公开(公告)号：WO1993001328A1

公开(公告)日：1993-01-21

申请号：PCT/US1992004257

申请日：1992-05-20

Applicant: SEMATECH, INC.

Inventor： SEMATECH, INC. ,  GEYLING, Franz, T.

IPC: C23C16/44

CPC classification number: C23C16/45508 ,  C23C16/455 ,  C23C16/45512 ,  C23C16/45519 ,  C23C16/45591 ,  Y10S438/976 ,  Y10T29/41

Abstract: A rapid switching rotating disk reactor (25) has an elongated injector (16) for injecting an inert gas into the chamber (10) of a rotating disk reactor (25). The nozzle of the injector (7) is proximate to the center of the rotating wafer (12) for the purpose of providing an inert gas flow to produce an inert gas boundary layer above the wafer (12). Whenever the environment of the chamber is to be changed by an introduction of another fluid medium, the injector (16) is activated to provide an inert boundary layer attop the semiconductor wafer, wherein any processing caused by the reactive gases in the chamber (10) is prevented from occurring. Once the chamber (10) is filled with the subsequent fluid medium, the injector (16) is turned off in order for the next processing to commence.

Abstract translation: 快速切换旋转盘式反应器（25）具有用于将惰性气体注入旋转盘式反应器（25）的腔室（10）中的细长喷射器（16）。 喷射器（7）的喷嘴靠近旋转晶片（12）的中心，用于提供惰性气体流以在晶片（12）上方产生惰性气体边界层。 每当通过引入另一种流体介质来改变室的环境时，喷射器（16）被激活，以在半导体晶片的顶部提供惰性边界层，其中由腔室（10）中的反应性气体引起的任何处理， 被防止发生。 一旦腔室（10）填充有随后的流体介质，则注射器（16）被关闭，以便开始下一个处理。

公开(公告)号：WO1992012474A1

公开(公告)日：1992-07-23

申请号：PCT/US1991006963

申请日：1991-09-24

Applicant: SEMATECH, INC.

Inventor： SEMATECH, INC. ,  ANDERSON, Richard, L.

IPC: G05D07/06

CPC classification number: G05D7/0635 ,  Y10T137/7737 ,  Y10T137/7759 ,  Y10T137/7761

Abstract: An intelligent mass flow controller for controlling the mass flow of gas to a semiconductor processing chamber. A sensing circuit measures a difference in temperature across a sensing tube and translates this difference to adjust a valve for controlling the mass flow. A microcontroller which includes a CPU, signal processing and software routines continually monitors the various parameters and provide 'on the fly' corrections, as well as providing diagnostics and record retention.

公开(公告)号：IL107865A

公开(公告)日：1996-12-05

申请号：IL10786593

申请日：1993-12-03

Applicant: SEMATECH INC

IPC: H01L21/677 ,  F24F7/06 ,  E04H5/00 ,  B01L1/04

Abstract: A building houses a semiconductor manufacturing facility, which is circular in shape and is of a multi-story structure. A silo is located at the center for use in storing and transferring wafers to clean rooms disposed radially around the silo at each floor. Human access is not permitted in the silo and in the clean rooms in order to prevent contamination of the wafers. Due to the modularity of the clean room structures, clean rooms can be reconfigured easily without significant impact on the on-going manufacturing operation. The modularity also permits portions of the facility to be deactivated when not needed.

公开(公告)号：AU5749494A

公开(公告)日：1994-08-15

申请号：AU5749494

申请日：1993-12-13

Applicant: SEMATECH INC

Inventor： VASUDEV PRAHALAD K ,  LOW KAH KUEN

IPC: G03F1/26 ,  G03F1/32 ,  G03F1/34 ,  H01L21/027 ,  G03F1/14 ,  G03F7/09

公开(公告)号：AU8769191A

公开(公告)日：1992-04-28

申请号：AU8769191

申请日：1991-09-24

Applicant: SEMATECH INC

Inventor： ANDERSON RICHARD L

IPC: H05H1/00

公开(公告)号：AU5677194A

公开(公告)日：1995-04-03

申请号：AU5677194

申请日：1993-11-24

Applicant: SEMATECH INC

Inventor： SCOTT RICHARD G ,  SHACKLETON CRAIG R ,  ELLIS RAYMOND W

IPC: F24F7/06 ,  H01L21/677 ,  H01L21/00

Abstract: A building houses a semiconductor manufacturing facility, which is circular in shape and is of a multi-story structure. A silo is located at the center for use in storing and transferring wafers to clean rooms disposed radially around the silo at each floor. Human access is not permitted in the silo and in the clean rooms in order to prevent contamination of the wafers. Due to the modularity of the clean room structures, clean rooms can be reconfigured easily without significant impact on the on-going manufacturing operation. The modularity also permits portions of the facility to be deactivated when not needed.

公开(公告)号：DE69106893D1

公开(公告)日：1995-03-02

申请号：DE69106893

申请日：1991-09-24

Applicant: SEMATECH INC

Inventor： ANDERSON RICHARD

IPC: G01F1/68 ,  G01F1/696 ,  G05D7/06

Abstract: An intelligent mass flow controller for controlling the mass flow of gas to a semiconductor processing chamber. A sensing circuit measures a difference in temperature across a sensing tube and translates this difference to adjust a valve for controlling the mass flow. A microcontroller which includes a CPU, signal processing and software routines continually monitors the various parameters and provide "on the fly" corrections, as well as providing diagnostics and record retention.

公开(公告)号：AU8753791A

公开(公告)日：1992-08-17

申请号：AU8753791

申请日：1991-09-24

Applicant: SEMATECH INC

Inventor： ANDERSON RICHARD L

IPC: G01F1/68 ,  G01F1/696 ,  G05D7/06

Abstract: An intelligent mass flow controller for controlling the mass flow of gas to a semiconductor processing chamber. A sensing circuit measures a difference in temperature across a sensing tube and translates this difference to adjust a valve for controlling the mass flow. A microcontroller which includes a CPU, signal processing and software routines continually monitors the various parameters and provide "on the fly" corrections, as well as providing diagnostics and record retention.

公开(公告)号：WO2007044934A2

公开(公告)日：2007-04-19

申请号：PCT/US2006/040262

申请日：2006-10-12

Applicant: SEMATECH, INC. ,  DIEBOLD, Alain, Charles ,  PRICE, James, Martin

Inventor： DIEBOLD, Alain, Charles ,  PRICE, James, Martin

IPC: G01B11/06 ,  G01N21/21 ,  H01L21/66

CPC classification number: G01B11/0641

Abstract: Methods for characterizing a semiconductor material using optical metrology are disclosed. In one respect, a electromagnetic radiation source may be directed in a direction substantially parallel to patterns on a semiconductor material. A polarized spectroscopic reflectivity may be obtained, and a critical point data may be determined. Using the critical point data, physical dimensions of the patterns may be determined. In other respects, using optical metrology techniques, a critical point data relating to electron mobility may be determined.

Abstract translation: 公开了用于使用光学度量衡表征半导体材料的方法。 在一个方面，电磁辐射源可以在基本上平行于半导体材料上的图案的方向上被引导。 可以获得偏振光谱反射率，并且可以确定临界点数据。 使用临界点数据，可以确定图案的物理尺寸。 在其他方面，使用光学计量技术，可以确定与电子迁移率有关的临界点数据。

公开(公告)号：WO1995008184A1

公开(公告)日：1995-03-23

申请号：PCT/US1993011427

申请日：1993-11-24

Applicant: SEMATECH, INC.

Inventor： SEMATECH, INC. ,  SCOTT, Richard, G. ,  SHACKLETON, Craig, R. ,  ELLIS, Raymond, W.

IPC: H01L21/00

CPC classification number: H01L21/67712 ,  H01L21/67727

Abstract: A building houses a semiconductor manufacturing facility, which is circular in shape and is of a multi-story structure. A silo is located at the center for use in storing and transferring wafers to clean rooms disposed radially around the silo at each floor. Human access is not permitted in the silo and in the clean rooms in order to prevent contamination of the wafers. Due to the modularity of the clean room structures, clean rooms can be reconfigured easily without significant impact on the on-going manufacturing operation. The modularity also permits portions of the facility to be deactivated when not needed.

Abstract translation: 一座建筑物是半圆形的制造设施，圆形的形状是多层结构。 仓库位于中心，用于将晶片存储和转移到在每个楼层处放置在筒仓周围的洁净室。 为了防止晶片的污染，在筒仓和洁净室中不允许人员进入。 由于洁净室结构的模块化，洁净室可以轻松重新配置，而不会对正在进行的制造操作产生重大影响。 模块化还允许设施的部分在不需要时被去激活。