公开(公告)号：US20080273188A1

公开(公告)日：2008-11-06

申请号：US11797358

申请日：2007-05-02

Applicant: Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Niels Machiel Driessen ,  Vadim Yevgenyevich Banine ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Derk Jan Wilfred Klunder

Inventor： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Niels Machiel Driessen ,  Vadim Yevgenyevich Banine ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Derk Jan Wilfred Klunder

IPC: G03B27/74

CPC classification number: G03F7/70916 ,  G03F7/70558 ,  G03F7/7085

Abstract: A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.

Abstract translation: 一个装置被安排来测量与辐射有关的数量。 该装置包括被配置为测量该数量的传感器，布置成保护传感器免受从被配置为发射极紫外辐射的源射出的入射颗粒的屏幕，以及被配置为重定向由该源发射的超过紫外线的过滤器， 到传感器。

公开(公告)号：US20080159471A1

公开(公告)日：2008-07-03

申请号：US11645808

申请日：2006-12-27

Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC: G21K5/00

CPC classification number: H05G2/003 ,  G03F7/70916

Abstract: A debris mitigation system for trapping debris coming from a tin debris-generating radiation source is provided. The debris mitigating system includes a debris barrier comprising a plurality of foils, and a cleaning system constructed and arranged to clean the foils. The cleaning system includes a supply unit to provide a liquid alloy to the foils to dissolve and flush trapped debris from the foils. The alloy includes gallium, indium, tin, or any combination thereof.

Abstract translation: 提供了用于捕获来自产生锡屑的辐射源的碎片的碎片缓解系统。 碎片减轻系统包括包括多个箔片的碎片屏障，以及构造和布置成清洁箔片的清洁系统。 清洁系统包括供应单元，以向箔提供液体合金以溶解和冲洗来自箔的被捕获的碎屑。 该合金包括镓，铟，锡或其任何组合。

公开(公告)号：US08405051B2

公开(公告)日：2013-03-26

申请号：US12997149

申请日：2009-06-09

Applicant: Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

Inventor： Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

IPC: G03F7/20

CPC classification number: G03F7/70925

Abstract: A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2, and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.

Abstract translation: 一种用于去除装置的无盖多层反射镜上的沉积的方法。 该方法包括在装置的至少一部分中提供包括H2，D2和DH中的一种或多种的气体，以及选自烃化合物和/或硅烷化合物的一种或多种另外的化合物; 从气体产生氢和/或氘自由基和一种或多种另外的化合物的基团; 并且使具有沉积的未封盖的多层反射镜与至少部分氢和/或氘基和一种或多种另外的化合物的基团接触以除去至少部分沉积物。

公开(公告)号：US20110257671A1

公开(公告)日：2011-10-20

申请号：US13141350

申请日：2009-11-10

Applicant: Karen Irene Trovato ,  Wouter Anthon Soer

Inventor： Karen Irene Trovato ,  Wouter Anthon Soer

IPC: A61B17/34

CPC classification number: A61B17/3421 ,  A61B17/3494 ,  A61B34/30 ,  A61B2017/00026 ,  A61B2017/003 ,  A61B2017/00991 ,  A61B2017/3443 ,  A61B2034/301 ,  A61B2090/0801

Abstract: A contact detection method (70) involves a navigation of a contact detection tube (20′) within an open space of an anatomical region (50) of a body. The contact detection tube includes a tubular wall (21) having an interior surface (23) defining a working channel (24), and an electrode (30) integrated in the tubular wall (21). The electrode (30) electrically connects the contact detection tube (20′) to an electrically conductive object (41, 52) (e.g., biological tissue or a medical instrument/tool) in physical contact with an exterior surface (22) of the tubular wall (21) and electrically isolates the working channel (24) from any electrical connection of the tube (20′) to the object (41, 52). The method (70) further involves a determination of a contact status of the contact detection tube (20′) between an open state (i.e., no physical contact) and a closed state (i.e., physical contact).

Abstract translation: 接触检测方法（70）涉及在身体的解剖区域（50）的开放空间内的接触检测管（20'）的导航。 接触检测管包括具有限定工作通道（24）的内表面（23）和集成在管状壁（21）中的电极（30））的管状壁（21）。 电极（30）将接触检测管（20'）电连接到与管状物的外表面（22）物理接触的导电物体（41,42）（例如，生物组织或医疗仪器/工具） 壁（21）并且将工作通道（24）与管（20'）的任何电连接与物体（41,42）电隔离。 方法（70）还包括在打开状态（即，没有物理接触）和闭合状态（即物理接触）之间确定接触检测管（20'）的接触状态。

公开(公告)号：US20110199600A1

公开(公告)日：2011-08-18

申请号：US13124501

申请日：2009-09-03

Applicant: Wouter Anthon Soer

Inventor： Wouter Anthon Soer

IPC: G03B27/54

CPC classification number: G03F7/70825 ,  G03F7/70175 ,  G21K2201/06

Abstract: A collector assembly includes a first collector mirror for reflecting radiation from a radiation emission point, such as an extreme ultraviolet radiation emission point, to an intermediate focus from where the radiation is used in the lithography apparatus for device manufacture. A second collector mirror, forward of the radiation emission point, collects additional radiation, reflecting it back to a third mirror and from there to the intermediate focus. The mirrors may allow radiation to be collected with high efficiency and without increase in the etendue. The collector assembly may reduce or remove non-uniformity in the collected radiation, for instance arising from obscuration of collected radiation by a laser beam stop used to prevent laser excitation radiation from entering the lithographic apparatus.

Abstract translation: 收集器组件包括用于将来自辐射发射点（例如极紫外辐射发射点）的辐射反射到用于设备制造的光刻设备中的辐射的中间焦点的第一收集器镜。 辐射发射点前方的第二个收集镜收集额外的辐射，将其反射回第三个反射镜并从那里到中间焦点。 反射镜可以允许以高效率收集辐射，而不增加光密度。 收集器组件可以减少或消除收集的辐射中的不均匀性，例如由于用于防止激光激发辐射进入光刻设备的激光束停止而收集的辐射的遮蔽而引起的。

公开(公告)号：US20110007289A1

公开(公告)日：2011-01-13

申请号：US12920065

申请日：2009-02-23

Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC: G03B27/52 ,  H05H1/24

CPC classification number: H05G2/003 ,  H05G2/005

Abstract: A device is constructed and arranged to generate radiation by using an electrical discharge through a gaseous medium. The device includes a first electrode and a second electrode, and a liquid supply arranged to provide a liquid to a location in the device. The device is arranged to be electrically supplied with a voltage and to supply the voltage at least partially to the first electrode and the second electrode in order to allow the electrical discharge to be generated in an electrical field created by the voltage. The electrical discharge produces a radiating plasma. The device also includes a shield arranged between the discharge location and a conducting part connected to the first electrode and/or the second electrode.

Abstract translation: 一种器件被构造和布置成通过使用通过气体介质的放电来产生辐射。 该装置包括第一电极和第二电极，以及液体供应装置，其被布置成将液体提供到装置中的位置。 该装置被布置成电气供应电压并且至少部分地将电压提供给第一电极和第二电极，以便允许在由该电压产生的电场中产生放电。 放电产生辐射等离子体。 该装置还包括布置在放电位置和连接到第一电极和/或第二电极的导电部件之间的屏蔽。

公开(公告)号：US20100328639A1

公开(公告)日：2010-12-30

申请号：US12826459

申请日：2010-06-29

Applicant: Martin Jacobus Johan Jak ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Denis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

Inventor： Martin Jacobus Johan Jak ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Denis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

IPC: G03B27/72 ,  G02B5/20 ,  B29D11/00

CPC classification number: G03B27/72 ,  G02B5/204 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in carrier material such as silicon by an anisotropic etching process and topped with a reflective layer such as Mo metal, Ru metal, TiN or RuO. A diffusion barrier layer such as silicon nitride Si3N4, or silicon dioxide SiO2 is provided between the metal and the semiconductor to prevent diffusion and silicidation of the metal at elevated temperatures. The diffusion barrier layer may also serve as a hydrogen-resistant layer on parts of the semiconductor which are not beneath the reflective layer, and/or enhance emissivity for removal of heat from the structure.

Abstract translation: 透射光谱纯度滤光器被配置为透射极紫外辐射。 光谱纯度滤光器包括具有多个孔以便透射极紫外辐射并抑制第二类辐射的透射的滤光器部分。 孔可以通过各向异性蚀刻工艺在诸如硅的载体材料中制成，并且覆盖有诸如Mo金属，Ru金属，TiN或RuO的反射层。 在金属和半导体之间设置有诸如氮化硅Si 3 N 4或二氧化硅SiO 2的扩散阻挡层，以防止金属在升高的温度下扩散和硅化。 扩散阻挡层还可以在半导体的不在反射层下面的部分上用作耐氢层，和/或增加用于从结构去除热量的发射率。

公开(公告)号：US07839482B2

公开(公告)日：2010-11-23

申请号：US11802258

申请日：2007-05-21

Applicant: Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen

Inventor： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC: G03B27/52 ,  G03B27/54 ,  G03B27/72

CPC classification number: G03B27/42 ,  G03F7/70175 ,  G03F7/70916

Abstract: An assembly including a radiation reflector and a contaminant barrier is disclosed. The contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards the contaminant barrier.

Abstract translation: 公开了一种包括辐射反射器和污染物屏障的组件。 污染物屏障布置成接收来自辐射源的辐射并将该辐射反射到辐射反射器，并且辐射反射器布置成将从污染物屏障接收的辐射反射回污染物屏障。

公开(公告)号：US07759663B1

公开(公告)日：2010-07-20

申请号：US11634385

申请日：2006-12-06

Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC: H01J35/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/003 ,  H05G2/005

Abstract: A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.

Abstract translation: 公开了具有自阴影电极的辐射源。 源自电极的碎片减少。 从电极到EUV光学器件的路径被部分电极自身阻挡（称为自阴影）。 这可能会显着减少电极产生的碎片的数量。

公开(公告)号：US20100141909A1

公开(公告)日：2010-06-10

申请号：US12519077

申请日：2007-11-27

Applicant: Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailòvitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer ,  Denis Alexandrovich Glushkov

Inventor： Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailòvitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer ,  Denis Alexandrovich Glushkov

IPC: G03B27/54 ,  G21K5/04

CPC classification number: G03F7/70933 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract translation: 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。