中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

522 records (took 0.044 seconds)

    Broad band referencing reflectometer
    241.
    发明申请
    Broad band referencing reflectometer 有权
    宽带参考反射计

    公开(公告)号：US20100051822A1

    公开(公告)日：2010-03-04

    申请号：US12590151

    申请日：2009-11-03

    Applicant: Dale A. Harrison

    Inventor： Dale A. Harrison

    IPC: G01N21/47 ,  G01N21/55

    CPC classification number: G01J3/2803 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/0232 ,  G01J3/027 ,  G01J3/0286 ,  G01J3/0291 ,  G01J3/08 ,  G01J3/10 ,  G01J3/28 ,  G01J3/2823 ,  G01J3/36 ,  G01J3/42 ,  G01J3/4531 ,  G01N21/211 ,  G01N21/274 ,  G01N21/33 ,  G01N21/47 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/335

    Abstract: A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions.

    Abstract translation: 提供了一种光谱系统，其被优化用于在VUV区域中的操作并且能够在DUV-NIR区域中表现良好。 此外，该系统还包含一个光学模块，该模块提供可用于VUV和DUV-NIR中优化的可选择的源和检测器。 同样，光学模块提供通用的传送和收集光学器件，以使得能够使用类似的光点特性来收集两个光谱区域中的测量。 该模块还提供了快速参考测量数据的方法，以确保实现高度可重复的结果。 该模块还在VUV源，样品室和VUV检测器之间提供受控的环境，其作用是以可重复的方式限制VUV光子的吸收。 除了DUV-NIR波长之外，使用包含VUV波长的宽带数据集使得可以有意义地表征更多种类的材料。 可以利用基于阵列的检测仪器来允许同时收集更大的波长区域。

    Contamination monitoring and control techniques for use with an optical metrology instrument
    242.
    发明授权
    Contamination monitoring and control techniques for use with an optical metrology instrument 有权
    用于光学计量仪器的污染监测和控制技术

    公开(公告)号：US07622310B2

    公开(公告)日：2009-11-24

    申请号：US11600414

    申请日：2006-11-16

    Applicant: Dale A. Harrison ,  Matthew Weldon

    Inventor： Dale A. Harrison ,  Matthew Weldon

    IPC: H01L21/66

    CPC classification number: G01N21/33 ,  G01J3/02 ,  G01J3/0232 ,  G01J3/0291 ,  G01J3/08 ,  G01J3/42 ,  G01N21/94

    Abstract: A technique is provided for generating and subsequently monitoring the controlled environment(s) within an optical metrology instrument in such a manner as to minimize absorbing species within the light path of the metrology instrument and to minimize the build-up of contaminants on the surfaces of optical elements that may result in performance degradation. Both evacuation and backfill techniques may be utilized together along with a monitoring technique to determine if the environmental is suitable for measurements or if the environment should be regenerated. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.

    Abstract translation: 提供了一种技术，用于产生和随后监测光学测量仪器内的受控环境，使得最小化测量仪器的光路内的吸收物质的最小化，并使污染物在表面上的积聚最小化 可能导致性能下降的光学元件。 撤离和回填技术都可以与监测技术一起使用，以确定环境是否适合于测量或者是否应该再生环境。 光学测量仪器可以是在包括真空紫外（VUV）波长的波长下操作的仪器。

    OPTICAL-PATH-DIFFERENCE COMPENSATION MECHANISM FOR ACQUIRING WAVE FROM SIGNAL OF TIME-DOMAIN PULSED SPECTROSCOPY APPARATUS
    243.
    发明申请
    OPTICAL-PATH-DIFFERENCE COMPENSATION MECHANISM FOR ACQUIRING WAVE FROM SIGNAL OF TIME-DOMAIN PULSED SPECTROSCOPY APPARATUS 有权
    用于从时域脉冲光谱仪器信号采集波形的光路差分补偿机制

    公开(公告)号：US20090152469A1

    公开(公告)日：2009-06-18

    申请号：US12371325

    申请日：2009-02-13

    Applicant: Seizi Nishizawa ,  Toshiyuki Iwamoto

    Inventor： Seizi Nishizawa ,  Toshiyuki Iwamoto

    IPC: G01J5/02

    CPC classification number: G01J3/08 ,  G01N21/3586 ,  G01N2201/0696 ,  G01N2201/0698

    Abstract: A time-domain pulsed spectroscopy apparatus which has a pulsed laser light source; a splitting unit to split pulsed laser light; a pulsed-light emitting unit; a detector; a sample holder; and a sample-unit entrance and exit optical systems; wherein the time-domain pulsed spectroscopy apparatus further comprises: at least one optical-path-length varying unit for setting a photometric range; at least one optical delay unit for the wave form signal measurement; and, at least one gate member to pass or block the pulsed light to a reflector.

    Abstract translation: 一种具有脉冲激光光源的时域脉冲光谱仪; 用于分离脉冲激光的分离单元; 脉冲发光单元; 检测器 样品架 和采样单元入口和出口光学系统; 其中所述时域脉冲光谱装置还包括：用于设定光度范围的至少一个光路长度变化单元; 用于波形信号测量的至少一个光学延迟单元; 以及至少一个栅极件，以将脉冲光传递或阻挡到反射器。

    Infrared spectrometer
    247.
    发明申请
    Infrared spectrometer 有权

    公开(公告)号：US20080128622A1

    公开(公告)日：2008-06-05

    申请号：US11606084

    申请日：2006-11-30

    Applicant: Damien Weidmann

    Inventor： Damien Weidmann

    IPC: G01J5/02

    CPC classification number: G01J3/42 ,  G01J3/02 ,  G01J3/0286 ,  G01J3/08 ,  G01N21/276 ,  G01N21/3504 ,  G01N21/39 ,  G01N2021/399

    Abstract: Method and apparatus for detecting, by absorption spectroscopy, an isotopic ratio of a sample, by passing first and second laser beams of different frequencies through the sample. Two IR absorption cells are used, a first containing a reference gas of known isotopic ratio and the second containing a sample of unknown isotopic ratio. An interlacer or reflective chopper may be used so that as the laser frequencies are scanned the absorption of the sample cell and the reference cell are detected alternately. This ensures that the apparatus is continuously calibrated and rejects the baseline noise when phase sensitive detection is used.

    Contamination monitoring and control techniques for use with an optical metrology instrument
    249.
    发明授权
    Contamination monitoring and control techniques for use with an optical metrology instrument 有权
    用于光学计量仪器的污染监测和控制技术

    公开(公告)号：US07342235B1

    公开(公告)日：2008-03-11

    申请号：US11600413

    申请日：2006-11-16

    Applicant: Dale A. Harrison ,  Matthew Weldon

    Inventor： Dale A. Harrison ,  Matthew Weldon

    IPC: G01J1/42

    CPC classification number: G01J3/36 ,  G01J3/08 ,  G01J3/10 ,  G01N21/15 ,  G01N21/33 ,  G01N21/55 ,  G01N21/94 ,  G01N2021/157

    Abstract: A technique is provided monitoring and removing contaminants from the surface of a sample that is being measured with an optical metrology tool. The monitoring and removing contaminants from the surface of a sample may occur prior to recording an optical response from said sample in order to ensure that accurate results are obtained. Contaminant layers may be quantified so that other measurements may be accurately obtained without requiring the removal of the contaminant layer. The contaminant layers may be removed through the exposure to optical radiation. Alternatively, properties of non-contaminant layers may be characterized by analyzing changes that occur in such layers by exposure to optical radiation. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.

    Abstract translation: 提供了一种技术来监测和去除使用光学测量工具测量的样品表面的污染物。 在记录来自所述样品的光学响应之前，可能发生来自样品表面的污染物的监测和去除，以确保获得准确的结果。 可以量化污染物层，使得可以准确地获得其它测量值，而不需要去除污染物层。 可以通过暴露于光辐射来去除污染物层。 或者，非污染物层的性质可以通过分析通过暴露于光辐射而在这些层中发生的变化来表征。 光学测量仪器可以是在包括真空紫外（VUV）波长的波长下操作的仪器。

Patent Agency Ranking