A system and method for inspection is disclosed. The design includes an objective employed for use with light energy having a wavelength in various ranges, including approximately 266 to 1000nm, 157nm through infrared, and other ranges. The objective comprises a focusing lens group (311) comprising at least one focusing lens (304) configured to receive light, a field lens (305) oriented to receive focused light energy from said focusing lens group (311) and provide intermediate light energy, and a Mangin mirror arrangement (312) positioned to receive the intermediate light energy from the field lens (305) and form controlled light energy. Each focusing lens has a reduced diameter, such as a diameter of less than approximately 100mm, and a maximum corrected field size of approximately 0.15mm. An immersion substance, such as oil, water, or silicone gel, may be employed prior to passing controlled light energy to the specimen (310) inspected.
Abstract:
A laser illuminator and illumination method for use in an inspection system, such as a semiconductor wafer inspection system or photomask inspection system is provided. The design comprises generating fundamental frequency laser energy at different fundamental wavelengths, such as 998nm, converting a portion of the fundamental frequency laser energy to 2nd harmonic frequency laser energy, further converting the 2' harmonic frequency laser energy to 4th harmonic frequency laser energy, and mixing the 4th harmonic frequency laser energy with a portion of the fundamental frequency laser energy to produce laser energy at a sum frequency. Mixing is accomplished by non-critical phase matching in a crystal of Cesium Lithium Borate (CLBO). Alternately, the design may employ shifting a portion of the fundamental frequency laser energy to laser energy at a Raman line and/or mixing the 2nd harmonic frequency laser energy with a portion of the fundamental frequency laser energy to produce 3rd harmonic frequency laser energy.
Abstract:
A system and method for inspecting a multi-layer sample, such as a silicon wafer, is disclosed. The design reduces variations in total reflected energy due to thin film interference. The design includes illuminating the sample at two incident angle ranges, where the two incident angle ranges are such that variation in total reflected energy at a first incident angle range may be employed to balance variation in total reflected energy at a second incident angle range. Defects are detected using die-to-die subtraction of the sample illuminated at the two incident angle ranges.
Abstract:
A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The objective comprises a focusing lens group, a field lens, a Mangin mirror arrangement, and an immersion substance or liquid between the Mangin mirror arrangement and the specimen. A variable focal length optical system for use with the objective in the catadioptric inspection system is also disclosed.