DEEP MICROWELL DESIGN AND METHOD OF MAKING THE SAME

    公开(公告)号:EP4137811A1

    公开(公告)日:2023-02-22

    申请号:EP22177489.6

    申请日:2016-08-25

    Abstract: An apparatus includes a substrate; a gate structure disposed over the substrate and having an upper surface; a well structure disposed over the substrate and defining a well over the upper surface of the gate structure; a conductive layer disposed on the upper surface of the gate structure and at least partially extending along a wall of the well in the well structure; and a dielectric structure disposed over the well structure and defining an opening to the well.

    SURFACE TREATMENT OF SEMICONDUCTOR SENSORS
    18.
    发明公开
    SURFACE TREATMENT OF SEMICONDUCTOR SENSORS 审中-公开
    半导体传感器的表面处理

    公开(公告)号:EP3164701A1

    公开(公告)日:2017-05-10

    申请号:EP15738556.8

    申请日:2015-07-01

    CPC classification number: G01N27/414 G01N27/4145

    Abstract: A sensor component includes a sensor including a sensor surface and a reaction site in cooperation with the sensor and exposing the sensor surface. The reaction site including a reaction site surface. A surface agent is bound to the reaction site surface or the sensor surface. The surface agent includes a surface active functional group reactive with Bronsted base or Lewis acid functionality on the reaction site surface or the sensor surface and including distal functionality that does not have a donor electron pair.

    Abstract translation: 传感器组件包括传感器,传感器包括传感器表面和与传感器协作并暴露传感器表面的反应部位。 反应部位包括反应部位表面。 表面剂与反应部位表面或传感器表面结合。 表面活性剂包括表面活性官能团,其在反应位点表面或传感器表面上与布朗斯台德碱或路易斯酸官能团反应并且包括不具有施主电子对的远端官能团。

Patent Agency Ranking