Abstract in simplified Chinese:本发明提供一种用于反应器中吸热气相反应的方法,其中反应物气体系经由进气设备引入到反应器中并借由气体分布设备均匀地分布到一加热区中,其中,在加热区中借由加热组件将反应物气体加热至500至1500℃的平均温度,然后将其引导到反应区中,反应物气体在反应区中反应以提供一产物气体,该产物气体系经由一出气设备而被引导出反应器。本发明进一步的主题系关于一种用于反应器中吸热气相反应的方法,其借由反应区中的温度测量控制加热组件的加热,为此在反应区中设置至少二个温度传感器;以及用于实施该方法的反应器。
Abstract in simplified Chinese:本发明揭示用于在一流体化床反应器系统中使用之一喷嘴总成及一可关闭阀总成的具体实例。该喷嘴总成包括:一第一构件,其向上延伸穿过一流体化床反应腔室之一底壁;及一第二构件。该第一构件及该第二构件经由每一构件上之螺纹可拆离地装配在一起。可移除及/或替换该第二构件,借此促进流体化床反应器之维护。该可关闭阀总成连接至一喷嘴,且包括一阀本体及枢转地连接至该阀本体之一闸。该闸可在以下两位置之间移动:一第一位置,其中在不存在穿过孔口之气体流动的情况下,至少部分地覆盖该喷嘴孔口;及一第二位置,其中在气体流经该孔口时,该孔口未被覆盖。
Abstract:
A gas distribution apparatus (80), comprising: a distribution manifold (82) in fluid communication with a gas source and a plurality of injection nozzles (60) such injection nozzles (60) comprising a tube (62) with a fluid inlet (64), a fluid outlet (66), an inner diameter and an axial length; wherein the fluid inlet (64) of at least one of the plurality of injection nozzles (60) is disposed within the distribution manifold (82) and a fluid outlet; wherein the inlet (64) of the at least one of the injection nozzles (60) comprises an annular orifice (68) surrounding a flow restriction device (70, 70C, 70F); and wherein the fluid outlet (66) is external to an outer circumference (89) of the distribution manifold (82).
Abstract:
A gas distribution apparatus (80), comprising: a distribution manifold (82) in fluid communication with a gas source and a plurality of injection nozzles (60) such injection nozzles (60) comprising a tube (62) with a fluid inlet (64), a fluid outlet (66), an inner diameter and an axial length; wherein the fluid inlet (64) of at least one of the plurality of injection nozzles (60) is disposed within the distribution manifold (82) and a fluid outlet; wherein the inlet (64) of the at least one of the injection nozzles (60) comprises an annular orifice (68) surrounding a flow restriction device (70, 70C, 70F); and wherein the fluid outlet (66) is external to an outer circumference (89) of the distribution manifold (82).
Abstract:
A dual utilization liquid and gaseous fuel CPOX reformer includes first and second CPOX reaction zones for the CPOX reforming at respectively, liquid and gaseous reformable fuels.