Assembly for attenuating impinging light of a beam of radiation

    公开(公告)号:US09964486B2

    公开(公告)日:2018-05-08

    申请号:US15317194

    申请日:2015-03-25

    Applicant: AMRONA AG

    Inventor: Andreas Siemens

    Abstract: An assembly (100) for attenuating the impinging light of a beam of radiation of finite expansion with the objective of realizing reliable attenuation particularly of directly impinging light comprises a light source (10) for producing a beam of unpolarized light, preferably unpolarized monochromatic light, a useful light region (50) through which the unpolarized light passes and preferably passes through in a straight line from the light source (10) as well as an absorption device (30) arranged downstream of the useful light region (50) and preferably downstream in the direction of the direct beam radiation for at least partly absorbing impinging light, wherein the absorption device (30) comprises at least one polarization device (31, 32) arranged in the direction of the light beam.

    Diagnostic devices and methods
    229.
    发明授权

    公开(公告)号:US09778245B2

    公开(公告)日:2017-10-03

    申请号:US15425729

    申请日:2017-02-06

    Abstract: A diagnostic device is provided that comprises a light source for transmitting a light beam through a blood sample to a light detector, and a permanent magnet, wherein one of the permanent magnet and blood sample is automatically movable relative to the other between a “HIGH” magnetic state position and a “LOW” magnetic state position, such that a substantially high magnetic field is applied to the blood sample causing any hemozoin in the blood sample to tend toward perpendicular orientation to the substantially magnetic field and the suppression, or enhancement of light based on its polarization, and a zero-to-near-zero magnetic field is applied to the blood sample causing the randomization of any hemozoin in the blood sample and a baseline amount of light to pass through the blood sample in the “LOW” magnetic state position.

    METHODS AND APPARATUS FOR POLARIZED WAFER INSPECTION

    公开(公告)号:US20170276613A1

    公开(公告)日:2017-09-28

    申请号:US15468608

    申请日:2017-03-24

    Abstract: Disclosed are methods and apparatus for inspecting a semiconductor sample. This system comprises an illumination optics subsystem for generating and directing an incident beam towards a defect on a surface of a wafer. The illumination optics subsystem includes a light source for generating the incident beam and one or more polarization components for adjusting a ratio and/or a phase difference for the incident beam's electric field components. The system further includes a collection optics subsystem for collecting scattered light from the defect and/or surface in response to the incident beam, and the collection optics subsystem comprises an adjustable aperture at the pupil plane, followed by a rotatable waveplate for adjusting a phase difference of electric field components of the collected scattered light, followed by a rotatable analyzer. The system also includes a controller that is configured for (i) selecting a polarization of the incident beam, (ii) obtaining a defect scattering map, (iii) obtaining a surface scattering map, and (iv) determining a configuration of the one or more polarization components, aperture mask, and rotatable ¼ waveplate, and analyzer based on analysis of the defect and surface scattering map so as to maximize a defect signal to noise ratio,

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