公开(公告)号：US07656504B1

公开(公告)日：2010-02-02

申请号：US08376676

申请日：1995-01-20

Applicant: Naomasa Shiraishi

Inventor： Naomasa Shiraishi

IPC: G03B27/54 ,  G03B27/42 ,  G03B27/72

CPC classification number: G03B27/42 ,  G03B27/72 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358 ,  G03F7/7055 ,  G03F9/7088

Abstract: An exposure system is provided for illuminating a fine pattern that may have features extending along orthogonal first and second linear directions. An illumination source may be provided having decreased intensity portions at a center and defined along the first and second directions.

Abstract translation: 提供曝光系统，用于照亮可能具有沿正交的第一和第二直线方向延伸的特征的精细图案。 可以提供在中心具有降低的强度部分并沿第一和第二方向限定的照明源。

公开(公告)号：US20090290891A1

公开(公告)日：2009-11-26

申请号：US12467055

申请日：2009-05-15

Applicant: Wolfgang Sievers

Inventor： Wolfgang Sievers

IPC: G03G15/043 ,  G03G15/04

CPC classification number: G03F7/2051 ,  G03F7/2008 ,  G03F7/201 ,  G03F7/2012 ,  G03F7/2057 ,  G03F7/24

Abstract: An apparatus, a method, and a plate made by the method, e.g., using the apparatus. The apparatus includes a light tunnel of light reflective walls with polygonal cross-section like a kaleidoscope, and a light source, located at one end to produce light radiation to the inside of the light tunnel towards the other end. Light entering the light tunnel towards an inner reflective surface of a wall is reflected off the inner reflective surface so that it can emerge from the other end to cure a plate having photo-curable material thereon.

Abstract translation: 通过该方法制造的装置，方法和板，例如使用该装置。 该装置包括具有像万花筒的多边形横截面的光反射壁的光通道和位于一端的光源，以产生朝向另一端的光通道内部的光辐射。 进入光通道朝向内壁反射表面的光从内部反射表面反射出来，从而可以从另一端出来固化其上具有光固化材料的板。

公开(公告)号：US20090102018A1

公开(公告)日：2009-04-23

申请号：US12276152

申请日：2008-11-21

Applicant: Donald L. Yates ,  Garry A. Mercaldi

Inventor： Donald L. Yates ,  Garry A. Mercaldi

IPC: H01L29/92

CPC classification number: H01L28/92 ,  G03F7/0035 ,  G03F7/201 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/0275 ,  H01L21/32139 ,  H01L27/10852 ,  H01L28/84 ,  H01L28/91

Abstract: Container structures for use in integrated circuits and methods of their manufacture without the use of mechanical planarization such as chemical-mechanical planarization (CMP), thus eliminating CMP-induced defects and variations. The methods utilize localized masking of holes for protection of the inside of the holes during non-mechanical removal of exposed surface layers. The localized masking is accomplished through differential exposure of a resist layer to electromagnetic or thermal energy. The container structures are adapted for use in memory cells and apparatus incorporating such memory cells, as well as other integrated circuits.

Abstract translation: 用于集成电路的容器结构及其制造方法，而不使用机械平面化（例如化学机械平面化（CMP）），从而消除了CMP引起的缺陷和变化。 该方法利用在非机械去除暴露的表面层期间的孔的局部掩蔽来保护孔的内部。 通过将抗蚀剂层与电磁或热能的差分曝光来实现局部掩蔽。 容器结构适用于并入这种存储单元的存储器单元和装置以及其它集成电路。

公开(公告)号：US07382959B1

公开(公告)日：2008-06-03

申请号：US11580335

申请日：2006-10-13

Applicant: Alan J. Jacobsen

Inventor： Alan J. Jacobsen

IPC: G02B6/10 ,  G03C5/00 ,  G03C5/04

CPC classification number: G02B6/10 ,  B82Y20/00 ,  G02B1/005 ,  G02B6/1221 ,  G02B6/1225 ,  G02B6/138 ,  G03F7/0005 ,  G03F7/0037 ,  G03F7/201 ,  G03F7/2012

Abstract: A method and system of creating one or more waveguides and/or patterning these waveguides to form a 3D microstructure that uses mask and collimated light. In one embodiment, the system includes at least one collimated light source selected to produce a collimated light beam; a reservoir having a photo-monomer adapted to polymerize by the collimated light beam; and a mask having at least one aperture and positioned between the at least one collimated light source and the reservoir. Here, the at least one aperture is adapted to guide a portion of the collimated light beam into the photo-monomer to form the at least one polymer waveguide through a portion of a volume of the photo-monomer.

Abstract translation: 创建一个或多个波导和/或图案化这些波导以形成使用掩模和准直光的3D微结构的方法和系统。 在一个实施例中，系统包括被选择用于产生准直光束的至少一个准直光源; 具有适于通过准直光束聚合的光单体的储存器; 以及具有至少一个孔并且定位在所述至少一个准直光源和所述储存器之间的掩模。 这里，至少一个孔适于将准直光束的一部分引导到光单体中以通过一部分光单体的一部分形成至少一个聚合物波导。

公开(公告)号：US20060110694A1

公开(公告)日：2006-05-25

申请号：US11301605

申请日：2005-12-13

Applicant: Chin-Hsiang Lin

Inventor： Chin-Hsiang Lin

IPC: G01B9/02 ,  G03F7/20

CPC classification number: G03F7/203 ,  G03F7/001 ,  G03F7/201

Abstract: A method for forming an arbitrary pattern of sub-micron contact holes in a substrate using a combination of interferometric photolithography and optical photolithography with a non-critical mask. The substrate is covered with a photosensitive material and is exposed by a standing wave interference pattern produced by the superposition of two coherent laser beams. Then the substrate is rotated through 90° and exposed by the same pattern. The double exposure produces a regular array of sub-micron unexposed regions which are all potentially holes if developed. The photosensitive material is then covered by a non-critical photomask and a standard light source is used to exposed those areas of the photosensitive material containing unwanted holes. Upon final development, the desired pattern is obtained.

Abstract translation: 使用干涉光刻和具有非临界掩模的光学光刻的组合在衬底中形成亚微米接触孔的任意图案的方法。 衬底被感光材料覆盖，并且通过由两个相干激光束的叠加产生的驻波干涉图案曝光。 然后将基板旋转90°并以相同的图案曝光。 双重曝光产生了亚微米未曝光区域的规则阵列，如果显影，这些区域都是潜在的孔。 感光材料然后被非关键光掩模覆盖，并且使用标准光源来曝光含有不想要的孔的感光材料的那些区域。 在最终显影时，获得所需的图案。

公开(公告)号：US20050263723A1

公开(公告)日：2005-12-01

申请号：US11196191

申请日：2005-08-02

Applicant: Michael Goldstein ,  Peter Silverman

Inventor： Michael Goldstein ,  Peter Silverman

IPC: G03F7/20 ,  G21G5/00

CPC classification number: G03F7/7005 ,  G03F7/201

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

公开(公告)号：US06967710B2

公开(公告)日：2005-11-22

申请号：US10759598

申请日：2004-01-20

Applicant: Naomasa Shiraishi

Inventor： Naomasa Shiraishi

IPC: G03B27/42 ,  G03B27/54 ,  G03F1/00 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/701 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891 ,  G03F9/7088

Abstract: An exposure apparatus and method to expose an object with an illumination beam irradiated on a mask from a light source disposes an optical unit between the light source and an optical integrator of an illumination optical system to illuminate the mask with an illumination beam, of which an intensity distribution on a Fourier transform plane with respect to a pattern on the mask has an increased intensity portion apart from the optical axis relative to a portion of the intensity distribution on the optical axis.

公开(公告)号：US20050025403A1

公开(公告)日：2005-02-03

申请号：US10924933

申请日：2004-08-25

Applicant: Masanori Ueda ,  Haruyuki Matsunaga

Inventor： Masanori Ueda ,  Haruyuki Matsunaga

IPC: C23F1/02 ,  F16C17/10 ,  F16C33/10 ,  F16C33/14 ,  G03F7/00 ,  G03F7/20 ,  G03F7/24 ,  F16C32/06

CPC classification number: G03F7/201 ,  C23F1/02 ,  F16C17/026 ,  F16C17/102 ,  F16C17/107 ,  F16C33/107 ,  F16C33/14 ,  F16C2223/70 ,  G03F7/00 ,  G03F7/2032 ,  G03F7/24 ,  Y10T29/49639

Abstract: A dynamic pressure bearing manufacturing method, comprising the steps of forming a herringbone groove pattern on the outer peripheral surface of a cylindrical mask and a spiral groove pattern on the lower surface of the flange part thereof, inserting the mask in a dynamic pressure bearing and optical fibers into the mask, radiating light from an external light source to the mask through optical fibers to transfer the herringbone groove pattern onto the inner peripheral surface of the dynamic pressure bearing and, at the same time, radiating the light from the upper side of the flange part to transfer the spiral groove pattern onto the upper surface of the dynamic pressure bearing performing development, and forming a herringbone groove on the inner peripheral surface of the bearing by etching and a spiral groove on the upper surface thereof.

Abstract translation: 一种动态压力轴承制造方法，包括以下步骤：在圆柱形掩模的外周面上形成人字形凹槽图案，并在其凸缘部分的下表面上形成螺旋形凹槽图案，将所述掩模插入动压轴承和光学 将光纤插入到掩模中，通过光纤将外部光源的光照射到掩模，将人字形槽图案转印到动压轴承的内周面上，并且同时从 凸缘部分将螺旋槽图案转移到动压轴承执行显影的上表面上，并且通过蚀刻在轴承的内周面上形成人字形槽，并在其上表面上形成螺旋槽。

公开(公告)号：US20040110092A1

公开(公告)日：2004-06-10

申请号：US10309427

申请日：2002-12-04

Applicant: Taiwan Semiconductor Manufacturing Company

Inventor： Chin-Hsiang Lin

IPC: G03F007/20

CPC classification number: G03F7/203 ,  G03F7/001 ,  G03F7/201

Abstract: A method for forming an arbitrary pattern of sub-micron contact holes in a substrate using a combination of interferometric photolithography and optical photolithography with a non-critical mask. The substrate is covered with a photosensitive material and is exposed by a standing wave interference pattern produced by the superposition of two coherent laser beams. Then the substrate is rotated through 90null and exposed by the same pattern. The double exposure produces a regular array of sub-micron unexposed regions which are all potentially holes if developed. The photosensitive material is then covered by a non-critical photomask and a standard light source is used to exposed those areas of the photosensitive material containing unwanted holes. Upon final development, the desired pattern is obtained.

Abstract translation: 使用干涉光刻和具有非临界掩模的光学光刻的组合在衬底中形成亚微米接触孔的任意图案的方法。 衬底被感光材料覆盖，并且通过由两个相干激光束的叠加产生的驻波干涉图案曝光。 然后将基板旋转90°并以相同的图案曝光。 双重曝光产生了亚微米未曝光区域的规则阵列，如果显影，这些区域都是潜在的孔。 感光材料然后被非关键光掩模覆盖，并且使用标准光源来曝光含有不想要的孔的感光材料的那些区域。 在最终显影时，获得所需的图案。

公开(公告)号：US06694503B2

公开(公告)日：2004-02-17

申请号：US09773909

申请日：2001-02-02

Applicant: Jun Minakuti ,  Osamu Tabata ,  Koji Yamamoto

Inventor： Jun Minakuti ,  Osamu Tabata ,  Koji Yamamoto

IPC: G06F1750

CPC classification number: G03F7/70558 ,  G03F7/201 ,  G03F7/2039 ,  G03F7/70358 ,  G03F7/70366 ,  G03F7/70416 ,  G03F7/70425

Abstract: For allowing processing of a material into an intended three-dimensional configuration having different processed depths while suppressing an influence exerted on a processed configuration by a configuration of a transparent portion, a processing device includes an SR light source 1 for emitting SR light, an X-ray mask having a transparent portion of a predetermined configuration for passing the X-rays emitted from the SR light source 1, and exposure stage 3 for oscillating the X-ray mask and the material relatively to each other in accordance with a movement pattern determined based on the processing configuration of the processing material for moving the X-ray mask and the material relatively to each other and thereby oscillating the region where the material is irradiated with the X-ray passed through the transparent opening.

Abstract translation: 为了允许通过透明部分的配置来抑制材料处理成具有不同处理深度的预期三维构造，同时抑制通过透明部分的配置对加工构造的影响，处理装置包括用于发射SR光的SR光源1，X射线 具有用于使从SR光源1发射的X射线通过的预定构造的透明部分的曝光掩模和用于相对于彼此相对地振动X射线掩模和材料的曝光级3 基于用于相对于彼此移动X射线掩模和材料的处理材料的处理配置，从而使穿过透明开口的X射线照射材料的区域振荡。