公开(公告)号：US20200018944A1

公开(公告)日：2020-01-16

申请号：US16508087

申请日：2019-07-10

Applicant: ASML Netherlands B.V

Inventor： Wei FANG ,  Lingling PU ,  Thomas Jarik HUISMAN ,  Erwin Paul SMAKMAN

IPC: G02B21/36 ,  G02B21/00 ,  G06T5/50 ,  G06T7/00 ,  G06K9/00 ,  G06N20/00

Abstract: Systems and methods for image enhancement are disclosed. A method for enhancing an image may include acquiring a first scanning electron microscopy (SEM) image at a first resolution. The method may also include acquiring a second SEM image at a second resolution. The method may further include providing an enhanced image by using the first SEM image as a reference to enhance the second SEM image. The enhanced image may be provided by using one or more features extracted from the first image to enhance the second SEM image, or using the first SEM image as a reference to numerically enhance the second SEM image.