公开(公告)号：EP4375744A1

公开(公告)日：2024-05-29

申请号：EP22209252.0

申请日：2022-11-24

Applicant: ASML Netherlands B.V.

Inventor： SAHIN, Ezgi ,  AKBULUT, Duygu ,  ABDOLVAND, Amir

IPC: G02F1/35 ,  G02F1/365

CPC classification number: G02F1/365 ,  G02F1/3507 ,  G02F2201/0620130101 ,  G02F2201/1820130101 ,  G02F1/3501

Abstract: A photonic integrated circuit comprises an optical input configured to receive pump radiation, and a plurality of nonlinear elements connected to the optical input. The plurality of nonlinear elements are configured to generate broadband radiation upon receiving the pump radiation. At least two of the plurality of nonlinear elements differ in at least a material and/or a dimension.

公开(公告)号：EP4421843A1

公开(公告)日：2024-08-28

申请号：EP23158846.8

申请日：2023-02-27

Applicant: ASML Netherlands B.V.

Inventor： VAN ENGELEN, Jorn, Paul ,  SAHIN, Ezgi ,  AKBULUT, Duygu ,  PELLEMANS, Henricus, Petrus, Maria ,  WIELAND, Marco, Jan-Jaco ,  SLOT, Erwin ,  KUIPER, Vincent, Sylvester

IPC: H01J37/317 ,  H01J37/22

CPC classification number: H01J2237/2459220130101 ,  H01J37/3177 ,  H01J37/226 ,  H01J2237/004720130101 ,  H01J2237/3177420130101 ,  H01J2237/063520130101 ,  H01J2237/045320130101

Abstract: An electron-optical projection device for projecting a plurality of charged particle beams towards a sample, the device comprising:
a stack of plates comprising beam directing elements configured to project the plurality of charged particle beams towards a sample location on the sample,
wherein at least one plate of the stack comprises a planar optical member configured to direct stimulation light towards the sample location so that the stimulation light is coincident with the plurality of charged particle beams, desirably coincident with the paths of the plurality of charged particle beams towards the sample location, desirably in the at least one plate comprising an optical member is defined a plurality of apertures for respective paths of a plurality charged particle beams.

公开(公告)号：EP4310582A1

公开(公告)日：2024-01-24

申请号：EP22185783.2

申请日：2022-07-19

Applicant: ASML Netherlands B.V.

Inventor： AKBULUT, Duygu

IPC: G02F1/01 ,  G02B6/12

Abstract: A system configured for modifying an optical circuit is described. A radiation source is configured to adjust characteristics of radiation pulses. Shaping optics are configured to receive the radiation pulses from the radiation source and direct the radiation pulses toward one or more portions of the optical circuit to modify a refractive index of the one or more portions of the optical circuit. A processor is configured to, based on an output signal from the optical circuit, control (1) the radiation source to adjust the characteristics of the radiation pulses; (2) control the shaping optics, and/or (3) control a positioner supporting the optical circuit to direct the radiation pulses toward the one or more portions of the optical circuit, to modify the refractive index of the one or more portions of the optical circuit such that the output signal matches a target output signal.

公开(公告)号：EP3428725A1

公开(公告)日：2019-01-16

申请号：EP17181207.6

申请日：2017-07-13

Applicant: ASML Netherlands B.V.

Inventor： QUINTANILHA, Richard ,  KUMAR, Nitish ,  AKBULUT, Duygu

IPC: G03F9/00 ,  G01N23/225 ,  G01R31/305

Abstract: An inspection tool for inspecting a semiconductor substrate is described, the inspection tool comprising:
- a substrate table configured to hold the substrate;
- an electron beam source configured to project an electron beam onto an area of interest of the substrate;
- a cathode-luminesce detector configured to detect cathodoluminescent light emitted from the area of interest;
- a control unit configured to:
- receive a signal representative of the detected cathodoluminescent light;
- determine, based on the signal, a stress distribution of the area of interest.

公开(公告)号：EP4260121A1

公开(公告)日：2023-10-18

申请号：EP21811329.8

申请日：2021-11-15

Applicant: ASML Netherlands B.V.

Inventor： AKBULUT, Duygu ,  HASPESLAGH, Luc, Roger, Simonne ,  PANDEY, Nitesh ,  VAN DER WOORD, Ties, Wouter ,  BRONDANI TORRI, Guilherme ,  GOORDEN, Sebastianus, Adrianus ,  KLEIN, Alexander, Ludwig ,  OVERKAMP, Jim, Vincent ,  YEGEN, Halil, Gökay YEGEN ,  OSORIO OLIVEROS, Edgar, Alberto

IPC: G02B26/08 ,  G02B5/08 ,  G02B5/09 ,  G02B26/12 ,  G03F7/20

公开(公告)号：EP3470926A1

公开(公告)日：2019-04-17

申请号：EP17196670.8

申请日：2017-10-16

Applicant: ASML Netherlands B.V.

Inventor： RAVENSBERGEN, Janneke ,  AKBULUT, Duygu ,  PANDEY, Nitesh

IPC: G03F7/20

Abstract: A metrology apparatus is disclosed that comprises an optical system to focus radiation onto the structure and direct reflected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after reflection from the structure, such that a corresponding plurality of different offsets are provided to reflected radiation derived from a first point of a pupil plane field distribution relative to reflected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the reflected radiation derived from the first point of the pupil plane field distribution and the reflected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of said plurality of different offsets.

公开(公告)号：EP3279736A1

公开(公告)日：2018-02-07

申请号：EP16182256.4

申请日：2016-08-01

Applicant: ASML Netherlands B.V.

Inventor： GOORDEN, Sebastianus, Adrianus ,  PANDEY, Nitesh ,  AKBULUT, Duygu ,  TUKKER, Teunis, Willem ,  DE WIT, Johannes, Matheus, Marie

IPC: G03F7/20 ,  G02B6/42

CPC classification number: G03F7/7015 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8822 ,  G01N2201/0631 ,  G02B6/262 ,  G02B6/4204 ,  G02B6/4296 ,  G03F7/70075 ,  G03F7/70583 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: Devices (30) and methods for processing a radiation beam (1) with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam (1) comprises components distributed over one or more radiation beam spatial modes. A waveguide (20) supports a plurality of waveguide spatial modes. The optical system (10) directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the input interface (26) of the waveguide (20) in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes, e. g. by directing by the optical system (10) the plurality of components of the radiation beam (1) belonging to a common radiation spatial mode onto different positions (61-63) of the input interface (26).

Abstract translation: 公开了用于以相干处理辐射束（1）的设备（30）和方法。 在一种布置中，光学系统接收具有相干性的辐射束。 辐射束（1）包括分布在一个或多个辐射束空间模式上的分量。 波导（20）支持多个波导空间模式。 光学系统（10）将属于公共辐射束空间模式且具有不同频率的辐射束的多个分量引导到波导（20）的输入接口（26）上，使得多个 的组件耦合到一组不同的波导空间模式，每组包括一个或多个波导空间模式， G。 通过光学系统（10）将属于公共辐射空间模式的辐射束（1）的多个分量引导到输入接口（26）的不同位置（61-63）上。