公开(公告)号：US10191393B2

公开(公告)日：2019-01-29

申请号：US15558552

申请日：2016-02-22

Applicant: ASML Netherlands B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Marcel Koenraad Marie Baggen ,  Fransiscus Mathijs Jacobs ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Frank Pieter Albert Van Den Berkmortel ,  Marc Wilhelmus Maria Van Der Wijst

IPC: G03F7/20 ,  G03F9/00

Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.

公开(公告)号：US09891541B2

公开(公告)日：2018-02-13

申请号：US14395461

申请日：2013-04-16

Applicant: ASML Netherlands B.V.

Inventor： Johannes Henricus Wilhelmus Jacobs ,  Jan Steven Christiaan Westerlaken

IPC: G03B27/52 ,  G03B27/58 ,  G03F7/20 ,  H01L21/67

CPC classification number: G03F7/70875 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/70816 ,  G03F7/70891 ,  G03F7/7095 ,  H01L21/67103

Abstract: A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.

公开(公告)号：US20170090304A1

公开(公告)日：2017-03-30

申请号：US15297001

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johanne De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70733

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

公开(公告)号：US20150168854A1

公开(公告)日：2015-06-18

申请号：US14411870

申请日：2013-06-05

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Ruud Hendrikus Martinus Johannes Bloks ,  Peter A. Delmastro ,  Thibault Simon Mathieu Laurent ,  Martinus Hendrikus Antonius Leenders ,  Mark Josef Schuster ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Justin Matthew Verdirame ,  Samir A. Nayfeh

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70916 ,  G03F7/70933

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。

公开(公告)号：US20150070666A1

公开(公告)日：2015-03-12

申请号：US14395461

申请日：2013-04-16

Applicant: ASML Netherlands B.V.

Inventor： Johannes Henricus Wilhelmus Jacobs ,  Jan Steven Christiaan Westerlaken

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/70816 ,  G03F7/70891 ,  G03F7/7095 ,  H01L21/67103

Abstract: A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.

Abstract translation: 一种用于对基材进行热调节的热调节单元，所述热调节单元包括：热调节元件，其在使用中具有面向所述基板的第一层，并且包括具有100W / mK以上的导热率的材料，第二层 和位于第一和第二层之间的传热部件; 以及加热构件，其比所述热调节元件更硬，并且构造成支撑所述热调节元件，以便减小其机械变形，其中所述热调节元件与所述加强构件热隔离。

公开(公告)号：US12235585B2

公开(公告)日：2025-02-25

申请号：US17764865

申请日：2020-09-08

Applicant: ASML Netherlands B.V.

Inventor： Remco Johannes Elisa Heijmans ,  Gerrit Van Der Straaten ,  Ivo Vanderhallen ,  Jan Steven Christiaan Westerlaken

IPC: G03F7/00 ,  H05G2/00

Abstract: A radiation source for an EUV lithography apparatus is disclosed. The radiation source comprises a chamber comprising a plasma formation region, a radiation collector arranged in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region, and a radiation conduit disposed between the radiation collector and the intermediate focus region. The radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow. Also disclosed is a method of reducing debris and/or vapor deposition in the radiation conduit by providing a protective gas flow to the at least one outlet of the radiation conduit.

公开(公告)号：US11846887B2

公开(公告)日：2023-12-19

申请号：US17715641

申请日：2022-04-07

Applicant: ASML Netherlands B.V.

Inventor： Yue Ma ,  Antonius Theodorus Wilhelmus Kempen ,  Klaus Martin Hummler ,  Johannes Hubertus Josephina Moors ,  Jeroen Hubert Rommers ,  Hubertus Johannes Van De Wiel ,  Andrew David Laforge ,  Fernando Brizuela ,  Rob Carlo Wieggers ,  Umesh Prasad Gomes ,  Elena Nedanovska ,  Celal Korkmaz ,  Alexander Downn Kim ,  Rui Miguel Duarte Rodrigues Nunes ,  Hendrikus Alphonsus Ludovicus Van Dijck ,  William Peter Van Drent ,  Peter Gerardus Jonkers ,  Qiushi Zhu ,  Parham Yaghoobi ,  Jan Steven Christiaan Westerlaken ,  Martinus Hendrikus Antonius Leenders ,  Alexander Igorevich Ershov ,  Igor Vladimirovich Fomenkov ,  Fei Liu ,  Johannes Henricus Wilhelmus Jacobs ,  Alexey Sergeevich Kuznetsov

IPC: G03F7/00

CPC classification number: G03F7/70166 ,  G03F7/70033 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70925

Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

公开(公告)号：US10788763B2

公开(公告)日：2020-09-29

申请号：US15354821

申请日：2016-11-17

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Ruud Hendrikus Martinus Johannes Bloks ,  Peter A. Delmastro ,  Thibault Simon Mathieu Laurent ,  Martinus Hendrikus Antonius Leenders ,  Mark Josef Schuster ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Justin Matthew Verdirame ,  Samir A. Nayfeh

IPC: G03B27/52 ,  G03F7/20

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

公开(公告)号：US10216102B2

公开(公告)日：2019-02-26

申请号：US15894223

申请日：2018-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03F7/20

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US10191395B2

公开(公告)日：2019-01-29

申请号：US15856153

申请日：2017-12-28

Applicant: ASML Netherlands B.V.

Inventor： Johannes Henricus Wilhelmus Jacobs ,  Jan Steven Christiaan Westerlaken

IPC: G03B27/52 ,  G03B27/58 ,  G03F7/20 ,  H01L21/67

Abstract: A thermal conditioning unit to thermally condition a substrate in a lithographic apparatus, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.