公开(公告)号：US11347142B2

公开(公告)日：2022-05-31

申请号：US17206649

申请日：2021-03-19

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand Vles ,  Erik Achilles Abegg ,  Aage Bendiksen ,  Derk Servatius Gertruda Brouns ,  Pradeep K. Govil ,  Paul Janssen ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  James Norman Wiley

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/22 ,  G03F1/62

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

公开(公告)号：US11314163B2

公开(公告)日：2022-04-26

申请号：US16754865

申请日：2018-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Anton Wilhelmus Duys ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Pieter-Jan Van Zwol ,  David Ferdinand Vles

IPC: G03F1/64

Abstract: A pellicle frame for supporting a pellicle, the frame having a first surface and a second surface opposite the first surface, and a structure provided between the first and the second surfaces, wherein the first and second surfaces and the structure at least partially define at least one volume therebetween that is devoid of the material that forms the frame.

公开(公告)号：US11029595B2

公开(公告)日：2021-06-08

申请号：US16707201

申请日：2019-12-09

Applicant: ASML Netherlands B.V.

Inventor： Derk Servatius Gertruda Brouns ,  Dennis De Graaf ,  Robertus Cornelis Martinus De Kruif ,  Paul Janssen ,  Matthias Kruizinga ,  Arnoud Willem Notenboom ,  Daniel Andrew Smith ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  James Norman Wiley

IPC: G03F1/66 ,  G03F1/62 ,  G03F1/64 ,  G03F1/38 ,  G03F1/84 ,  G03F1/22 ,  G03F1/42

Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

公开(公告)号：US10983431B2

公开(公告)日：2021-04-20

申请号：US16667956

申请日：2019-10-30

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand Vles ,  Erik Achilles Abegg ,  Aage Bendiksen ,  Derk Servatius Gertruda Brouns ,  Pradeep K. Govil ,  Paul Janssen ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  James Norman Wiley

IPC: G03B27/42 ,  G03F1/64 ,  G03F1/22 ,  G03F7/20 ,  G03F1/62

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

公开(公告)号：US10571800B2

公开(公告)日：2020-02-25

申请号：US15545390

申请日：2016-02-01

Applicant: ASML Netherlands B.V.

Inventor： Derk Servatius Gertruda Brouns ,  Dennis De Graaf ,  Robertus Cornelis Martinus De Kruif ,  Paul Janssen ,  Matthias Kruizinga ,  Arnoud Willem Notenboom ,  Daniel Andrew Smith ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  James Norman Wiley

IPC: G03F1/84 ,  G03F1/66 ,  G03F1/22 ,  G03F1/42 ,  G03F1/64 ,  G03F1/62

Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

公开(公告)号：US09494875B2

公开(公告)日：2016-11-15

申请号：US14349900

申请日：2012-09-19

Applicant: ASML Netherlands B.V.

Inventor： Sebastiaan Maria Johannes Cornelissen ,  Noud Jan Gilissen ,  Anko Jozef Cornelus Sijben ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Arnoud Willem Notenboom ,  Ronald Van Der Wilk ,  Manon Elise Will

IPC: G03F7/20 ,  H01L21/683 ,  G10L15/08 ,  G10L15/22

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70908 ,  G10L15/08 ,  G10L2015/223 ,  H01L21/6831

Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Abstract translation: 公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。 在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中 图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48） 用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于由于施加到驱动电极的电压而减少或防止温度调节流体通道中温度调节流体的电场的发展，以便减少或防止流体中的电解。

公开(公告)号：US09429857B2

公开(公告)日：2016-08-30

申请号：US14395979

申请日：2013-03-19

Applicant: ASML Netherlands B.V.

Inventor： Ronald Van Der Wilk ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Arnoud Willem Notenboom ,  Manon Elise Will

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70708 ,  G03F7/70875 ,  H01L21/6831

Abstract: An electrostatic clamp (21) configured to hold an object, the electrostatic clamp comprising an electrode (24), a resistive portion (23) formed from a resistive material located on the electrode, and a dielectric portion (22) formed from a dielectric material located on the resistive portion.

Abstract translation: 一种构造成保持物体的静电夹具（21），所述静电夹具包括电极（24），由位于所述电极上的电阻材料形成的电阻部分（23）和由电介质材料形成的电介质部分 位于电阻部分上。

公开(公告)号：US20140253900A1

公开(公告)日：2014-09-11

申请号：US14349900

申请日：2012-09-19

Applicant: ASML Netherlands B.V.

Inventor： Sebastiaan Maria Johannes Cornelissen ,  Noud Jan Gilissen ,  Anko Jozef Cornelus Sijben ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Arnoud Willem Notenboom ,  Ronald Van Der Wilk ,  Manon Elise Will

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70908 ,  G10L15/08 ,  G10L2015/223 ,  H01L21/6831

Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Abstract translation: 公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。 在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中 图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48） 用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于由于施加到驱动电极的电压而减少或防止温度调节流体通道中温度调节流体的电场的发展，以便减少或防止流体中的电解。