公开(公告)号：US20200185281A1

公开(公告)日：2020-06-11

申请号：US16790809

申请日：2020-02-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Adriaan Johan VAN LEEST ,  Anagnostis TSIATMAS ,  Paul Christiaan HINNEN ,  Elliott Gerard MC NAMARA ,  Alok VERMA ,  Thomas THEEUWES ,  Hugo Augustinus Joseph CRAMER

IPC: H01L21/66 ,  G01N21/95 ,  G03F9/00 ,  G03F7/20

Abstract: A method of configuring a parameter determination process, the method including: obtaining a mathematical model of a structure, the mathematical model configured to predict an optical response when illuminating the structure with a radiation beam and the structure having geometric symmetry at a nominal physical configuration; using, by a hardware computer system, the mathematical model to simulate a perturbation in the physical configuration of the structure of a certain amount to determine a corresponding change of the optical response in each of a plurality of pixels to obtain a plurality of pixel sensitivities; and based on the pixel sensitivities, determining a plurality of weights for combination with measured pixel optical characteristic values of the structure on a substrate to yield a value of a parameter associated with change in the physical configuration, each weight corresponding to a pixel.

公开(公告)号：US20190242782A1

公开(公告)日：2019-08-08

申请号：US16253338

申请日：2019-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Mariya Vyacheslavivna MEDVEDYEVA ,  Anagnostis TSIATMAS ,  Hugo Augustinus Joseph CRAMER ,  Martinus Hubertus Maria VAN WEERT ,  Bastiaan Onne FAGGINGER AUER ,  Xiaoxin SHANG ,  Johan Maria VAN BOXMEER ,  Bert VERSTRAETEN

IPC: G01M11/02

CPC classification number: G01M11/0228 ,  G02B7/38 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641

Abstract: Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.

公开(公告)号：US20190129316A1

公开(公告)日：2019-05-02

申请号：US16170786

申请日：2018-10-25

Applicant: ASML Netherlands B.V.

Inventor： Zili ZHOU ,  Gerbrand VAN DER ZOUW ,  Nitesh PANDEY ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Martinus Hubertus Maria VAN WEERT ,  Anagnostis TSIATMAS ,  Sergey TARABRIN ,  Hilko Dirk BOS

IPC: G03F7/20

Abstract: The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.