EXPOSURE CONTROL SYSTEM
    17.
    发明专利

    公开(公告)号:CA944992A

    公开(公告)日:1974-04-09

    申请号:CA86991

    申请日:1970-06-30

    Applicant: POLAROID CORP

    Abstract: An exposure control system for photographic apparatus which functions automatically to regulate both exposure apertures and exposure interval. The system is operable under an exposure program wherein over a select range of light levels, aperture area is varied with respect to scene light values in a relationship less than 1:1. The system provides for sequential regulation first of aperture, then of exposure interval. Voltage-sensitive triggering circuits are used for controlling the apertures and shutter mechanisms. These circuits are coupled to receive the output of a light-sensitive circuit and are arranged in series with a power source to develop a voltage reference level for use with differential amplification stages within the system. The system is calibrated or accommodating varying sensitometric characteristics of films through the use of a gain control in connection with an amplification stage. The system is capable of operating under a predetermined exposure program through the use, inter alia, of an aperture control arrangement which functionally relates aperture blade dynamics, the output of a photosensing circuit and the signal of a function generator.

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