公开(公告)号：JP2008085326A

公开(公告)日：2008-04-10

申请号：JP2007232149

申请日：2007-09-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WERKMAN ROY ,  MOS EVERHARDUS CORNELIS ,  SCHAAR MAURITS VAN DER

IPC: H01L21/027

CPC classification number: G03F7/70633

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus capable of improving image quality in a plurality of focal depths.
SOLUTION: When using a scatterometer, different sections of a target region have different focal depths, respectively, and therefore, when measuring an entire region, a result of the measurement is partially out of a focus. In order to compensate this, a lens array is arranged in a back focal plane of a high numerical aperture lens.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决的问题：提供能够提高多个焦点深度的图像质量的装置。 解决方案：当使用散射仪时，目标区域的不同部分分别具有不同的焦深，因此当测量整个区域时，测量结果部分地不在焦点上。 为了补偿这一点，在高数值孔径透镜的后焦平面上布置透镜阵列。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007281456A

公开(公告)日：2007-10-25

申请号：JP2007083242

申请日：2007-03-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WERKMAN ROY ,  MOS EVERHARDUS CORNELIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70633 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To suppress an extreme misalignment caused by insufficient usable information on positioning in a method for positioning a substrate. SOLUTION: The compensation of the misalignment in the substrate is executed before exposure by using a compensation value and a process compensation value calculated based on the positioning offset measured value of a positioning mark present on a substrate and the overlay measured value of an overlay target in the preceding batch. Fluctuations in overlays of the positioning mark are measured on at least one substrate in the preceding batch and overlay fluctuations with weights are all totalled on the positioning mark of at least one substrate in the preceding batch to calculate a process compensation of the substrate, and the process compensation is applied to the positioning of the substrate and the substrate is exposed. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了抑制由于在用于定位基板的方法中的定位的不充分的可用信息引起的极大的未对准。 解决方案：通过使用补偿值和基于存在于基板上的定位标记的定位偏移测量值计算的过程补偿值，在曝光之前执行基板中的未对准的补偿，以及基板的重叠测量值 上一批中的覆盖目标。 定位标记的叠层中的波动在前一批次中的至少一个基板上测量，并且具有重量的重叠波动全部在前一批次中的至少一个基板的定位标记上，以计算基板的工艺补偿，并且 对基板的定位进行过程补偿，并且暴露基板。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007173807A

公开(公告)日：2007-07-05

申请号：JP2006336454

申请日：2006-12-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERSTAPPEN LEONARDUS HENRICUS ,  MOS EVERHARDUS CORNELIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70466 ,  G03F7/70558 ,  G03F7/70625

Abstract: PROBLEM TO BE SOLVED: To solve the problem that widths of a characteristic form printed at two exposure steps differ in double exposure. SOLUTION: This method of manufacturing a device includes a step of printing the characteristic form of a primary set on the target portion of a substrate, a step of measuring the minimum dimension of the characteristic form of the primary set, a step of calculating setting to the print process for the second printing characteristic form set on the target portion in the minimum dimension coincident at a minimum dimension by which the characteristic form of the primary set has been measured, and a step of printing the characteristic form of the second set which is interleaved with the characteristic form of the primary set by using the calculated setting. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了解决在两次曝光步骤中印刷的特征形式的宽度在双重曝光中不同的问题。 解决方案：该制造装置的方法包括在基板的目标部分上印刷初级组的特征形式的步骤，测量初级组的特征形式的最小尺寸的步骤，步骤 计算设置在目标部分上的第二打印特征形式的打印处理的设置，该最小尺寸在已经测量了初级集合的特征形式的最小尺寸上重合，以及打印第二打印特征形式的特征形式的步骤 通过使用计算的设置与主组的特征形式交错。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2012084928A

公开(公告)日：2012-04-26

申请号：JP2012018234

申请日：2012-01-31

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MOS EVERHARDUS CORNELIS ,  FINDERS JOZEF MARIA ,  SCOTT ANDERSON MIDDLEBROOKS ,  WANRI DONJI ,  DE MOL CHRISTIANUS GERARDUS MARIA ,  DUSA MIRCEA

IPC: H01L21/027

CPC classification number: G03B27/42 ,  G03F7/705

Abstract: PROBLEM TO BE SOLVED: To provide a method of optimizing a double patterning method.SOLUTION: Variables in each step in a double patterning lithographic process are recorded, and characteristics of intermediate features in a double patterning process are measured. A final feature is then modeled, and values of the variables are optimized.

Abstract translation: 要解决的问题：提供优化双重图案化方法的方法。

解决方案：记录双重图案化平版印刷工艺中的每个步骤中的变量，并测量双重图案化工艺中的中间特征的特性。 然后对最终特征进行建模，并优化变量的值。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010093250A

公开(公告)日：2010-04-22

申请号：JP2009220520

申请日：2009-09-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CORBEIJ WILHELMUS MARIA ,  DEN BOEF ARIE JEFFREY ,  MOS EVERHARDUS CORNELIS

IPC: H01L21/027 ,  G01B11/00 ,  G01B11/02 ,  G03F7/20

CPC classification number: G03B27/32 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a method and a device for measuring a characteristic of a substrate improved in throughput speed.
SOLUTION: The method and the device are used for measuring the characteristic of the substrate. A target is present on the substrate, and the measurement is executed during scan movement of the substrate. The scan movement of the substrate is linear, and the measurement includes obtaining a reflection image of the target using a pulse light source. The duration of one light pulse is 100 psec. A lithographic device includes such a measurement device, and a method of manufacturing a device includes such a measurement method.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于测量提高生产速度的基板的特性的方法和装置。

解决方案：该方法和装置用于测量基板的特性。 靶材存在于基板上，并且在基板的扫描运动期间执行测量。 衬底的扫描运动是线性的，并且测量包括使用脉冲光源获得目标的反射图像。 一个光脉冲的持续时间为100 psec。 平版印刷装置包括这样的测量装置，并且制造装置的方法包括这种测量方法。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008277754A

公开(公告)日：2008-11-13

申请号：JP2008040760

申请日：2008-02-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MOS EVERHARDUS CORNELIS ,  DEN BOEF ARIE JEFFREY ,  SCHAAR MAURITS VAN DER

IPC: H01L21/027 ,  G03F9/00 ,  H01L21/66

CPC classification number: G03F7/70633

Abstract: PROBLEM TO BE SOLVED: To provide an alternative target in which both an area to be used on a substrate and crosstalk are minimized.
SOLUTION: Each target used in a method of measuring overlay using a scatterometer includes a first portion and a second portion. The first portion has features varying only in a first direction, and the second portion has features varying only in a second direction. The first and second directions are orthogonal to each other, thus eliminating crosstalk between the directions and improving the accuracy of overlay error calculations.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供在基板上使用的面积和串扰最小化的替代目标。 解决方案：使用散射仪测量覆盖层的方法中使用的每个目标包括第一部分和第二部分。 第一部分具有仅在第一方向上变化的特征，并且第二部分具有仅在第二方向上变化的特征。 第一和第二方向彼此正交，从而消除了方向之间的串扰并且提高了重叠误差计算的准确性。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008166734A

公开(公告)日：2008-07-17

申请号：JP2007302404

申请日：2007-11-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MOS EVERHARDUS CORNELIS ,  DEN BOEF ARIE JEFFREY ,  SCHAAR MAURITS VAN DER ,  HOOGENBOOM THOMAS LEO MARIA

IPC: H01L21/027 ,  G01N21/956 ,  H01L21/02

CPC classification number: G03F7/70991 ,  G03F7/70525 ,  G03F7/70533 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7046

Abstract: PROBLEM TO BE SOLVED: To provide a fault detection/classification system without increasing complicatedness in calculation and a calculation time caused thereby, in other words, that uses as many data points as possible without reducing a throughput of substrates in a lithographic device. SOLUTION: An abnormality detection/classification method that checks dispersion in a raw data using a raw back-focal-plane image data of radiation from a substrate surface detected by a scatterometer detector, and associates the variation in the raw data that may possibly occur in the lithographic device or a fault that may possibly occur in a process where the substrate surface is patterned is disclosed. The association is performed by comparing the variation in the raw data with known metrological data. After the fault is checked, a user can receive the information on the fault. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供故障检测/分类系统而不会增加计算的复杂性和由此引起的计算时间，换句话说，尽可能地使用尽可能多的数据点而不降低光刻设备中的基板的通过量 。 解决方案：一种异常检测/分类方法，其使用由散射仪检测器检测的来自基板表面的辐射的原始背焦平面图像数据来检查原始数据中的色散，并且将原始数据的变化与可能 可能发生在光刻设备中或可能在衬底表面被图案化的工艺中可能发生的故障。 通过将原始数据的变化与已知计量数据进行比较来进行关联。 检查故障后，用户可以接收故障信息。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008098634A

公开(公告)日：2008-04-24

申请号：JP2007259342

申请日：2007-10-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN HAREN RICHARD JOHANNES FRA ,  MOS EVERHARDUS CORNELIS

IPC: H01L21/027

CPC classification number: G03F9/7084 ,  G03F9/708 ,  H01L21/3212 ,  H01L23/544 ,  H01L2223/54426 ,  H01L2924/0002 ,  Y10S438/975 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To provide a method for preparing an alignment mark with no flaw, without requiring application of a conventional oxide buff method.
SOLUTION: An oxide layer and a sacrificial layer are processed to constitute a recessed part. The recessed part is filled with a filling material. While the recessed part is being filled, a filling material layer is formed on the sacrificial layer. The filling material layer is removed by chemical-mechanical polishing. While filling the recessed part and removing the filling material layer, the oxide layer is protected by the sacrificial layer. Next, the sacrificial layer is removed by etching. As a result, the oxide layer without flaws which includes protrusions is provided. The oxide layer including the protrusion is covered with a conductive layer, and thereby the protrusions penetrate the oxide layer, and related protrusions are formed. As a result of these related protrusions, the alignment mark is formed.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种无需使用常规氧化物抛光方法制备无缺陷的对准标记的方法。 解决方案：处理氧化物层和牺牲层以构成凹部。 凹陷部分填充有填充材料。 当凹部被填充时，在牺牲层上形成填充材料层。 通过化学机械抛光除去填充材料层。 在填充凹部并去除填充材料层的同时，氧化物层被牺牲层保护。 接下来，通过蚀刻去除牺牲层。 结果，提供了包括突起的没有缺陷的氧化物层。 包括突起的氧化物层被导电层覆盖，从而突起穿过氧化物层，形成相关的突起。 作为这些相关突起的结果，形成对准标记。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007266604A

公开(公告)日：2007-10-11

申请号：JP2007073913

申请日：2007-03-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SCHAAR MAURITS VAN DER ,  DEN BOEF ARIE JEFFREY ,  MOS EVERHARDUS CORNELIS ,  KEIJ STEFAN CAROLUS J A

IPC: H01L21/027 ,  G03F9/00

CPC classification number: G03F7/70633 ,  G03F7/70483

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device capable of measuring a quantitative value of an overlay and a process dependent value. SOLUTION: The lithographic device configured to transfer a pattern from a patterning device onto a substrate includes two reference diffraction gratings 14 provided in the substrate, and two measurement diffraction gratings 12 above the reference diffraction gratings. The measurement diffraction gratings are similar to the reference diffraction gratings and oppositely biased in a single direction relative to the respective reference diffraction gratings. An overlay measurement device having an image sensor is used for obtaining pixel data of a measurement spot in each of the two measurement diffraction gratings. Asymmetry of each pixel in the measurement spot is measured, and from the pixel asymmetry measurements in associated pixels of each of the two measurement diffraction gratings, an overlay value 22 and a process dependent value are determined, as well as the quality indicators of the overlay value and the process dependent value. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供能够测量覆盖物的定量值和过程依赖值的光刻设备。 解决方案：被配置为将图案从图案形成装置转移到衬底上的光刻装置包括设置在衬底中的两个参考衍射光栅14和在参考衍射光栅上方的两个测量衍射光栅12。 测量衍射光栅与参考衍射光栅相似，并且相对于各个参考衍射光栅在单个方向上相对偏置。 使用具有图像传感器的覆盖测量装置来获得两个测量衍射光栅中的每一个中的测量点的像素数据。 测量测量点中每个像素的不对称性，并且根据两个测量衍射光栅中每个测量衍射光栅的相关像素中的像素不对称测量值，确定覆盖值22和过程相关值，以及覆盖层的质量指标 值和过程相关的值。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007258708A

公开(公告)日：2007-10-04

申请号：JP2007064637

申请日：2007-03-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SCHAAR MAURITS VAN DER ,  DEN BOEF ARIE JEFFREY ,  FRANCISCUS VAN HAREN RICHARD J ,  MOS EVERHARDUS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70433 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084

Abstract: PROBLEM TO BE SOLVED: To provide a method capable of carrying out overlay measurement using a target pattern with smaller mounting area.
SOLUTION: In a device manufacturing method and a lithographic apparatus in which a pattern is transferred from a patterning device onto a substrate, a measurement target is provided on the substrate in a process, enabling execution of a substrate measurement by using radiation of a first wavelength. Subsequently, the measurement target is converted into a grid of conducting material, and the grid has grid openings smaller than the first wavelength. Then, the space in the scribe lane, where the measurement target has been provided, is covered and this may be re-used in other layers or processing steps of the substrate.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够使用具有较小安装面积的目标图案进行覆盖测量的方法。 解决方案：在其中将图案从图案形成装置转印到基板上的器件制造方法和光刻设备中，在基板上提供测量对象，使得能够通过使用 第一波长。 随后，将测量对象转换为导电材料格栅，栅格具有小于第一波长的网格开口。 然后，覆盖了已经提供测量对象的划线中的空间，并且可以在衬底的其他层或处理步骤中重新使用。 版权所有（C）2008，JPO＆INPIT