公开(公告)号：US20230035404A1

公开(公告)日：2023-02-02

申请号：US17758067

申请日：2020-12-24

Applicant: NOVA LTD.

Inventor： Yonatan OREN ,  Gilad BARAK

IPC: G01N21/956 ,  G01N21/95

Abstract: A combined OCD and photoreflectance system and method for improving the OCD performance in measurements of optical properties of a target sample. The system comprises (a) either a single channel OCD set-up comprised of a single probe beam configured in a direction normal/oblique to the target sample or a multi-channel OCD set-up having multiple probe beams configured in normal and oblique directions to the target sample for measuring the optical properties of the target sample, (b) at least one laser source for producing at least one laser beam, (c) at least one modulation device to turn the at least one laser beam into at least one alternatingly modulated laser beam, and (d) at least one spectrometer for measuring spectral components of the at least one light beam reflecting off said target sample; wherein the at least one alternatingly modulated laser beam is alternatingly modulating the spectral reflectivity of the target sample,

公开(公告)号：US20240302284A1

公开(公告)日：2024-09-12

申请号：US18435632

申请日：2024-02-07

Applicant: NOVA LTD.

Inventor： Yonatan OREN

IPC: G01N21/65 ,  G01N21/95 ,  G03F7/00

CPC classification number: G01N21/65 ,  G01N21/9501 ,  G03F7/70616 ,  G01N2201/0231 ,  G01N2201/06113

Abstract: A method and system are presented for use in measuring one or more characteristics of patterned structures. The method comprises: performing measurements on a patterned structure by illuminating the structure with exciting light to cause Raman scattering of one or more excited regions of the pattern structure, while applying a controlled change of at least temperature condition of the patterned structure, and detecting the Raman scattering, and generating corresponding measured data indicative of a temperature dependence of the detected Raman scattering; and analyzing the measured data and generating data indicative of spatial profile of one or more properties of the patterned structure.

公开(公告)号：US20230296436A1

公开(公告)日：2023-09-21

申请号：US18003801

申请日：2021-07-05

Applicant: NOVA LTD.

Inventor： Yonatan OREN ,  Eyal Hollander ,  Elad Schleifer ,  Gilad BARAK

IPC: G01J3/10 ,  G01J3/02 ,  G01J3/44 ,  G01J3/18 ,  G01J3/28

CPC classification number: G01J3/10 ,  G01J3/0208 ,  G01J3/0248 ,  G01J3/0291 ,  G01J3/18 ,  G01J3/2803 ,  G01J3/44

Abstract: Abstract: Systems and methods for metrology of workpieces such as wafers, using spectrometry of multi- spot- arrays formed over a test area of the tester workpiece, for optically measuring characteristics of the tested workpiece, where the optical metrology system is configured such that the distribution of energy density or flux of the multi-spot-array over the test area of the tested workpiece is such that prevents affecting the workpiece during its testing.