公开(公告)号：EP3055737A1

公开(公告)日：2016-08-17

申请号：EP14766961.8

申请日：2014-09-11

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： TINNEMANS, Patricius Aloysius Jacobus ,  DEN BOEF, Arie Jeffrey ,  KREUZER, Justin Loyd ,  MATHIJSSEN, Simon Gijsbert Josephus

IPC: G03F9/00

CPC classification number: G03F9/7069 ,  G01B9/02011 ,  G01B9/02015 ,  G01B11/272 ,  G01B2290/70 ,  G03F9/7049 ,  G03F9/7088

Abstract: Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.