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    Spatial coordinate positioning system
    191.
    发明授权
    Spatial coordinate positioning system 有权

    公开(公告)号：US11960022B2

    公开(公告)日：2024-04-16

    申请号：US17434758

    申请日：2019-04-18

    Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY

    Inventor： Ho-Jae Lee

    IPC: G01S5/14 ,  G01B5/004 ,  G01S5/02

    CPC classification number: G01S5/14 ,  G01B5/004 ,  G01S5/0236

    Abstract: The present invention relates to a spatial coordinate positioning system, particularly to a spatial coordinate positioning system which is capable of measuring a position of spatial positioning target in high-precision by calculating spatial coordinates of assistant point stations at a predetermined interval on the basis of a coordinate of a ground base point station and distance information between the assistant point stations in a space where the plurality of assistant point stations are installed of which coordinates were unknown.

    Two-vane pump and design method of two-vane pump for wastewater using machine learning
    192.
    发明授权
    Two-vane pump and design method of two-vane pump for wastewater using machine learning 有权

    公开(公告)号：US11953023B2

    公开(公告)日：2024-04-09

    申请号：US17466755

    申请日：2021-09-03

    Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY

    Inventor： Jin Hyuk Kim ,  Sung Kim ,  Sang Bum Ma

    IPC: G06F30/27 ,  F04D1/06 ,  F04D7/04 ,  F04D29/22 ,  F04D29/30 ,  F04D29/44 ,  G06F30/17 ,  G06N3/086

    CPC classification number: F04D29/445 ,  F04D1/06 ,  F04D7/04 ,  F04D29/225 ,  F04D29/30 ,  G06F30/17 ,  G06F30/27 ,  G06N3/086

    Abstract: The present disclosure relates to a two-vane pump for wastewater and a design method of a two-vane pump for wastewater using machine learning, and more particularly, a design method of a two-vane pump using machine learning capable of having efficiency of a target head and performing optimal design for sizes of solids that can pass through and a two-vane pump for wastewater according to the machine learning. According to the present disclosure, there is provided a design method of two-vane pump for wastewater using machine learning, including: a) setting an objective function; b) setting design variables of the impeller and volute for deriving the set objective function and a range of each design variable; c) deriving a plurality of experimental points including values of the design variables within the range of the design variable; d) generating an input value by calculating the value of the objective function through numerical analysis of each of the derived experimental points; e) constructing a surrogate model through machine learning for the input value; and f) deriving an optimal design of the two-vane pump for wastewater from the constructed surrogate model.

    Multi-prober chuck assembly and channel
    195.
    发明授权
    Multi-prober chuck assembly and channel 有权

    公开(公告)号：US11686762B2

    公开(公告)日：2023-06-27

    申请号：US17297657

    申请日：2019-11-25

    Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY

    Inventor： Kyung Tae Nam ,  Seung Joon Lee ,  Kwang Hee Lee

    IPC: G01R31/28 ,  G01R1/073

    CPC classification number: G01R31/2865 ,  G01R1/07307

    Abstract: A multi-prober chuck assembly and channel are provided. The multi-prober chuck assembly, according to one embodiment of the present invention, comprises: a chuck for supporting a wafer; a probe card structure coupled to the top part of the chuck; a heater for heating the chuck under the chuck; a conductive guard plate spaced apart from the heater below the heater; and a body part positioned under the chuck so that the heater and the guard plate are positioned inside the body part, wherein the probe card structure and the body part are coupled mechanically to form a cartridge-type structure.

    Method of manufacturing a metal hybrid, heat-dissipating material
    198.
    发明授权
    Method of manufacturing a metal hybrid, heat-dissipating material 有权

    公开(公告)号：US11383297B2

    公开(公告)日：2022-07-12

    申请号：US16400412

    申请日：2019-05-01

    Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY

    Inventor： Ik Hyun Oh ,  Hyun Kuk Park ,  Jun Ho Jang ,  Hyun Rok Cha ,  Jeong Han Lee

    IPC: B22F1/00 ,  B22F3/16

    Abstract: A method of manufacturing a metal hybrid, heat-dissipating material includes the steps of (a) preparing a spherical metal powder and a flake graphite powder having an aspect ratio greater than 1, respectively; (b) preparing a powder mixture by inserting only the spherical metal powder and the flake graphite powder into a container, followed by dry mixing the powder mixture using a multi-axial mixing method for rotating or vibrating the container about two or more different rotation axes without any liquid input and without any mixing aids; (c) manufacturing a green compact by pressing the powder mixture; and (d) sintering the green compact to provide the metal hybrid, heat-dissipating material.

    DIELECTRIC SUBSTANCE-ELECTRODE ASSEMBLY AND METHOD OF MANUFACTURING THE SAME
    199.
    发明申请
    DIELECTRIC SUBSTANCE-ELECTRODE ASSEMBLY AND METHOD OF MANUFACTURING THE SAME 有权

    公开(公告)号：US20220166001A1

    公开(公告)日：2022-05-26

    申请号：US17388010

    申请日：2021-07-29

    Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY

    Inventor： Taeg Woo LEE ,  O Hyung KWON ,  Hyung Giun KIM

    IPC: H01M4/04 ,  H01L21/683

    Abstract: Disclosed are a dielectric substance-electrode assembly in which an electrode is coated with a dielectric and a method for manufacturing the same. The dielectric substance-electrode assembly is formed by forming a lower dielectric electrode constituting a lower portion of an assembly body, sealing a capsule filled with a treated powder and a lower dielectric in which an electrode is formed, and forming an upper dielectric constituting an upper portion of the assembly body using the treated powder which is diffused on and bonded to surfaces of the lower dielectric and the electrode due to sintering heat treatment which is performed by applying an isostatic pressure in a state in which the sealed capsule is placed in a pressure vessel of a heat treatment equipment.

    CHEMICAL MECHANICAL POLISHING PAD HAVING PATTERN SUBSTRATE
    200.
    发明申请
    CHEMICAL MECHANICAL POLISHING PAD HAVING PATTERN SUBSTRATE 有权

    公开(公告)号：US20220134507A1

    公开(公告)日：2022-05-05

    申请号：US17536358

    申请日：2021-11-29

    Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY

    Inventor： Hyoung Jae KIM ,  Do Yeon KIM ,  Tae Kyung LEE ,  Pil Sik KANG

    IPC: B24B37/26 ,  B24B37/04

    Abstract: The present invention relates to a chemical mechanical polishing pad having a pattern structure. The configuration of the present invention provides a chemical mechanical polishing pad having a pattern structure including a polishing pad configured to polish a wafer placed thereon; and a plurality of figure units formed on the polishing pad and formed to protrude from an upper portion of the polishing pad. The figure units are formed to have a predetermined contact area ratio and a predetermined circumferential length per unit area which correspond to a target polishing characteristic.

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