公开(公告)号：US20160377989A1

公开(公告)日：2016-12-29

申请号：US15261616

申请日：2016-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Michel Riepen ,  Cornelius Maria Rops

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.

公开(公告)号：US20220137519A1

公开(公告)日：2022-05-05

申请号：US17580696

申请日：2022-01-21

Applicant: ASML Netherlands B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10916453B2

公开(公告)日：2021-02-09

申请号：US16564969

申请日：2019-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Aart Adrianus Van Beuzekom ,  Jozef Augustinus Maria Alberti ,  Hubert Marie Segers ,  Ronald Van Der Ham ,  Francis Fahrni ,  Ruud Olieslagers ,  Gerben Pieterse ,  Cornelius Maria Rops ,  Pepijn Van Den Eijnden ,  Paul Van Dongen ,  Bas Willems

IPC: H01L21/67 ,  H01L21/52 ,  G03F7/20

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：US10551748B2

公开(公告)日：2020-02-04

申请号：US15537214

申请日：2015-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria Rops ,  Walter Theodorus Matheus Stals ,  David Bessems ,  Giovanni Luca Gattobigio ,  Victor Manuel Blanco Carballo ,  Erik Henricus Egidius Catharina Eummelen ,  Ronald Van Der Ham ,  Frederik Antonius Van Der Zanden ,  Wilhelmus Antonius Wernaart

IPC: G03F7/20 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US10416571B2

公开(公告)日：2019-09-17

申请号：US16063583

申请日：2016-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10133190B2

公开(公告)日：2018-11-20

申请号：US15261616

申请日：2016-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena Cortie ,  Michel Riepen ,  Cornelius Maria Rops

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.

公开(公告)号：US10095129B2

公开(公告)日：2018-10-09

申请号：US15321115

申请日：2015-06-01

Applicant: ASML Netherlands B.V.

Inventor： Giovanni Luca Gattobigio ,  Erik Henricus Egidius Catharina Eummelen ,  Ruud Olieslagers ,  Gerben Pieterse ,  Cornelius Maria Rops ,  Laurentius Johannes Adrianus Van Bokhoven

IPC: G03F7/20

Abstract: A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of the projection system and/or a component of the lithographic apparatus at least partially surrounding the final element of the projection system, and on the other side by a surface of the fluid confinement structure. The apparatus is configured to increase the humidity of the gas within the space.

公开(公告)号：US09971255B2

公开(公告)日：2018-05-15

申请号：US15451007

申请日：2017-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena Cortie ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

公开(公告)号：US20170176875A1

公开(公告)日：2017-06-22

申请号：US15451007

申请日：2017-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

公开(公告)号：US20170131644A1

公开(公告)日：2017-05-11

申请号：US15321115

申请日：2015-06-01

Applicant: ASML Netherlands B.V.

Inventor： Giovanni Luca GATTOBIGIO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ruud OLIESLAGERS ,  Gerben PIETERSE ,  Cornelius Maria Rops ,  Laurentius Johannes Adrianus VAN BOKHOVEN

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70341 ,  G03F7/709

Abstract: A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of the projection system and/or a component of the lithographic apparatus at least partially surrounding the final element of the projection system, and on the other side by a surface of the fluid confinement structure. The apparatus is configured to increase the humidity of the gas within the space.