251.
    发明专利
    未知

    公开(公告)号:AT539129T

    公开(公告)日:2012-01-15

    申请号:AT07006413

    申请日:2007-03-28

    Abstract: Forming thin solid layers on a substrate-surface from one or more polymers and/or one or more metals by means of roller application of a liquid system, comprises applying a mixture of solvent suitable for the application and one or more liquid mixture capable for self-organization, one or more functionalized substances or groups containing layer forming polymerizable binding agent in the roller application on the substrate-surface in the form of a liquid layer, removing the solvent from the liquid layer and initiating the binding agent for the formation of a thin solid layers. Forming thin solid layers on a substrate-surface from one or more polymers and/or one or more metals by means of roller application of a liquid system, comprises applying a mixture of solvent suitable for the application and one or more liquid mixture capable for self-organization, one or more functionalized substances or groups containing layer forming polymerizable binding agent in the roller application on the substrate-surface in the form of a liquid layer, removing the solvent from the liquid layer and initiating the binding agent for self-organization for the formation of a thin solid layers on the substrate-surface from polymers and/or metals.

    252.
    发明专利
    未知

    公开(公告)号:BRPI0617946A2

    公开(公告)日:2011-08-09

    申请号:BRPI0617946

    申请日:2006-10-19

    Applicant: HENKEL KGAA

    Abstract: The invention relates to α-ethoxysilane modified polymers of the average general formula (I): in which R is a mono- to tetravalent polymer radical, not more than a third of the radicals R1, R2, and R3 present in the polymer of the formula (I), independently of one another, are alkyl radicals having 1 to 4 carbon atoms, at least a quarter of the radicals R1, R2, and R3 present in the polymer of the formula (I), independently of one another, are ethoxy radicals, any remaining radicals R1, R2, and R3, independently of one another, are methoxy radicals, and in which n is 1 to 4. The invention further relates to a process for preparing the polymers of the formula (I), and also to their use in adhesives, sealants, and coating materials.

    SELF-ETCHING CEMENTITIOUS SUBSTRATE COATING COMPOSITION

    公开(公告)号:CA2732835A1

    公开(公告)日:2010-02-18

    申请号:CA2732835

    申请日:2009-08-13

    Abstract: Coating compositions for cementitious substrates may be made from a multistage latex polymer, silane, and a wa-ter-soluble acid, acid anhydride or acid salt capable of etching or otherwise reacting with the surface of the substrate to provide coating adhesion The silane my be present as a silane coupling agent distinct from the multistage latex polymer, or may be present as silane functionality on the multistage latex polymer The coating compositions adhere well to cementitious substrates and have a self-etching capability to provide coating adhesion, especially near edges and corners

    260.
    发明专利
    未知

    公开(公告)号:DE60037705D1

    公开(公告)日:2008-02-21

    申请号:DE60037705

    申请日:2000-07-24

    Abstract: An undercoating composition comprises the reaction product of a hydroxyl group-containing benzophenone compound with a silane and/or a (partial) hydrolyzate thereof. Preferably the reaction product and/or the (partial) hydrolyzate thereof is the reaction product obtained by reacting a compound of the following general formula (A):wherein X, which may be the same or different, is hydrogen or a hydroxyl group, at least one X being a hydroxyl group, with an epoxy group-containing silane of the following general formula (B):         R 1 a SiR 2 b (OR 3 ) 4-a-b      (B)wherein R 1 is an epoxy group-containing organic group, R 2 is an alkyl group of 1 to 10 carbon atoms or aryl group, R 3 is hydrogen or a substituted or unsubstituted monovalent hydrocarbon group of 1 to 10 carbon atoms which may contain an oxygen atom, "a" is equal to 1 or 2, "b" is equal to 0 or 1, and the sum of a and b is equal to 1 or 2, in the presence of a catalyst, and/or a (partial) hydrolyzate thereof.

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