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    SPECTROPHOTOMETER
    11.
    发明专利
    SPECTROPHOTOMETER 未知

    公开(公告)号：GB2101299A

    公开(公告)日：1983-01-12

    申请号：GB8208115

    申请日：1982-03-19

    Applicant: SHIMADZU CORP

    Inventor： ICHIKAWA TETSUP ,  TSUNAZAWA YOSHIO ,  AKIYAMA OSAMU

    IPC: G01J1/36 ,  G01J3/42

    Abstract: A double-beam spectrophotometer comprising a light source, a monochromator, optical means for causing the monochromatic light beam from the monochromator to alternately advance along a pair of optical paths, the axes of which intersect generally perpendicularly to each other, a pair of cells each disposed in one of the two optical paths, and a photoelectric detector disposed at or adjacent the point of intersection of the pair of optical paths.

    12.
    发明专利
    未知

    公开(公告)号：DE3211724A1

    公开(公告)日：1982-12-02

    申请号：DE3211724

    申请日：1982-03-30

    Applicant: SHIMADZU CORP

    Inventor： AKIYAMA OSAMU ,  ICHIKAWA TETSUO ,  TSUNAZAWA YOSHIO

    IPC: G01J1/36 ,  G01J3/42 ,  G01J3/28 ,  G01N21/27

    Abstract: A double-beam spectrophotometer comprising a light source, a monochromator, optical means for causing the monochromatic light beam from the monochromator to alternately advance along a pair of optical paths, the axes of which intersect generally perpendicularly to each other, a pair of cells each disposed in one of the two optical paths, and a photoelectric detector disposed at or adjacent the point of intersection of the pair of optical paths.

    14.
    发明专利
    未知

    公开(公告)号：DE3339006C2

    公开(公告)日：1997-11-27

    申请号：DE3339006

    申请日：1983-10-27

    Applicant: SHIMADZU CORP

    Inventor： AKIYAMA OSAMU ,  HIRA RIKUO

    IPC: G01J3/04 ,  G01J3/12

    Abstract: A slit mechanism for use in a monochromator which is capable of changing not only the slit width but also the slit height. The slit mechanism is provided with a plurality of pairs of slits formed in a disk rotatable about an axis. The two slits in each pair have the same width and the same height, and each pair of slits have a different width from those of the other pairs of slits. The slit mechanism is further provided with at least one additional pair of slits having the same width as the width of, and a different height from the height of, a predetermined pair of the plurality of pairs of slits. All the pairs of slits are arranged circumferentially of a circle on the disk concentric with the axis of rotation of the disk, so that each pair of slits are positioned diametrically opposite to each other on the circle so as to serve as an entrance and an exit slit, respectively, for the monochromator. The slits may also be arranged on a disk circumferentially of two circles of different diameters concentric with each other and the axis of rotation of the disk, so that one slit in each pair is on one of the two circles while the other slit in the pair is on the other circle diametrically opposite to the one slit.

    16.
    发明专利
    未知

    公开(公告)号：DE3338203A1

    公开(公告)日：1984-05-03

    申请号：DE3338203

    申请日：1983-10-20

    Applicant: SHIMADZU CORP

    Inventor： AKIYAMA OSAMU

    IPC: G01N21/47 ,  G01N21/55

    Abstract: Apparatus for measuring the absolute reflectance of a sample, which comprises an integrating sphere provided with four windows the centers of which lie in a plane including the center of the integrating sphere. A first one of the four windows has its center coinciding with a diametrical line of the integrating sphere included in the plane while a second and a third window are arranged symmetrically with respect to the diametrical line, with a sample set in the fourth window so as to face inwardly of the integrating sphere. A light source is so arranged as to introduce a beam of light into the integrating sphere and a light measuring device is so arranged as to receive the light emerging from the integrating sphere. The integrating sphere is rotatable for 180 DEG about an axis coinciding with the above-mentioned diametrical line so that the integrating sphere selectively takes two positions thereby to change the operative positions of the second and third windows relative to the light source or the light measuring device. The data measured at each of the two positions of the integrating sphere are processed so as to obtain the absolute reflectance of the sample. The positions of the light source and the light measuring device relative to the windows of the integrating sphere may be exchanged to obtain a different type of absolute reflectance.

    SLIT MECHANISM FOR MONOCHROMATOR
    20.
    发明专利
    SLIT MECHANISM FOR MONOCHROMATOR 未知

    公开(公告)号：GB2131200A

    公开(公告)日：1984-06-13

    申请号：GB8327842

    申请日：1983-10-18

    Applicant: SHIMADZU CORP

    Inventor： AKIYAMA OSAMU ,  HIRA RIKUO

    IPC: G01J3/04

    Abstract: A slit mechanism for use in a monochromator which is capable of changing not only the slit width but also the slit height. The slit mechanism is provided with a plurality of pairs of slits formed in a disk rotatable about an axis. The two slits in each pair have the same width and the same height, and each pair of slits have a different width from those of the other pairs of slits. The slit mechanism is further provided with at least one additional pair of slits having the same width as the width of, and a different height from the height of, a predetermined pair of the plurality of pairs of slits. All the pairs of slits are arranged circumferentially of a circle on the disk concentric with the axis of rotation of the disk, so that each pair of slits are positioned diametrically opposite to each other on the circle so as to serve as an entrance and an exit slit, respectively, for the monochromator. The slits may also be arranged on a disk circumferentially of two circles of different diameters concentric with each other and the axis of rotation of the disk, so that one slit in each pair is on one of the two circles while the other slit in the pair is on the other circle diametrically opposite to the one slit.

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