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    Lithography equipment, and method of manufacturing device
    23.
    发明专利
    Lithography equipment, and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2008085370A

    公开(公告)日：2008-04-10

    申请号：JP2007324518

    申请日：2007-12-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  RIEPEN MICHEL

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment suitable for preventing or reducing generation of bubbles by preventing bubbles from leaking to a radiation beam passage through one or more gaps in a substrate table, or by extracting bubbles possibly generated in the gap. SOLUTION: The lithography equipment is configured to project a desired pattern image on a substrate W held on a substrate table WT through liquid; in the surface of the substrate table, a gap 22 exists between the substrate table and the outer edge of the substrate, or between the substrate table and other component which comes in contact with the liquid during normal use; and a bubble holding device configured to hold bubbles 24 possibly generated in the gap is provided in the gap. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：通过防止气泡通过衬底台中的一个或多个间隙而泄漏到辐射束通道中，或通过提取可能在间隙中产生的气泡来提供适于防止或减少气泡产生的浸没式光刻设备 。 解决方案：光刻设备被配置为通过液体在保持在衬底台WT上的衬底W上投影所需图案图像; 在基板台的表面上，在正常使用之间，在基板台与基板的外边缘之间，或基板台与与液体接触的其它部件之间存在间隙22; 并且在所述间隙中设置气泡保持装置，所述气泡保持装置构造成保持可能在间隙中产生的气泡24。 版权所有（C）2008，JPO＆INPIT

    Lithography apparatus and device manufacturing method
    25.
    发明专利
    Lithography apparatus and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2006196905A

    公开(公告)日：2006-07-27

    申请号：JP2006005636

    申请日：2006-01-13

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： KEMPER NICOLAAS RUDOLF ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  TEN KATE NICOLAAS ,  VAN DER MEULEN FRITS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70866 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus, having a liquid feed system configured to supply immersion liquid to spacing between the final element and substrate of the projection system, for which the improvement is made so that the liquid from the near-by area of the substrate can be removed efficiently. SOLUTION: This liquid feed system comprises a seal component for forming a sealing between the lower surface of the system and the substrate that virtually accommodates the liquid in the spacing. A concave section is formed on the lower surface, and the concave section is connected with a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source is set to be at a lower pressure level than that of the second pressure source so that the gas flow is produced, from the second pressure source to the first pressure source. The liquid and/or gas can be extracted due to this flow. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻设备，其具有液体供给系统，该液体供给系统构造成将浸没液体供应到投影系统的最终元件和基板之间的间隔，其中进行改进使得来自近处的液体 可以有效地去除衬底的面积。 解决方案：该液体供给系统包括用于在系统的下表面和基本上容纳间隔的液体的基底之间形成密封的密封部件。 在下表面上形成凹部，凹部与用于取出液体和/或气体的第一压力源和第二压力源连接。 第一压力源设定在比第二压力源低的压力水平，从而从第二压力源到第一压力源产生气体流。 由于这种流动，液体和/或气体可以被提取。 版权所有（C）2006，JPO＆NCIPI

    Lithography apparatus and device manufacturing method
    26.
    发明专利
    Lithography apparatus and device manufacturing method 审中-公开
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2006165550A

    公开(公告)日：2006-06-22

    申请号：JP2005347652

    申请日：2005-12-01

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS H ,  STREEFKERK BOB

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of moving a substrate in a different direction without switching the direction of a liquid flowing between a projection system of the lithographic apparatus and the substrate, in the lithography apparatus having a liquid supplying system. SOLUTION: This lithographic apparatus has an input port for supplying the liquid to a space between the projection system of the lithography apparatus and the substrate, and an output port for removing at least one part of the liquid. The lithographic apparatus has a liquid supplying system for rotating any one or both of the input port and output port around an axis line substantially perpendicular to an exposure plane of the substrate. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻设备，其能够在不改变在光刻设备的投影系统和基板之间流动的液体的方向的方向上移动基板，而在具有液体供应的光刻设备中 系统。 解决方案：该光刻设备具有用于将液体供应到光刻设备的投影系统与基板之间的空间的输入端口和用于去除至少一部分液体的输出端口。 光刻设备具有一个液体供应系统，用于围绕基本上垂直于衬底的曝光平面的轴线旋转输入端口和输出端口中的任何一个或两个。 版权所有（C）2006，JPO＆NCIPI

    Lithography device and manufacturing method for the device
    29.
    发明专利
    Lithography device and manufacturing method for the device 审中-公开
    设备的平面设备和制造方法

    公开(公告)号：JP2005183966A

    公开(公告)日：2005-07-07

    申请号：JP2004362923

    申请日：2004-12-15

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： VAN DEN BIGGELAAR PETRUS MARIN ,  COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS LAMBER ,  KNOOPS THEODORUS ,  TSO YIN TIM

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70508 ,  G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography device of which the settling behavior in the high precision positioning of an actuator is improved, and to provide a manufacturing method for the device. SOLUTION: The lithography device is equipped with a supporting structure MT which is so constituted that it holds a patterning device MA, a substrate table WT which is so constituted that the patterning device forms a pattern in a radiation beam and the substrate table WT holds a substrate, the actuator which is so constituted that it moves at least one of the supporting structure and the substrate, a controller which is so constituted that it inputs movement signal to the actuator, and a projection system which is so constituted that the movement signal controls the actuator to generate the movement of at least one of the supporting structure and the substrate table, the absolute value of at least one of derivatives for the movement position versus time of the 4th or more is restricted within a value less than a maximum limit, and the patterned beam is projected on a target portion of the substrate. COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种在致动器的高精度定位中提高沉降行为的光刻装置，并提供该装置的制造方法。 解决方案：光刻设备配备有支撑结构MT，其构造成保持图案形成装置MA，衬底台WT被构造成使得图案形成装置在辐射束中形成图案，并且衬底台 WT保持基板，致动器被构造成使得其移动至少一个支撑结构和基板，控制器被构造成将其输入到致动器的运动信号，以及投影系统，其被构造成使得 运动信号控制致动器以产生支撑结构和衬底台中的至少一个的移动，用于第四或更多的运动位置相对于时间的导数中的至少一个的绝对值被限制在小于 最大限度，并且图案化的光束投射在基板的目标部分上。 版权所有（C）2005，JPO＆NCIPI

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