Abstract:
PROBLEM TO BE SOLVED: To provide a solid-state image sensor which is capable of suppressing surface defects caused by a film stress difference at an interface of each layer and is excellent in condensing characteristics.SOLUTION: The solid-state image sensor comprises: a photoelectric conversion part 12 formed in a semiconductor substrate 11; light transmission insulating layers 17 and 18; a first flattening layer 19; a color filter 20 having a step on its surface; a second flattening layer 21 made of an organic material; a stress relaxation layer 22; a microlens layer 23 made of an inorganic material; and a transparent resin layer 24. The film stresses of the microlens layer 23, the stress relaxation layer 22, and the second flattening layer 21 satisfy a relation of (the film stress of the microlens layer 23)>(the film stress of the stress relaxation layer 22)>(the film stress of the second flattening layer 21). The refractive index of the transparent resin layer 24 is smaller than that of the microlens layer 23.
Abstract:
PROBLEM TO BE SOLVED: To provide an imaging apparatus and a camera module capable of obtaining a high-quality image in which flare light is not conspicuous even when a bright light source enters a field of view, by suppressing occurrence of the flare light.SOLUTION: The imaging apparatus and the camera module are each provided with: an optical sensor 110 which comprises a light-receiving part 112 capable of forming a subject image; a sealant 120 for protecting the light-receiving part 112-side of the optical sensor; an intermediate layer 130 transmitting light, which is formed at least between the light-receiving part 112 and the light-receiving part 112-side surface 121 of the sealant 120; and a control film 140 which is disposed between the intermediate layer 130 and the surface 121 of the sealant 120. The control film 140 functions to shift a cutoff wavelength toward a shortwave side according to the incident angle of light entering the film obliquely.
Abstract:
PROBLEM TO BE SOLVED: To provide a solid state imaging element which is excellent in a light collecting property.SOLUTION: A solid state imaging element includes: a semiconductor substrate 11; a photoelectric conversion part formed over the semiconductor substrate 11; and an organic material layer and an inorganic material layer laminated over the semiconductor substrate through at least one stress relieving layer 22.
Abstract:
PROBLEM TO BE SOLVED: To provide a color photosensitive resin composition with which a color filter array exhibiting favorable spectral characteristics can be formed. SOLUTION: The color photosensitive resin composition contains a dyestuff expressed by formula (I), an alkali-soluble resin, a photosensitive compound, a curing agent and a solvent. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To solve the problem of discoloration by dispersing a singlet oxygen quencher in a color filter without deteriorating lithography characteristics when the color filter is formed. SOLUTION: A solid-state image pickup device has a plurality of pixel parts respectively having a photoelectric conversion part 21 for converting an incident light amount into an electrical signal, a dye-based color filter 31 formed on the light incident side of each pixel part, and organic films 41, 42 that are formed in contact with the color filter 31 while including a singlet oxygen quencher. The singlet oxygen quencher is dispersed in the color filter 31. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a solid-state image pickup device capable of achieving both sensitivity characteristics and color mixture characteristics.SOLUTION: By exposing a portion that forms a light-shielding film of a base film 15 containing an optical oxide generating agent, acid is generated, and by reacting the acid with a film having a black dye thereon, a light-shielding film 16 Is formed at pixel corners of a pixel portion and a boundary of adjacent pixels.
Abstract:
PROBLEM TO BE SOLVED: To provide a solid-state imaging device in which microlenses having different refractive indexes are formed in respective pixels accurately, and also provide an electronic apparatus using the solid-state imaging device.SOLUTION: Formation of microlenses begins with forming an inorganic microlens 21 made of an inorganic material. Then, after an organic microlens layer 22a made of an organic material is formed, thermal reflow is performed to deform the organic microlens layer 22a to form a hemispherical organic microlens 22. Thereby, since the microlens formed in the beginning is made of an inorganic material, the organic microlens 22 is formed while lens characteristics are maintained. Accordingly, microlenses having different refractive indexes are formed accurately.
Abstract:
PROBLEM TO BE SOLVED: To constitute an optical waveguide which can increase a refractive index of a core part drastically, and further has more excellent waveguide effects in a solid-state imaging device having the optical waveguide. SOLUTION: This solid-state imaging device 1 includes: a plurality of photodiodes PD formed for each pixel 10; a first structure 101 which is provided on the light incident side of the photodiode PD, and has the translucency with a first refractive index; an etching trench provided correspondingly to a boundary position of the plurality of photodiodes PD in the first structure 101; and a second structure 102 which is embedded in the etching trench, and has a second refractive index smaller than the first refractive index. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To stably form a micro-protrusion pattern suitable for an anti-reflection structure. SOLUTION: A method of fabricating the anti-reflection structure includes: a first step of forming a resin film 12 having micro-particles dispersed therein on the surface of a workpiece 11; a second step of forming a micro-protrusion dummy pattern 14 on the resin film 12 by etching the resin film 12 using the micro-particles in the resin film 12 as a mask while gradually etching the micro-particles also; and a third step of forming a micro-protrusion pattern 15 on the surface of the workpiece 11 by etching back the surface of the workpiece 11 together with the resin film 12 having the micro-protrusion dummy pattern 14 formed thereon, and transferring the surface shape of the micro-protrusion dummy pattern 14 formed on the surface of the resin film 12 to the surface of the workpiece 11. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a colored photosensitive composition which can form a color filter array having improved spectral characteristics. SOLUTION: The colored photosensitive composition comprises a compound represented by formula (I) or a salt thereof, wherein R 1 -R 4 represent a hydrogen atom, a 1-10C saturated aliphatic hydrocarbon group or a carboxyl group; R 5 -R 12 represent a hydrogen atom, a halogen atom, a (halogenated) 1-10C saturated aliphatic hydrocarbon group, a 1-8C alkoxyl group, a carboxyl group, a sulfo group or a (N-substituted) sulfamoyl group, at least one of R 5 -R 12 is an N-substituted sulfamoyl group; and R 13 and R 14 represent a hydrogen atom, a cyano group or a (N-substituted) carbamoyl group. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation:要解决的问题:提供可以形成具有改进的光谱特性的滤色器阵列的着色光敏组合物。 < P>解决方案:着色光敏组合物包含由式(I)表示的化合物或其盐,其中R 1表示氢原子,1 -10℃饱和脂族烃基或羧基; R 16是表示氢原子,卤素原子,(卤代)1-10C饱和脂肪族烃基,1-8C烷氧基,羧基 ,磺基或(N-取代的)氨磺酰基中的至少一个是N-取代的氨磺酰基; R 14和R 14共表示氢原子,氰基或(N-取代的)氨基甲酰基。 版权所有(C)2009,JPO&INPIT