公开(公告)号：US07365351B2

公开(公告)日：2008-04-29

申请号：US11512821

申请日：2006-08-30

Applicant: Norbert Bowering ,  Bjorn A. M. Hansson

Inventor： Norbert Bowering ,  Bjorn A. M. Hansson

IPC: G01J3/10 ,  G01J1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract translation: 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

公开(公告)号：US07247870B2

公开(公告)日：2007-07-24

申请号：US11512822

申请日：2006-08-30

Applicant: Alexander I. Ershov ,  William N. Partlo

Inventor： Alexander I. Ershov ,  William N. Partlo

IPC: G01J3/10

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

公开(公告)号：US20070062557A1

公开(公告)日：2007-03-22

申请号：US11367693

申请日：2006-03-06

Applicant: Tatyana Rakhimova ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Johannes Moors ,  Aleksander Kovalev ,  Dmitriy Lopaev

Inventor： Tatyana Rakhimova ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Johannes Moors ,  Aleksander Kovalev ,  Dmitriy Lopaev

IPC: B08B6/00 ,  C25F5/00 ,  C25F3/30 ,  C25F1/00

CPC classification number: G03F7/70925 ,  G03F7/70933 ,  G21K2201/06

Abstract: A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.

Abstract translation: 用于清洁光刻设备的元件的方法，例如诸如集光镜的光学元件，包括提供含氮的气体; 从至少部分气体产生氮自由基，从而形成含有自由基的气体; 以及将至少部分含自由基的气体提供给所述装置的一个或多个元件。 光刻设备包括源和光学元件，以及布置成产生射频放电的放电发生器。

公开(公告)号：US20060192151A1

公开(公告)日：2006-08-31

申请号：US11067099

申请日：2005-02-25

Applicant: Norbert Bowering ,  Bjorn Hansson ,  Alexander Bykanov ,  Oleh Khodykin ,  Alexander Ershov ,  William Partlo

Inventor： Norbert Bowering ,  Bjorn Hansson ,  Alexander Bykanov ,  Oleh Khodykin ,  Alexander Ershov ,  William Partlo

IPC: G01J1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract translation: 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

公开(公告)号：US20050057738A1

公开(公告)日：2005-03-17

申请号：US10769373

申请日：2004-01-30

Applicant: Toshihiko Tsuji

Inventor： Toshihiko Tsuji

IPC: G03B27/54 ,  G03F7/20 ,  G21K1/00 ,  H01L21/027

CPC classification number: G03F7/702 ,  G21K2201/06

Abstract: Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.

Abstract translation: 为了提供照明光学系统和使用该照明光学系统的曝光装置，其提供了比现有技术更光亮的用于照射掩模的光的角度分布，用于照射物体表面的照明光学系统包括：光学单元，其将来自 光源部分成近似平行的光，并且包括第一和第二反射镜，其中第一反射镜具有开口，第二反射镜反射的光穿过该开口。

公开(公告)号：US06438199B1

公开(公告)日：2002-08-20

申请号：US09679718

申请日：2000-09-29

Applicant: Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni

Inventor： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni

IPC: G21K504

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70091 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

Abstract: The invention concerns an illumination system, particularly for microlithography with wavelengths ≦193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.

Abstract translation: 本发明涉及一种照明系统，特别是对于具有波长<= 193nm的微光刻，其包括光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将光源变换成由所述出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到所述图像平面中，产生至少部分地叠加在所述图像平面中的场上的多个图像。 第一光栅元件以第一偏转角偏转入射光束，其中第一偏转角中的至少两个是不同的。 第一光栅元件优选地是矩形的，其中该场是环的一段。 为了将第一光栅元件的矩形图像变换成环形的区段，第二光学部件包括用于将场成形为环形部分的第一场镜。

公开(公告)号：US06198793B1

公开(公告)日：2001-03-06

申请号：US09305017

申请日：1999-05-04

Applicant: Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger

Inventor： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger

IPC: G21K504

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G21K2201/06

Abstract: The invention concerns an illumination system for wavelengths ≦193 nm, particularly for EUV lithography, with at least one light source, which has an illumination A in a predetermined surface; at least one device for producing secondary light sources; at least one mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements; one or more optical elements, which are arranged between the mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements and the reticle plane, whereby the optical elements image the secondary light sources in the exit pupil of the illumination system. The illumination system is characterized by the fact that the raster elements of the one or more mirror or lenses are shaped and arranged in such a way that the images of the raster elements cover by means of the optical elements the major portion of the reticle plane and that the exit pupil defined by aperture and filling degree is illuminated.

Abstract translation: 本发明涉及用于波长<= 193nm的照明系统，特别是对于EUV光刻，具有至少一个在预定表面具有照明A的光源; 至少一个用于产生二次光源的装置; 至少一个镜子或透镜装置，其包括至少一个反射镜或一个透镜，其被组合成光栅元件; 布置在包括至少一个反射镜或一个透镜的反射镜或透镜装置之间的一个或多个光学元件，其被组织成光栅元件和光罩平面，由此光学元件将出射光瞳中的次级光源成像 照明系统的特征在于，一个或多个镜子或透镜的光栅元件被成形和布置成使得光栅元件的图像通过光学元件覆盖主要部分 并且照明由孔径和填充度限定的出射光瞳。

公开(公告)号：US5509043A

公开(公告)日：1996-04-16

申请号：US276140

申请日：1994-07-18

Applicant: Paul Van Der Sluis

Inventor： Paul Van Der Sluis

IPC: G01N23/20 ,  G21K1/06 ,  G21K7/00

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/062

Abstract: An X-ray analysis apparatus comprises a dispersive system of crystals for monochromatizing an incoming beam in a diffractometer or for analyzing an X-ray beam in an X-ray spectrometer. The system of crystals comprises crystals whose crystal lattice planes do not extend parallel to effectively reflective crystal surfaces. As a result, a substantially higher effective radiation intensity can be obtained, for example notably for (220) crystal faces in germanium.

Abstract translation: X射线分析装置包括用于在衍射仪中单色入射光束或用于在X射线光谱仪中分析X射线束的晶体分散系统。 晶体系统包括晶体，其晶格面不平行于有效反射的晶体表面延伸。 结果，可以获得显着更高的有效辐射强度，例如特别是对于锗中的（220）晶面。

公开(公告)号：US5485498A

公开(公告)日：1996-01-16

申请号：US269593

申请日：1994-07-01

Applicant: Whitson G. Waldo, III ,  Eric Brodsky ,  Franco Cerrina

Inventor： Whitson G. Waldo, III ,  Eric Brodsky ,  Franco Cerrina

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70058 ,  G21K1/06 ,  G21K2201/06

Abstract: An x-ray interface (40) provides increased x-ray collection efficiency for use in x-ray photolithography. The interface (40) comprises a housing (44) having a plurality of mirrored funnels (46) for collecting the x-rays. The mirrored funnels (46) are shaped to partially collimate and focus the x-rays. The interface (40) collects a greater percentage of the available x-rays from an x-ray source, and the interface (40) also permits a greater number of beamlines to be coupled to the x-ray source.

Abstract translation: x射线界面（40）提供了用于x射线光刻的增加的x射线收集效率。 接口（40）包括具有用于收集X射线的多个镜像漏斗（46）的壳体（44）。 镜像的漏斗（46）被成形为部分地准直和聚焦x射线。 接口（40）从x射线源收集更多百分比的可用x射线，并且接口（40）还允许更多数量的束线耦合到x射线源。

公开(公告)号：US5361292A

公开(公告)日：1994-11-01

申请号：US060335

申请日：1993-05-11

Applicant: William C. Sweatt

Inventor： William C. Sweatt

IPC: G02B27/64 ,  G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70108 ,  G02B27/642 ,  G03F7/702 ,  G03F7/70233 ,  G21K1/06 ,  G21K2201/06

Abstract: A series of segments of a parent aspheric mirror having one foci at at a si-point source of radiation and the other foci at the radius of a ring field have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ring field camera about one of the beams and fall onto the ring field radius as a coincident image as an arc of the ring field.

Abstract translation: 具有位于准点辐射源处的一个焦点并且在环形场半径处的另一个焦点的父非球面反射镜的一系列段具有由一组反射镜平移和旋转的所有光束中的一个或全部，使得 所有的光束通过围绕其中一个光束的环形场摄像机的真实入射光瞳，并且作为环形场的圆弧落在环形场半径上作为重合图像。