公开(公告)号：JP2011238939A

公开(公告)日：2011-11-24

申请号：JP2011134129

申请日：2011-06-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  MARCO KOERT STAVENGA ,  BAUKE JANSEN ,  RAYMOND GERARDUS MARIUS BEEREN ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEONARDUS CUIJPERS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can be cleaned easily and effectively, and to provide a method of effectively cleaning an immersion lithographic apparatus.SOLUTION: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of cleaning the immersion lithographic projection apparatus using megasonic waves through a liquid are disclosed. A flow, desirably a radial flow, is induced in the liquid.

Abstract translation: 要解决的问题：提供可以容易且有效地清洁的光刻设备，并提供一种有效地清洗浸没式光刻设备的方法。 公开了一种浸没式光刻投影装置，其具有构造成清洁表面的兆声传感器和使用超声波清洗液体的浸没式光刻投影装置的方法。 在液体中诱导流动，期望地是径向流动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011071535A

公开(公告)日：2011-04-07

申请号：JP2010260034

申请日：2010-11-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic device. SOLUTION: The lithographic device includes: a substrate table WT configured to hold a substrate; a projection system configured to project a patterned radiation beam onto the substrate; a megasonic transducer 20 configured to clean a surface; and a liquid supply system configured to supply a liquid between the megasonic transducer 20 and the surface to be cleaned. A surface of an immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer 20 configured to clean the surface. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 光刻设备包括：被配置为保持衬底的衬底台WT; 投影系统，被配置为将图案化的辐射束投影到所述衬底上; 构造成清洁表面的兆声换能器20; 以及液体供应系统，其构造成在所述兆声换能器20和待清洁表面之间提供液体。 浸没光刻投影仪的表面使用被配置为清洁表面的兆声传感器20产生的兆声波来清洁。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011029599A

公开(公告)日：2011-02-10

申请号：JP2010107057

申请日：2010-05-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  VAN DER NET ANTONIUS JOHANNUS ,  KRAMER PIETER JACOB ,  KUIJPER ANTHONIE ,  MARTENS ARJAN HUBRECHT JOSEF ANNA ,  CASIMIRI ERIC WILLEM FELIX

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a system which reduces pollution in an immersion lithographic apparatus, and reduces an interruption time for cleaning the immersion lithographic apparatus if not eliminated.
SOLUTION: A cleaner (for instance, an active cleaning agent) is added to immersion liquid in order to clean and/or prevent accumulation of pollution during exposure of a substrate to clean the immersion lithographic apparatus. For the cleaner, a surface-active agent, a cleaning agent, soap, an acid, an alkali, a solvent (nonpolar organic solvent, polar organic solvent or the like), another optional cleaning agent appropriate for a lithographic apparatus or the like is used. The cleaning agent may be present at a concentration

Abstract translation: 要解决的问题：提供一种减少浸没式光刻设备中的污染的系统，并且如果不消除浸没式光刻设备的清洁，减少清洗中断时间。

解决方案：为了清洁和/或防止在曝光基材以清洁浸没式光刻设备时的污染积聚，将清洁剂（例如，活性清洁剂）加入到浸液中。 对于清洁剂，表面活性剂，清洁剂，皂，酸，碱，溶剂（非极性有机溶剂，极性有机溶剂等），适用于光刻设备的其它任选的清洁剂等是 用过的。 清洁剂可以以<300ppb的浓度存在。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010245569A

公开(公告)日：2010-10-28

申请号：JP2010164859

申请日：2010-07-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus which reduces bubbles in an immersion liquid to prevent an adverse effect on pattern image quality. SOLUTION: The liquid immersion lithographic apparatus is provided to minimize bubbles generated or to prevent bubbles from being generated in the immersion liquid by reducing sizes or volumes of gaps between a target object and a substrate support table, and their upper structures, in the liquid immersion lithographic apparatus, and/or preparing a cover plate covering the gaps. The liquid immersion lithographic apparatus may further include an actuator which laterally moves the target object in a hole of the substrate support table to reduce a gap between a peripheral end of the target object and an inner side of the hole when the target object is in contact with the immersion liquid. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种减少浸没液体中的气泡以防止对图案图像质量的不利影响的液浸光刻设备。 解决方案：提供液浸式光刻设备，以最小化产生的气泡或通过减少目标物体和基底支撑台及其上部结构之间的间隙的尺寸或体积来防止在浸没液体中产生气泡， 液浸光刻设备，和/或制备覆盖间隙的盖板。 液浸式光刻设备还可以包括致动器，该致动器在目标物体接触时使目标物体在基板支撑台的孔中横向移动，以减小目标物体的外周端与孔的内侧之间的间隙 与浸没液体。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010183112A

公开(公告)日：2010-08-19

申请号：JP2010116463

申请日：2010-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is sealed between a final element of a projection system and a substrate. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the liquid.
COPYRIGHT: (C)2010,JPO&INPIT

公开(公告)号：JP2010114455A

公开(公告)日：2010-05-20

申请号：JP2009293786

申请日：2009-12-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GRAAF ROELOF FREDERICK DE ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  HOOGENDAM CHRISTIAAN A ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD C ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the radiated projection beam passes.
SOLUTION: This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中采取措施来防止或减少辐射投影光束通过的液体中气泡的存在。 解决方案：这可以通过例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使位于流动的边缘附近的光轴径向向外的局部流动来实现 基质。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009267404A

公开(公告)日：2009-11-12

申请号：JP2009100474

申请日：2009-04-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WATSO ROBERT DOUGLAS ,  VAN DOMMELEN YOURI JOHANNES LA ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  JEROEN JOHANNES SOPHIA MARIA M ,  STEIJAART PETER PAUL ,  DE JONG ANTHONIUS MARTINUS COR ,  VAN DE WINKEL JIMMY MATHEUS WI ,  DA PAZ SENA JOAO PAULO ,  VAN DER LEE MAURICE MARTINUS J ,  VAN LIER HENRICUS MARTINUS DOR ,  TANASA GHEORGHE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus including a cleaning station. SOLUTION: Several embodiments of a cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with a final element of a projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种包括清洁站的光刻投影设备。 解决方案：公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体的起泡。 还公开了热隔离岛的使用以及其最佳位置。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009188383A

公开(公告)日：2009-08-20

申请号：JP2008315117

申请日：2008-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VAN DER DONCK JACQUES COR JOHA ,  VAN DEN DOOL TEUNIS CORNELIS ,  OOSTERHUIS GERRIT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: B08B3/02 ,  B08B5/02 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To solve a problem of contamination to a liquid immersed lithographic apparatus introduced via immersion liquid or via another mechanism. SOLUTION: The method for cleaning liquid immersed lithographic apparatus utilizes an aerosol spray to be guided to the surface to be cleaned. The aerosol spray utilizes an inert gas such as nitrogen or carbon dioxide, and as a solid or a liquid, water such as ultrapure water, another solvent or a cleaning fluid. Spray from the aerosol is enclosed in a space. If the aerosol collides with the surface to be cleaned, contaminated substances are removed. The removed contaminating substances are guided to an aerosol spray orifice or an outlet together with substances discharged from the outlet (a gas and a liquid and/or a solid). COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：解决通过浸没液引入的液浸式光刻设备或通过其他机构的污染问题。 解决方案：用于清洗液浸光刻设备的方法利用气溶胶喷雾器被引导到待清洁的表面。 气溶胶喷雾使用惰性气体如氮气或二氧化碳，以及作为固体或液体的水，例如超纯水，另一溶剂或清洗液。 从气溶胶喷雾被封闭在一个空间中。 如果气溶胶与要清洁的表面碰撞，则污染物质被去除。 去除的污染物质与从出口排放的物质（气体和液体和/或固体）一起被引导到气溶胶喷雾孔或出口。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009094529A

公开(公告)日：2009-04-30

申请号：JP2008298704

申请日：2008-11-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN DER TOORN JAN-GERARD CORNE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and a method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. SOLUTION: To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种当封闭表面用于将液体限制在液体供应系统中时减少光刻设备中浸没液体的污染的装置和方法。 解决方案：为了避免或减少由与液体供应系统碰撞的关闭表面引起的颗粒污染，闭合表面保持与液体供应系统相距一定距离，使得闭合表面和液体之间没有碰撞 供应系统，但液体仍然受到限制。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009044185A

公开(公告)日：2009-02-26

申请号：JP2008274716

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT is provided with a drainage ditch or barrier 40 surrounding an outer circumferential edge of the substrate W and a barrier 100 surrounding other objects 20 like sensors positioned in the same plane substantially as the upper surface of the substrate W. The barriers 40 and 100 are configured to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, so thereby reducing the risk of contamination of fine components in the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT设置有围绕衬底W的外周边缘的排水沟或障壁40，以及围绕其它物体20的阻挡物100，其围绕基本上与衬底的上表面位于同一平面中的传感器 阻挡层40和100构造成在衬底W暴露的同时收集从液体供应系统溢出的所有液体，从而降低光刻投影设备中精细部件污染的风险。 版权所有（C）2009，JPO＆INPIT