公开(公告)号：EP3682143A1

公开(公告)日：2020-07-22

申请号：EP18855814.2

申请日：2018-09-17

Applicant: Genesis Advanced Technology Inc.

Inventor： KLASSEN, James Brent ,  BOS, Richard

IPC: F16H1/48 ,  F16H1/28 ,  F16H48/10 ,  F16H55/06

公开(公告)号：EP3485855A2

公开(公告)日：2019-05-22

申请号：EP18204525.2

申请日：2018-11-06

Applicant: Advanced Technology Inc.

Inventor： CHOI, Byoung-Chan ,  CHOI, Yong Cheol ,  CHOI, Ho Kyeng ,  SONG, Young Hun ,  JUNG, Ki Won ,  AN, Doo Baeck

IPC: A61F9/00 ,  B23K26/046 ,  B23K26/0622 ,  B23K26/082 ,  B23K26/364 ,  G01B9/02 ,  G02B21/00 ,  A61F2/01 ,  B23K103/00

CPC classification number: B23K26/352 ,  A61F2/16 ,  A61F2002/0086 ,  A61F2002/1681 ,  A61F2002/1689 ,  A61F2240/001 ,  B23K26/0006 ,  B23K26/032 ,  B23K26/042 ,  B23K26/046 ,  B23K26/0608 ,  B23K26/0624 ,  B23K26/0626 ,  B23K26/0648 ,  B23K26/082 ,  B23K26/0821 ,  B23K26/355 ,  B23K26/364 ,  B23K26/702 ,  B23K31/10 ,  B23K2103/42 ,  B29D11/00 ,  B29D11/0023 ,  G01B9/02091 ,  G02B21/0024

Abstract: Provided is a laser patterning apparatus of a three-dimensional object to be processed, which includes a laser generation unit (10), a first beam adjustment unit (20) for adjusting the magnitude of a laser beam generated in the laser generation unit, a second beam adjustment unit (30) for adjusting the focal location of z-axis, x-axis, and y-axis of the laser beam via the first beam adjustment unit, and a control unit (70) for controlling the second beam adjustment unit so that laser patterning is performed on a three-dimensional object to be processed. The control unit provides information of a pattern to be processed to one of three-dimensional location formation of a loaded three-dimensional object to be processed and three-dimensional location information included in a three-dimensional shape design file, and performs the alignment through the matching of the three-dimensional location information of the loaded three-dimensional object to be processed and the three-dimensional location information included in the three-dimensional shape design file so that the laser patterning is performed.

公开(公告)号：EP2855976B1

公开(公告)日：2019-02-20

申请号：EP13794351.0

申请日：2013-05-24

Applicant: Genesis Advanced Technology Inc.

Inventor： KLASSEN, James B

IPC: F16H13/08 ,  F16C19/54 ,  F16H1/28

公开(公告)号：EP3948021A1

公开(公告)日：2022-02-09

申请号：EP20783095.1

申请日：2020-03-27

Applicant: Genesis Advanced Technology Inc.

Inventor： KLASSEN, James Brent ,  BOS, Richard

IPC: F16H37/00 ,  F16H1/28 ,  F16H13/06 ,  F16H57/08

公开(公告)号：EP3947913A1

公开(公告)日：2022-02-09

申请号：EP20783321.1

申请日：2020-03-30

Applicant: Genesis Advanced Technology Inc.

Inventor： KLASSEN, James Brent

IPC: F01C21/08 ,  F01C1/08 ,  F01C1/10 ,  F01C19/00 ,  F01C21/10

公开(公告)号：EP3626384A1

公开(公告)日：2020-03-25

申请号：EP19196868.4

申请日：2017-12-19

Applicant: Advanced Technology Inc.

Inventor： CHOI, Byung Chan ,  AN, Doo Baeck

IPC: B23K26/146

Abstract: Disclosed herein is a laser processing apparatus that includes a laser generation unit configured to generate a laser beam to process a workpiece, a first fluid jet generation unit configured to generate and inject a first fluid jet to deliver the laser beam to the workpiece, and a second fluid jet generation unit configured to inject a second fluid jet around the laser beam, wherein the first and second fluid jets are simultaneously or selectively injected.

公开(公告)号：EP3485855A3

公开(公告)日：2019-08-07

申请号：EP18204525.2

申请日：2018-11-06

Applicant: Advanced Technology Inc.

Inventor： CHOI, Byoung-Chan ,  CHOI, Yong Cheol ,  CHOI, Ho Kyeng ,  SONG, Young Hun ,  JUNG, Ki Won ,  AN, Doo Baeck

IPC: A61F9/00 ,  B23K26/046 ,  B23K26/0622 ,  B23K26/082 ,  B23K26/364 ,  G01B9/02 ,  G02B21/00 ,  A61F2/16 ,  B23K26/352 ,  A61F2/00 ,  B23K26/00 ,  B23K26/03 ,  B23K26/042 ,  B23K26/06 ,  B23K31/10 ,  B29D11/00 ,  A61F2/01 ,  B23K103/00

Abstract: Provided is a laser patterning apparatus of a three-dimensional object to be processed, which includes a laser generation unit (10), a first beam adjustment unit (20) for adjusting the magnitude of a laser beam generated in the laser generation unit, a second beam adjustment unit (30) for adjusting the focal location of z-axis, x-axis, and y-axis of the laser beam via the first beam adjustment unit, and a control unit (70) for controlling the second beam adjustment unit so that laser patterning is performed on a three-dimensional object to be processed. The control unit provides information of a pattern to be processed to one of three-dimensional location formation of a loaded three-dimensional object to be processed and three-dimensional location information included in a three-dimensional shape design file, and performs the alignment through the matching of the three-dimensional location information of the loaded three-dimensional object to be processed and the three-dimensional location information included in the three-dimensional shape design file so that the laser patterning is performed.

公开(公告)号：EP3224688A1

公开(公告)日：2017-10-04

申请号：EP15863363.6

申请日：2015-11-24

Applicant: Genesis Advanced Technology Inc.

Inventor： KLASSEN, James Brent

IPC: G05G3/00 ,  F16K31/00 ,  G05G5/04 ,  H01H3/32

Abstract: A control element having a beam member divided into an actuation section and a valve section positioned on opposing sides of a pivot member, in which active control of the actuation section causes buckling of the valve section to bring the valve section from a closed state to an open state or causes relaxing of the valve section to bring the valve section from an open state to a closed state.

Abstract translation: 控制元件具有分成位于枢轴构件的相对侧上的致动区段和阀区段的梁构件，其中致动区段的主动控制导致阀区段弯曲以使阀区段从关闭状态变为 打开状态或导致阀部分放松以使阀部分从打开状态变为关闭状态。

公开(公告)号：EP0079151A1

公开(公告)日：1983-05-18

申请号：EP82305606.4

申请日：1982-10-21

Applicant: ADVANCED TECHNOLOGY INC.

Inventor： Intrader, Joseph, Dr. ,  Bertoldo, Gene

IPC: C04B41/88 ,  C04B37/00 ,  C22C13/00 ,  C23C26/00

CPC classification number: C04B41/009 ,  C04B37/006 ,  C04B37/026 ,  C04B41/51 ,  C04B41/52 ,  C04B41/88 ,  C04B41/89 ,  C04B2237/12 ,  C04B2237/126 ,  C04B2237/127 ,  C04B2237/34 ,  C04B2237/341 ,  C04B2237/346 ,  C04B2237/348 ,  C04B2237/36 ,  C04B2237/363 ,  C04B2237/368 ,  C04B2237/40 ,  C04B2237/401 ,  C04B2237/406 ,  C04B2237/60 ,  C22C13/00 ,  C23C26/02 ,  Y10T428/12535 ,  Y10T428/12576 ,  Y10T428/30 ,  C04B41/455 ,  C04B41/5057 ,  C04B41/5127 ,  C04B41/5025 ,  C04B35/00

Abstract: This invention relates to nitrides, oxides, arsenides, borides, phosphides, tellurides, titanates, silicides, carbides, etc. of metals or metalloids. as such or in their compacted forms, as substrates or base elements. These can be readily joined with various other substrates employing as a coating, film, layer or interlayer former a tin, lead, indium, or alloys thereof, in an admixture with a carbide or carbonyl former and joining the substrate or base in a carbon monoxide atmosphere with the coating, etc. former. Also described are highly adhesive composites with an active tin alloy which are obtained as coating on beryllia by depositing tin with, e.g. vanadium on beryllia, and heating in a carbon monoxide atmosphere of up to 1000°C.

公开(公告)号：EP3911875A1

公开(公告)日：2021-11-24

申请号：EP20702521.4

申请日：2020-01-16

Applicant: Genesis Robotics and Motion Technologies, LP ,  Genesis Advanced Technology Inc.

Inventor： KLASSEN, James B. ,  ARMSTRONG, Nathan

IPC: F16H19/00 ,  B25J9/10 ,  F16H55/50