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公开(公告)号：EP0151985A3
公开(公告)日：1987-10-28
申请号：EP85100738
申请日：1985-01-25
Applicant: MITA INDUSTRIAL CO. LTD.
Inventor： Yamamoto, Kanjiro
IPC: G02B05/08
CPC classification number: G02B5/08 , G02B5/0808 , G02B5/0866 , Y10T428/31681 , Y10T428/31688 , Y10T428/31692
Abstract: A reflecting plate comprising a substrate, a synthetic resin interlayer formed on the surface of the substrate, and a thin metallic film formed on the synthetic resin interlayer. The reflecting plate may further comprise a transparent synthetic resin layer on the surface of the thin metallic film. A typical use of the reflecting plate is with an illuminating lamp is an electrostatic copying apparatus.
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公开(公告)号：EP0252734A3
公开(公告)日：1988-10-26
申请号：EP87306037
申请日：1987-07-08
Applicant: CANON KABUSHIKI KAISHA
Inventor： Suzuki, Masayuki , Mochizuki, Noritaka , Minami, Setsuo , Ogura, Shigetaro , Fukuda, Yasuaki , Watanabe, Yutaka , Kawai, Yasuo , Kariya, Takao
CPC classification number: B82Y10/00 , G02B17/0636 , G03F7/2039 , G03F7/70033 , G03F7/70233 , G03F7/7025 , G03F7/70691 , G03F7/70866 , G03F7/70875 , G03F7/70883 , G03F7/70891
Abstract: An X-ray exposure apparatus includes a stage (MS) for holding a mask having a pattern for circuit manufacturing, a stage (MF) for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including reflecting mirror arrangement, containing at least three but not more than five reflecting mirrors (M1,M2,M3) coated with multi-layer films, for receiving X-rays from the mask and directing then to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
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公开(公告)号：EP0180979A3
公开(公告)日：1988-09-14
申请号：EP85114139
申请日：1985-11-06
Applicant: Dane, John A.
Inventor： Dane, John A.
CPC classification number: G02B7/183 , F24S20/20 , F24S23/71 , F24S23/74 , F24S25/13 , F24S30/452 , F24S2023/874 , F24S2030/145 , Y02E10/41 , Y02E10/42 , Y02E10/45 , Y02E10/47
Abstract: A parabolic reflector having support structure, mounted upon a rotatable track, for supporting a parabolic dish framework to which is mounted one or more support panels to which, in turn, are pivotally mounted a plurality of reflectors for focusing rays on a linear collector. The support panels include a plurality of concave recesses operable to receive bowl-shaped reflectors provided with polygonal rims so that the sides of adjacent reflectors will be in registry with one another. The support panels are provided with bolts, outwardly extending from the base of each recess, the bolts being received in slotted apertures in each reflector bowl for pivoting and fastening the reflector in a pre-selected position for focusing solar rays upon the collector. The collector includes a heat exchange media operable to conduct heat at extremely high temperatures for production of steam. A novel tracking system is also provided.
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公开(公告)号：EP0174030A3
公开(公告)日：1988-01-27
申请号：EP85111302
申请日：1985-09-06
Applicant: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
Inventor： Hasuda, Yoshinori , Sasaki, Shigekuni , Ichino, Toshihiro
CPC classification number: B32B9/045 , B32B15/08 , B32B27/08 , B32B27/281 , B32B27/322 , B32B27/36 , B32B2255/10 , B32B2255/205 , B32B2307/304 , C08G65/4012 , C08L71/00 , C08L79/08 , C23C28/00 , F24S23/81 , G02B5/0866 , G02B5/208 , Y02E10/40 , Y10T428/24967 , Y10T428/31544 , Y10T428/31678 , Y10T428/31681 , Y10T428/31688 , Y10T428/31692 , Y10T428/31721
Abstract: A flexible optical solar reflector (FOSR) which may be also used as an outermost layer of a multilayer thermal insulator comprising:
a heat radiation layer (2) of a resin selected from the group consisting of poly [(4'-phenoxy-4-carbonyl)diphenyl ether] represented by the following general formula of:
and poly (ether imide) represented by the following general
wherein R is a meta-substituted phenyl group, a para-substituted phenyl group or a 4,4'-substituted phenyl ether group; and a solar light reflecting layer (1) disposed on said heat radiation layer (2) and made of a thin coating of a metal selected from the group consisting of silver and aluminium, A CeO 2 covering layer may be disposed over the heat radiation layer. The FOSR is excellent in resistance to ultraviolet rays, particularly in resistance to electron beam, and superior in optical and mechanical properties.-
公开(公告)号：EP0163200A3
公开(公告)日：1987-08-19
申请号：EP85105960
申请日：1985-05-14
Applicant: THE PERKIN-ELMER CORPORATION
Inventor： Roy, Rustum , Alamo, Jaime
CPC classification number: G02B5/08 , C04B35/447 , G02B1/02 , Y10S359/90
Abstract: A low expansion ceramic material has a composition represented by the molecular formula i (Na) j (Zr 2-z Na 4z ) k (P 3-x Na x Si x ) O 12 in which the molar proportions i, j and k are each within the range from about 0.9 to about 1.1, and i + j + k equal 3; and, for molar proportions i, j and k each equal to 1.0, the ceramic composition falls within the area defined by the points A, B, C, and D in a quarternary diagram of Si0 2 , Na 2 0, P 2 O 5 and ZrO 2 , the coordinates of the points being:
The ceramic material is especially suitable as a substrate for optically reflecting films.-
Patent Agency Ranking
公开(公告)号：EP0099437A3
公开(公告)日：1984-10-24
申请号：EP82306542
申请日：1982-12-08
Applicant: Leach, Roger John
Inventor： Leach, Roger John
CPC classification number: B32B5/18 , G02B7/182 , Y10T428/249989
Abstract: In a shockproof mirror of the kind comprising a glass or plastics sheet or film backed with a reflecting layer which is bonded to a flexible and resiliently compressible foam pad by means of which the whole is intended to be glued to a substantially rigid support structure, e.g. wall or ceiling, by means of an adhesive composition containing a volatile liquid component, degradative attack of the foam and/or of the adhesive bond between the foam and the reflecting layer by said volatile adhesive component is reduced or prevented by heat bonding a substantially impermeable polyurethane skin to the exposed face of the foam.
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公开(公告)号：EP0177834A3
公开(公告)日：1988-08-03
申请号：EP85112109
申请日：1985-09-24
Applicant: FLACHGLAS AKTIENGESELLSCHAFT
Inventor： Groth, Rolf, Dr. Dipl.-Phys.
CPC classification number: G02B5/0858 , B60R1/083 , C03C17/36 , C03C17/3607 , C03C17/3649 , C03C17/3663 , G02B1/00
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18.发明公开
公开(公告)号：EP0176935A3
公开(公告)日：1988-07-27
申请号：EP85112110
申请日：1985-09-24
Applicant: FLACHGLAS AKTIENGESELLSCHAFT
Inventor： Groth, Rolf,Dr.Dipl.-Phys.
CPC classification number: G02B5/0858 , B60R1/083 , C03C17/36 , C03C17/361 , C03C17/3642 , C03C17/3663 , G02B5/0875 , G02B5/26
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公开(公告)号：EP0144053A3
公开(公告)日：1987-08-26
申请号：EP84114267
申请日：1984-11-26
Applicant: NIPPONDENSO CO., LTD.
Inventor： Ohmi, Shinya , Itoh, Hiroshi , Fukada, Tsuyoshi , Suzuki, Yasutoshi , Hara, Kunihiko
CPC classification number: B60R1/088 , G02B7/1827 , G02F1/153
Abstract: This invention discloses a glare-shielding reflector which controls light reflectance electrically. The present invention provides a glare-shielding type reflector having a photosensor block which can detect an incident angle of a luminous flux to the reflector and a glare-shielding layer which is divided into plural units and driven individually. A glare-shielding layer formed on a front surface of a mirror is divided into plural units and only the specified glare-shielding units are automatically put into a glare-shielding state, according to the incident angle of the luminous flux to the mirror.
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公开(公告)号：EP0111957A3
公开(公告)日：1984-07-25
申请号：EP83201703
申请日：1983-12-01
Applicant: N.V. Philips' Gloeilampenfabrieken
CPC classification number: G11B23/0057 , C03C17/38 , C23C14/02 , C23C14/024
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