公开(公告)号：US20240297018A1

公开(公告)日：2024-09-05

申请号：US18589744

申请日：2024-02-28

Applicant: Tokyo Electron Limited

Inventor： Taro IKEDA ,  Yuki OSADA ,  Hiroyuki MIYASHITA

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/3211 ,  H01J2237/327

Abstract: A distributor for distributing electromagnetic waves to a plurality of output terminals, the distributor includes: a power supply terminal configured to be electrically connected to a radio-frequency power source configured to be capable of varying frequency; and a plurality of filters provided respectively at the plurality of output terminals to which the electromagnetic waves input to the power supply terminal are distributed. The plurality of filters is configured to have different frequency characteristics.

公开(公告)号：US20230178340A1

公开(公告)日：2023-06-08

申请号：US18058989

申请日：2022-11-28

Applicant: Tokyo Electron Limited

Inventor： Isao GUNJI ,  Hiroyuki MIYASHITA

IPC: H01J37/32

CPC classification number: H01J37/32238 ,  H01J37/32449

Abstract: A plasma processing apparatus includes: a processing container; a ceiling wall forming a part of the processing container and including an opening; and a transmission window configured to close the opening, wherein the opening under the transmission window is formed as a recess portion, wherein the recess portion is a supply port for supplying electromagnetic waves from the transmission window into the processing container, wherein first gas supply holes are formed on a lower surface of the ceiling wall, and wherein second gas supply holes are formed on an inner surface of the recess portion.

公开(公告)号：US20230033323A1

公开(公告)日：2023-02-02

申请号：US17869362

申请日：2022-07-20

Applicant: Tokyo Electron Limited

Inventor： Taro IKEDA ,  Yuki OSADA ,  Hiroyuki MIYASHITA ,  Hiroyuki ONODA ,  Satoru KAWAKAMI

IPC: H01J37/32

Abstract: There is provided a plasma source comprising a first chamber configured to form a flat first plasma generation space, and having a first wall and a second wall, a gas supply configured to supply gas into the first chamber, an electromagnetic wave supply having a dielectric window that is provided in an opening provided in the first wall to face the first plasma generation space, and configured to supply an electromagnetic wave through the dielectric window into the first chamber. The plasma source comprises a plasma supply configured to supply radicals contained in plasma that is generated from the gas supplied into the first chamber by the electromagnetic wave to an outside of the first chamber, and a plasma ignition source provided in the first chamber to protrude from an inner wall of the second wall facing the dielectric window and to be separated from the dielectric window.

公开(公告)号：US20190074166A1

公开(公告)日：2019-03-07

申请号：US16122226

申请日：2018-09-05

Applicant: TOKYO ELECTRON LIMITED

Inventor： Taro IKEDA ,  Tomohito KOMATSU ,  Yuki OSADA ,  Hiroyuki MIYASHITA ,  Susumu SAITO ,  Kazuhiro FURUKI ,  Mikio SATO ,  Eiki KAMATA

IPC: H01J37/32

Abstract: A plasma probe device includes an antenna unit installed at an opening formed in a wall of a processing chamber or a mounting table through a sealing member configured to seal between a vacuum space and an atmospheric space, an electrode connected to the antenna unit, and a dielectric support portion made of a dielectric material and configured to support the antenna unit from an outer peripheral side. A surface of the antenna unit which is exposed through the opening and separated from a facing surface of the wall or the mounting table facing the antenna unit by a width is depressed from a surface of the wall or the mounting table where the opening is formed, which faces a plasma generation space.