公开(公告)号：EP4445218A1

公开(公告)日：2024-10-16

申请号：EP22808826.6

申请日：2022-10-27

Applicant: ASML Netherlands B.V.

Inventor： ZHANG, Huaichen ,  TIMOSHKOV, Vadim Yourievich ,  TABERY, Cyrus, Emil ,  HAUPTMANN, Marc ,  KHODKO, Oleksandr

IPC: G03F7/20 ,  H01L21/66

公开(公告)号：EP3734364A1

公开(公告)日：2020-11-04

申请号：EP19171535.8

申请日：2019-04-29

Applicant: ASML Netherlands B.V.

Inventor： HAUPTMANN, Marc ,  ISMAIL, Amir Bin ,  RAHMAN, Rizvi

IPC: G03F7/20 ,  G05B19/418 ,  H01L21/66

Abstract: A method for generating a control scheme for a device manufacturing process, the method comprising: obtaining a measurement data time series of a plurality of substrates on which an exposure step and a process step have been performed; transforming the measurement data time series to obtain frequency domain data; and determining, using the frequency domain data, a control scheme to be performed on subsequent substrates.

公开(公告)号：EP3529667A1

公开(公告)日：2019-08-28

申请号：EP17781433.2

申请日：2017-09-28

Applicant: ASML Netherlands B.V.

Inventor： KOU, Weitian ,  YPMA, Alexander ,  HAUPTMANN, Marc ,  KUPERS, Michiel ,  VERGAIJ-HUIZER, Lydia, Marianna ,  WALLERBOS, Erik, Johannes, Maria ,  DELVIGNE, Erik, Henri, Adriaan ,  ROELOFS, Willem, Seine, Christian ,  CEKLI, Hakki, Ergun ,  VAN DER SANDEN, Stefan, Cornelis, Theodorus ,  GROUWSTRA, Cédric, Désiré ,  DECKERS, David, Frans, Simon ,  GIOLLO, Manuel ,  DOVBUSH, Iryna

IPC: G03F7/20