METHOD AND DEVICE FOR SELECTING SHAPE OF OF UNEVEN SHAPE

    公开(公告)号:JPH09222309A

    公开(公告)日:1997-08-26

    申请号:JP5684096

    申请日:1996-02-19

    Abstract: PROBLEM TO BE SOLVED: To detect the plane size and the height of an uneven object accurately when detecting the uneven object due to scattered light from an inspection target. SOLUTION: An uneven object that is formed in projecting and/or recessed shape for a reference surface 31a of an inspection target on the inspection target is measured optically. In this case, light is applied to the above inspection target, scattered light from the inspection target is received and the intensity distribution of the scattered light is detected two-dimensionally, the size of the bottom surface of the uneven object is measured from the shape of a closed loop that is formed when the intensity distribution of the scattered light exceeds the slice level of a predetermined scattered light intensity, and at the same time the volume of the uneven object and the size of a side surface are measured from the integral value of the scattered light intensity within the closed loop.

    MANUFACTURE OF COMPOSITE FILM AND MANUFACTURE OF THIN FILM

    公开(公告)号:JPH0899346A

    公开(公告)日:1996-04-16

    申请号:JP16751995

    申请日:1995-07-03

    Abstract: PURPOSE: To provide a method wherein a composite film in which a transparent thin film having a required film thickness is laminated, and a transparent thin film having a highly precisely adjusted film thickness from the composite film can be easily manufactured. CONSTITUTION: A base film raw material in which a light-absorbing agent absorbing emitted light is mixed, and a thin, film raw material wherein refraction index after filming differs from that of the base film raw material are prepared. Two raw materials are simultaneously extruded by melting from a combined mouthpiece to make a composite film wherein a thin film 3 is laminated on a base film 2. In that case a surface of the thin film 3 is irradiated by a specific radiating angle with measuring light, and a thickness of the thin film is measured by using interference of reflected lights a-c from the thin film 3. An extruding gap of the combined mouthpiece is adjusted based on the thickness data so that the thickness of the thin film becomes a specific value. Further, when the thin film 3 is manufactured, the extrusion gap of the combined mouthpiece is adjusted so that the thickness of the thin film from a composite film becomes a required value. The thin film 3 is peeled off.

    AUTOMATIC ANALYZER
    14.
    发明专利

    公开(公告)号:JPH0643173A

    公开(公告)日:1994-02-18

    申请号:JP5155893

    申请日:1993-02-16

    Abstract: PURPOSE:To obtain a miniaturized automatic analyzer by reducing analysis processing time, achieving universal property for analysis items, and facilitating an emergency processing interrupt. CONSTITUTION:A specimen is placed into a specimen bath of a cartridge 30 where the specimen bath, a dilution bath, and three reaction baths are formed in one piece and then the specimen bath is set to a cartridge standby part 11. The set cartridge 30 is carried to a first reagent dispensing part 12, a first reaction path 13, a second reagent dispensing part 14, a second reaction path 15, a non-reaction component elimination part 16, a luminous reagent dispensing part 17, and a hydrogen peroxide dispensing part 18 by each carrier mechanism and a reagent is dispensed or is subjected to B/F separation, etc., by a reagent dispensing unit 50 and a non-reaction component eliminating unit 60. Finally, a reaction liquid is subjected to photometry by a photometry unit 70 at a photometry part 90 and then is carried to a cartridge delivery part 20. On the other hand, the photometry result is output from an output device 24.

    METHOD AND APPARATUS FOR DEFECT INSPECTION OF OBJECT TO BE INSPECTED

    公开(公告)号:JPH0933229A

    公开(公告)日:1997-02-07

    申请号:JP18753195

    申请日:1995-07-24

    Abstract: PROBLEM TO BE SOLVED: To obtain a method and an apparatus in which a defect existing only at the upper part of a periodic structure can be discriminated from a defect existing only at the lower part by judging that the defect was generated before the periodic structure is formed on a substrate, when picture element of a prescribed number or higher caused by a defect are detected within the range of an extent in a prescribed magnitude out of outputs by a one- dimensional sensor or a two-dimensional sensor. SOLUTION: Scattered and reflected light from the periodic structure of an object 2 to be inspected is Fourier-transformed by a Fourier transform lens 3. A spatial filter 4 has a pattern for light shielding in an image formation position corresponding to the periodic structure, and the scattered and reflected light caused by the periodic structure is shielded by the spatial filter 4, and it is not guided to an inverse Fourier transform lens 5. That is to say, only an image which is caused by a defect is formed on a light receiving part 6.

    AUTOMATIC ANALYZER
    16.
    发明专利

    公开(公告)号:JPH0743367A

    公开(公告)日:1995-02-14

    申请号:JP20879893

    申请日:1993-07-30

    Abstract: PURPOSE:To provide a downsized automatic analyzer which can conduct analysis efficiently. CONSTITUTION:A specimen is placed in a specimen tank of a cartridge 60 where the specimen tank, a dilution tank, and three reaction tanks are integrated and then it is set at a cartridge waiting section 21. The cartridge 60 thus set is then transferred sequentially through a first reagent dispensing section 23, a first reaction path 24, a second reagent dispensing section 25, a second reaction path 26, a nonreactive component removing section 27, an emission reagent dispensing section 28, and a hydrogen peroxide dispensing section 29 by means of a transfer mechanism. The cartridge 60 is lifted at each dispensing section and dispensation of reagent, B/F separation, etc., are conducted by means of a reagent dispensing unit 31 or a nonreactive component removing unit 32. The reaction liquid is finally sucked at a reaction liquid sucking section 30 and fed to a photometric section 35. The measured cartridge 60 is transferred to a cartridge discharging section 40.

    ANALYTIC CURVE CORRECTION METHOD OF AUTOMATIC ANALYZER AND ANALYTIC CURVE CORRECTING DEVICE OF AUTOMATIC ANALYZER

    公开(公告)号:JPH06242119A

    公开(公告)日:1994-09-02

    申请号:JP4752793

    申请日:1993-02-12

    Abstract: PURPOSE:To provide an analytic curve correction method and device for an automatic analyzer, by which an analytic curve can be corrected correctly and in a short time. CONSTITUTION:An immune test is performed by sequentially transporting plural cartridges 30S1-30S3 according to a test process. In each cartridge, a tested body vessel 31 where a tested body is divided and poured is integrated with three reaction vessels 33, 34, 35 for causing reaction. Before a tested body of a test subject is transported, the cartridges 30S1-30S3 for correcting an analytic curve are transported to correct an analytic curve. A simple tested body As1 is divided and poured in each reaction vessel 33 of the cartridges 30S1-30S3 for analytic curve correction, a sample tested body As2 is in each reaction vessel 34, and a sample tested body As3 is in each reaction vessel 35. The reaction vessels 33, 34, 35 of cartridges are subjected to dividing and pouring of sample, removal of unreacted component and photometry in parallel.

    FILM THICKNESS MEASURING METHOD
    18.
    发明专利

    公开(公告)号:JPH01287406A

    公开(公告)日:1989-11-20

    申请号:JP11794888

    申请日:1988-05-13

    Abstract: PURPOSE:To measure the thickness of a thin film with high accuracy by mixing a light absorbing agent which absorbs measurement light beams with a base material previously when measuring the thin film on a base material by utilizing a light interference. CONSTITUTION:When the composite film 7 consisting of a base material film 4 and extremely thin films 5 and 6 is irradiated with white parallel light beams at an angle theta, the incident light beams are reflected by the interface of air and the film 5 and the interface of films 4 and 5 to become reflected light beams (a) and (b), which interfere with each other. The incident light beams entering the film 4, on the other hand, are absorbed and attenuated by the light absorbing agent mixed therewith. Even if the light beams are reflected by the interface of the films 4 and 6 and the interface of the film 6 and air, they pass through the film 4 again on their return ways, so they are further absorbed and attenuated. Therefore, when the amount of the light absorbing agent mixed with the film 4 is proper, the reflected light beams are the same as that in case of one light-transmissive thin film. For the purpose, the light beams (a) and (b) are separated spectrally and maximum and minimum wavelengths are obtained from their waveforms, so that the thickness of the film 5 can be computed with high accuracy.

    LIGHT INTERFERENCE TYPE FILM THICKNESS MEASURING APPARATUS

    公开(公告)号:JPS63163105A

    公开(公告)日:1988-07-06

    申请号:JP31512986

    申请日:1986-12-25

    Abstract: PURPOSE:To perform highly accurate measurement by making it possible to increase the contrast between a light part and a dark part even when there is optical anisotropy, by arranging a polarizer so that a polarizing axis is set on the incident light path of white light in an arbitrary straight line polarizing direction. CONSTITUTION:The white light emitted from a white light source 1 is condensed to the pinhole on a pinhole 3 by a condenser 2 and further converted to parallel light by a collimator lens 4 to become only linear polarized light having the vibration direction of a P- or S-wave component by a polarizing plate 5 and said linear polarized light is incident to the incident point of an object 6 to be measured through the incident window of a condenser 7. The reflected light from the object 6 is guided to a fractionating lens 11 and only the same direction component of the emitted light of each optical fiber 10 among the reflected lights condensed to the condenser 7 is guided to an extracting pinhole plate 12 and a light having a light part and a dark part is amplified by an image intensifier 15 through a collimator lens 13, a plane diffraction lattice 14 and an image forming lens 15 and the intensity of light at every wavelength is detected on a linear image sensor 18. Then, the wavelengths of the light and dark parts are calculated to operate the film thickness of the object 6.

    DEFECT INSPECTION METHOD AND DEVICE

    公开(公告)号:JPH09222396A

    公开(公告)日:1997-08-26

    申请号:JP5684196

    申请日:1996-02-19

    Abstract: PROBLEM TO BE SOLVED: To improve the sensitivity for detecting defect on an inspection target and at the same time correct a detection sensitivity difference between a pattern part and a non-pattern part when a pattern is formed at the inspection target. SOLUTION: The defect of an inspection target with a light transmission substrate is detected by making light irradiate the inspection target and detecting scattered light from the above defect using a light reception means 36. In this case, a mirror surface body 38 is provided at the counter light reception means side of the inspection target and at least direct scattered light from a defect due to the above irradiation light and indirect scattered light due to the indirect irradiation light irradiating the defect after the above irradiation light is transmitted through the inspection target and is reflected by the mirror surface body are detected by the light reception means 36.

Patent Agency Ranking