公开(公告)号：US20180307138A1

公开(公告)日：2018-10-25

申请号：US15767990

申请日：2016-10-13

Applicant: MicroTau IP Pty Ltd

Inventor： Henry Claudius BILINSKY

IPC: G03F7/038 ,  B64G1/22 ,  G03F7/20 ,  G03F7/24 ,  G03F7/30

CPC classification number: G03F7/038 ,  B64G1/22 ,  C09D133/00 ,  G03F7/201 ,  G03F7/24 ,  G03F7/30

Abstract: In one aspect, there is provided a method of creating a microstructure pattern on an exterior surface of an aircraft, boat, automobile or other vehicle is disclosed. A layer of photopolymer (44) is applied to the top coat or substrate (43) by nozzles (45). The photopolymer is selectively irradiated to activate its photoinitiator and the unirradiated polymer is removed. The irradiation can be via a mask (49) which does not come into contact with the polymer, or via a beam splitting arrangement (63, 64) or a diffraction grating (71). The pattern can be formed by either leaving the exposed photopolymer in situ, or using the exposed photopolymer to mask the substrate, etching the substrate, and then removing the exposed photopolymer. In another aspect, there is provided a method 1100 comprising the step 1102 of applying a layer of photocurable material to the exterior surface, the step 1104 of irradiating the photocurable material with radiation including a predetermined irradiation intensity profile, and the step 1106 of removing uncured photocurable material to form the microstructure pattern. The radiation initiates curing of the irradiated photocurable material, causing a curing depth profile across the layer of the photocurable material corresponding to the selected intensity pro file.

公开(公告)号：US20180203357A1

公开(公告)日：2018-07-19

申请号：US15742738

申请日：2016-07-07

Applicant: GLUNZ & JENSEN A/S

Inventor： Joachim SPIES

IPC: G03F7/20 ,  B41C1/00 ,  H05B41/38

CPC classification number: G03F7/2004 ,  B41C1/00 ,  G03F7/201 ,  G03F7/70558 ,  G03F7/70791 ,  H01F38/10 ,  H05B41/38 ,  H05B41/3922

Abstract: There is provided method for controlling radiation emitting from one or more tubular lamps in an exposure apparatus for exposing a photosensitive element to the radiation. The method involves adjusting an adjustable ballast connected to the one or more lamps thereby adjusting the power received by the one or more lamps, wherein adjusting the ballast of the one or more lamps is based on the actual temperature and radiation of the one or more lamps.

公开(公告)号：US20180173103A1

公开(公告)日：2018-06-21

申请号：US15828870

申请日：2017-12-01

Applicant: Tokyo Electron Limited

Inventor： Seiji NAGAHARA ,  Masaru Tomono ,  Nobutaka Fukunaga ,  Gousuke Shiraishi

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/7055 ,  G03F7/16 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/30 ,  G03F7/7005 ,  G03F7/70133 ,  G03F7/70558 ,  H01L21/027 ,  H01L21/67115 ,  H01L21/6715

Abstract: An illuminance distribution response amount as the change amount of the illuminance distribution pattern, associating the position in the irradiation region in the lengthwise direction with the change amount of the illuminance with respect to the change in the drive current, has previously been acquired and stored in a storage unit for each light-emitting block. There is provided an arithmetic processing unit that determines (estimates) a current command value of each of the light-emitting blocks based on a present current command value of each of the light-emitting blocks and the change amount of the illuminance distribution pattern of each light-emitting block in order to bring a present illuminance distribution pattern in the irradiation region in a lengthwise direction close to a target illuminance distribution pattern.

公开(公告)号：US20180144941A1

公开(公告)日：2018-05-24

申请号：US15818510

申请日：2017-11-20

Applicant: Marvell World Trade Ltd.

Inventor： Runzi Chang ,  Winston Lee

IPC: H01L21/265 ,  H01L21/3105 ,  H01L21/56 ,  H01L21/02 ,  H01L21/027 ,  H01L21/308 ,  H01L23/00 ,  H01L21/311

CPC classification number: H01L21/26586 ,  G03F7/11 ,  G03F7/201 ,  H01L21/02126 ,  H01L21/0274 ,  H01L21/0276 ,  H01L21/3086 ,  H01L21/31055 ,  H01L21/31144 ,  H01L21/32139 ,  H01L21/56 ,  H01L24/06

Abstract: The present disclosure describes methods and apparatuses for fabricating integrated-circuit (IC) die with tilted patterning. In some aspects, mandrels are fabricated on a material stack and occlude portions of a layer of material from a field of energy radiated at an angle of incidence relative to the mandrels. The occluded portions of the layer of material can be used to mask an underlying film to create a film pattern on a substrate of the IC die. These methods and apparatuses may enable the fabrication of IC die with features that are smaller in size than those afforded by conventional lithography processes.

公开(公告)号：US20180126721A1

公开(公告)日：2018-05-10

申请号：US15860795

申请日：2018-01-03

Applicant: Flint Group Germany GmbH

Inventor： FRANK BOYKSEN

IPC: B41C1/10 ,  G03F7/20

CPC classification number: B41C1/10 ,  G03F7/201 ,  G03F7/2016 ,  G03F7/2018 ,  G03F7/202

Abstract: Method for producing flexographic printing plates, using as starting material a photopolymerizable flexographic printing plate which at least comprises, arranged one above another, a dimensionally stable support, at least one photopolymerizable, relief-forming layer, at least comprising an elastomeric binder, an ethylenically unsaturated compound and a photoinitiator, a digitally imagable layer, comprising at least the following steps: (a) producing a mask by imaging the digitally imagable layer, (b) exposing the flexographic printing plate through the mask with actinic light, and photopolymerizing the image regions of the layer, the exposing taking place with a plurality of UV-LEDs which are arranged on at least one UV-LED strip which is moved relative to the surface of the flexographic printing plate, and (c) developing the photopolymerized layer by washing out and drying or by thermal development, characterized in that in the UV-LED strip or in a separate strip, at least one ultrasonic sensor is arranged, at least the thickness of the flexographic printing plate for exposure is determined with the at least one ultrasonic sensor, depending on the measured thickness of the flexographic printing plate, the exposing of the flexographic printing plate is controlled in respect of at least one of the following parameters: (i) number of exposure steps, (ii) exposure intensity, (iii) energy input per exposure step, (iv) duration of the individual exposure steps, (v) overall duration of exposure.

公开(公告)号：US09937703B2

公开(公告)日：2018-04-10

申请号：US15024650

申请日：2014-09-30

Applicant: Flint Group Germany GmbH

Inventor： Uwe Stebani ,  Gernot Dietz

IPC: G03F7/36 ,  B41C1/055 ,  G03F7/20

CPC classification number: B41C1/055 ,  G03F7/201 ,  G03F7/202 ,  G03F7/2022 ,  G03F7/36

Abstract: A device for automated implementation of preliminary reverse exposure, main exposure, and development of digitally imagable flexographic printing elements, and a method for producing flexographic printing plates starting from digitally imaged flexographic printing elements, using said apparatus.

公开(公告)号：US20180029400A1

公开(公告)日：2018-02-01

申请号：US15463341

申请日：2017-03-20

Applicant: MacDermid Printing Solutions, LLC

Inventor： Ryan W. Vest ,  David A. Recchia ,  Timothy Gotsick

IPC: B41N1/16 ,  B41M1/04

CPC classification number: B41N1/16 ,  B41C1/055 ,  B41M1/04 ,  B41N1/12 ,  B41N1/22 ,  G03F7/09 ,  G03F7/201 ,  G03F7/2012 ,  G03F7/202 ,  Y10T428/24521

Abstract: A method of making a relief image printing element from a photosensitive printing blank is provided. A photosensitive printing blank with a laser ablatable layer disposed on at least one photocurable layer is ablated with a laser to create an in situ mask. The printing blank is then exposed to at least one source of actinic radiation through the in situ mask to selectively cross link and cure portions of the photocurable layer. Diffusion of air into the at least one photocurable layer is limited during the exposing step and preferably at least one of the type, power and incident angle of illumination of the at least one source of actinic radiation is altered during the exposure step. The resulting relief image comprises a plurality of dots and a dot shape of the plurality of dots that provide optimal print performance on various substrates, including corrugated board.

公开(公告)号：US20180011408A1

公开(公告)日：2018-01-11

申请号：US15645979

申请日：2017-07-10

Applicant: Cypre, Inc.

Inventor： Kolin C. Hribar ,  Padraig Buckley

IPC: G03F7/20 ,  G01N33/50

CPC classification number: G03F7/20 ,  G01N33/5008 ,  G01N33/5088 ,  G03F7/2004 ,  G03F7/201 ,  G03F7/7015

Abstract: The inventive subject matter provides an apparatus for reproducibly fabricating hydrogel-based organ and tumor models inside multi-well plates. For example, tumor models made using the inventive apparatus can be used for studying the progression of cancer, cancer diagnostics, and therapeutic screening. A mold controls the thickness of each hydrogel layer. A photomask controls the size and shape of each hydrogel layer, allowing the hydrogel diameter to be smaller than the diameter of each well so that liquid media can be exchanged around both the sides and top of the hydrogels. A holder aligns the photomask with the multi-well plate, and polymerization is initiated by a light source.

公开(公告)号：US20170315435A1

公开(公告)日：2017-11-02

申请号：US15583575

申请日：2017-05-01

Applicant: The Regents of the University of California

Inventor： Thomas G. Mason ,  Kenny Mayoral

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/2022 ,  G03F7/0037 ,  G03F7/201

Abstract: A system and a method of producing sub-millimeter scale particles are provided herein. The method includes providing a substrate that has a layer of photosensitive material thereon; exposing a portion of the layer to a structured beam of light that has a cross-sectional shape, and a cross-sectional size. The cross-sectional size of the structured beam of light at the layer of photosensitive material is smaller than a sub-millimeter scale particle. The method also includes moving the substrate or the beam of light relative to each other to follow a path for making additional exposures or continuous exposure to result in a discrete exposed pattern in the layer that corresponds to the particle being produced, and exposing the layer to the light; and processing the layer to remove unexposed material around the discrete exposed pattern and to separate the discrete exposed pattern from the layer to provide the sub-millimeter scale particle.

公开(公告)号：US20170261847A1

公开(公告)日：2017-09-14

申请号：US15310108

申请日：2015-09-24

Applicant: USHIO DENKI KABUSHIKI KAISHA

Inventor： Daisuke YAJIMA ,  Kentaro NOMOTO ,  Yohei NAWAKI

IPC: G03F7/00

CPC classification number: G03F7/0005 ,  G02B5/3058 ,  G02B5/3075 ,  G03F7/201 ,  G03F7/203 ,  G03F7/22 ,  G03F7/70408 ,  G03F7/70475

Abstract: Disclosed herein an exposure apparatus capable of implementing a microfabrication onto a work with a higher throughput and a lower cost. The exposure apparatus generates interfering light by crossing two or more branched light beams branched from output light from a coherent light source at a predetermined interfering angle, and exposes the substrate by repeating an irradiation onto the substrate with the interfering light and a conveyance of the substrate. At this moment, the exposure apparatus shapes in interfering light irradiation region on the substrate onto which the interfering light is irradiated into a predetermined shape. Then, the exposure apparatus disposes a plurality of the interfering light irradiation regions in successive shots to be located adjacent to each other on the substrate in a direction of conveying the substrate without the interfering light irradiation regions being overlapped when exposing the substrate while conveying the substrate in a stepwise manner.