公开(公告)号：WO1989007664A1

公开(公告)日：1989-08-24

申请号：PCT/US1989000525

申请日：1989-02-09

Applicant: SOUTHWALL TECHNOLOGIES INC.

Inventor： SOUTHWALL TECHNOLOGIES INC. ,  MEYER, Stephen, F.

IPC: C23C14/34

CPC classification number: C23C14/562 ,  C23C14/0042 ,  C23C14/54

Abstract: Apparatus (10) for sputter depositing a layer of metal onto a latterally extended substrate (12) includes a substrate support, a deposition station (14), a downstream sensing assembly (58) and a computerized controller. The deposition station includes a cathode (16, 22) and anodes (28, 30) extending the width of the substrate (12). Gas supply is provided to each of a plurality of zones through a common distribution chamber (48) with a plurality of inlets which in combination cover the width of the substrate on which a thin film layer is to be deposited. The gas flow is directed through each anode into the plasma region and is individually controlled for each zone. The downstream sensing assembly (58) includes, for each zone, a four-point contact assembly (62) using four electrically conductive wheels (64, 66, 68, 70). Two of the wheels are used to apply current to the thin film and two are used to sense the resistance of it. This information is fed into the computer for use in controlling the gas flow into the deposition station, by zone.

公开(公告)号：EP2260337B1

公开(公告)日：2017-09-13

申请号：EP08795465.7

申请日：2008-08-20

Applicant: Southwall Technologies, Inc.

Inventor： STOESSEL, Chris, H. ,  WAHL, Andre ,  THIELSCH, Ronald ,  CODA, Matthew ,  KOZAK, Julius ,  WIPFLER, Richard, T. ,  BOMAN, Lee

IPC: G02B1/10 ,  G02B5/28 ,  C03C17/36

CPC classification number: G02B5/285 ,  B32B7/06 ,  B32B7/12 ,  B32B27/08 ,  B32B27/36 ,  B32B2255/10 ,  B32B2255/20 ,  B32B2255/28 ,  B32B2307/204 ,  B32B2307/40 ,  B32B2307/412 ,  B32B2307/416 ,  B32B2307/418 ,  B32B2307/714 ,  B32B2419/00 ,  B32B2551/00 ,  B32B2605/006 ,  G02B5/282 ,  Y10T428/1266 ,  Y10T428/12792 ,  Y10T428/12889 ,  Y10T428/12896

公开(公告)号：EP2953791A1

公开(公告)日：2015-12-16

申请号：EP14702182.8

申请日：2014-01-17

Applicant: Southwall Technologies Inc.

Inventor： HONEYCUTT, David, Lee ,  CODA, Matthew ,  BOMAN, Lee, Campbell ,  KOZAK, Julius, G.

IPC: B32B17/10

CPC classification number: B32B17/10577 ,  B32B3/30 ,  B32B17/064 ,  B32B17/10036 ,  B32B17/10174 ,  B32B17/10761 ,  B32B17/10779 ,  B32B17/10972 ,  B32B33/00 ,  B32B37/02 ,  B32B38/06 ,  C09J7/22 ,  C09J7/29 ,  C09J7/30 ,  C09J2459/00 ,  Y10T428/14 ,  Y10T428/1476 ,  Y10T428/24562 ,  Y10T428/2457 ,  Y10T428/24612 ,  Y10T428/28 ,  B32B17/10 ,  B32B2367/00

Abstract: A method for laminating glass, a laminate assembly, and an adhesive-coated plastic material used in a laminate assembly. Specifically an adhesive, once applied to a plastic layer is grooved or textured to allow formerly trapped air to escape from between layers of a laminate assembly during a laminate process. This can allow for the adhesive layer to be thinner, while still providing for a final product that is relatively air bubble-free and optically pleasing or substantially free of optical defects caused by waviness of the plastic layer between two PVB sheets and/or wrinkles of the plastic sheet.

公开(公告)号：EP2790916A1

公开(公告)日：2014-10-22

申请号：EP12815621.3

申请日：2012-12-13

Applicant: Southwall Technologies Inc. ,  Thielsch, Roland

Inventor： THIELSCH, Roland ,  KLEINHEMPEL, Ronny ,  WAHL, Andre

IPC: B32B17/10

CPC classification number: C03C17/3644 ,  B32B17/06 ,  B32B17/10 ,  B32B17/10036 ,  B32B17/1011 ,  B32B17/10229 ,  B32B17/10761 ,  B32B2605/006 ,  C03C17/245 ,  C03C17/36 ,  C03C17/3639 ,  C03C17/366 ,  C03C17/38 ,  C03C17/42 ,  Y10T428/24975 ,  Y10T428/265 ,  B32B2367/00

Abstract: The invention relates to a laminated glass for use in vehicles or in architecture, having a selective reflection of electromagnetic radiation from the wavelength spectrum of sunlight. According to the invention, an optical multi-layer system having a total solar transmission T
TS 70 % and a reflection Rvis in the wavelength range of visible light

公开(公告)号：EP2651637A1

公开(公告)日：2013-10-23

申请号：EP11849858.3

申请日：2011-11-15

Applicant: Southwall Technologies Inc.

Inventor： KLEINHEMPEL, Ronny ,  KOZAK, Julius G. ,  THIELSCH, Roland C. ,  WIPFLER, Richard T. ,  STOESSEL, Christian H. ,  BOMAN, Lee C.

IPC: B32B17/06

CPC classification number: E06B3/6715

Abstract: A low-e insulating glass unit has a suspended, coated IR reflecting polymer sheet under tension, e.g. from heat shrinkage. The polymer sheet is coated with a multilayer stack of dielectric and metallic layers, including at least one silver layer deposited upon a zinc oxide seed layer that is at most 15 nm thickness. The use of zinc oxide ensures good seeding for high quality silver layer growth, thereby providing low emissivity. The thinness of the zinc oxide ensures that it resists cracking when the polymer sheet is tensioned.

公开(公告)号：EP2074443A4

公开(公告)日：2009-08-26

申请号：EP07861345

申请日：2007-09-20

Applicant: SOUTHWALL TECHNOLOGIES INC ,  NOVOMATRIX PTE LTD

Inventor： DAI YISHENG ,  YEO BOON KHEE ,  WESTRA SICCO W T

IPC: G02B1/10

CPC classification number: G02B5/288 ,  C03C17/38 ,  C03C17/42 ,  G02B5/281

公开(公告)号：EP2010948A1

公开(公告)日：2009-01-07

申请号：EP06803514.6

申请日：2006-09-14

Applicant: Southwall Technologies, Inc.

Inventor： THIELSCH, Roland ,  BOEHME, Thomas ,  STOESSEL, Chris, H. ,  BOMAN, Lee

IPC: G02B5/20

CPC classification number: G02B5/284 ,  C03C17/28 ,  G02B5/282

Abstract: An optical filter is formed of a layer stack that includes metallic layers (106, 107, 108 and 109) and dielectric layers (101 , 102, 103, 104 and 105), with at least one dielectric layer being defined by more than one zinc-based film (112, 114, 118 and 120). These zinc-based films have different percentages of zinc. The selections of the percentages are based upon the positions of the films within the dielectric layer. An unexpectedly low sheet resistance is available if the zinc-based film that immediately precedes forming a metallic layer has a percentage of zinc in the range of 80 percent to 100 percent. Process stabilization and manufacturing cost are provided by placing the percentage of the lower zinc-based film closer to 50 percent (25-75 percent). Process stabilization is further enhanced by providing an indium-based film (110 and 116) within the dielectric layer adjacent to the metallic layer.

公开(公告)号：EP1252801A1

公开(公告)日：2002-10-30

申请号：EP01906525.9

申请日：2001-01-30

Applicant: Southwall Technologies, Inc.

Inventor： WOODARD, Floyd, E. ,  FURLER, Reto

IPC: H05B3/84

CPC classification number: H05B3/86 ,  B32B7/12 ,  B32B17/10 ,  B32B17/10036 ,  B32B17/10174 ,  B32B17/10761 ,  B32B2333/08 ,  B32B2333/12 ,  B32B2367/00 ,  H01Q1/1271 ,  H05B3/84 ,  H05B2203/016 ,  H05B2203/017 ,  H05K3/244

Abstract: Vacuum deposition processes such as sputter-depositing are employed to deposit electrically conductive bus bars onto thin film transparent conductor sheets. These assemblies provide efficient and durable electrical connections to the conductor sheets which can be laminated into glazing structures such as automotive windshields to provide resistance heating for defogging and deicing or the provide an electrical connection for in-window antennas and in window radiation shields.

公开(公告)号：EP0574543B1

公开(公告)日：2000-07-19

申请号：EP92909081.9

申请日：1992-02-27

Applicant: Southwall Technologies, Inc.

Inventor： TENNANT, R., Alexander ,  HOOD, Thomas, G.

IPC: G02B5/08 ,  G02B5/22

CPC classification number: G02B5/223 ,  F21V7/22 ,  G02B5/208 ,  Y10T428/31681 ,  Y10T428/31699

公开(公告)号：EP0655974B1

公开(公告)日：2000-01-05

申请号：EP93919970.9

申请日：1993-08-12

Applicant: Southwall Technologies, Inc.

Inventor： WOODARD, Floyd, E. ,  PECK, Larry, C.

IPC: B32B27/00 ,  B32B15/08 ,  B32B27/06 ,  G02B1/12 ,  G02B1/10 ,  B32B3/00

CPC classification number: C23C14/083 ,  C03C17/42 ,  G02B1/11 ,  G03C1/825 ,  Y10T428/265 ,  Y10T428/3154 ,  Y10T428/31699 ,  Y10T428/31786

Abstract: Anti-reflective composites (84) comprising carbon-based polymer substrates (86),such as polyesters, are antireflected by applying to the substrates one or more discontinuous layers of inorganic materials (88, 92) having an index of refraction greater than that of the substrates.