公开(公告)号：JP2008034845A

公开(公告)日：2008-02-14

申请号：JP2007189082

申请日：2007-07-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS J M ,  OTTENS JOOST JEROEN ,  STOELDRAIJER JUDOCUS MARIE DOM ,  DE KORT ANTONIUS J ,  VAN DE MAST FRANCISCUS ,  DE JONG MARTEIJN

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70858 ,  G03F7/70516 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus adapted to compensate for a disturbance of mirror surfaces. SOLUTION: The lithographic apparatus includes a system to compensate for an influence of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus are presented which are implemented using various scan trajectories of the substrate table and measurements of the local positions and rotations of the lateral mirrors in the substrate table. A dual stage lithographic apparatus is provided with alignment marks to definitely establish the geometric configuration of the lateral mirrors, which are used only in the exposure station, so that the geometric configuration of the lateral mirrors can be measured while the substrate table is in the measurement station. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供适于补偿镜面干扰的光刻设备。 光刻设备包括一个系统，用于利用衬底台中的侧视镜补偿衬底台的热变形对衬底台的位置测量的影响。 提出了使用基板台的各种扫描轨迹实现的光刻设备的校准方法，以及衬底台中侧视镜的局部位置和旋转的测量。 双级光刻设备设置有对准标记，以明确地建立仅在曝光站中使用的侧视镜的几何构型，使得可以在衬底台处于测量过程中测量侧视镜的几何构型 站。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008010886A

公开(公告)日：2008-01-17

申请号：JP2007220695

申请日：2007-08-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MIEDEMA JAN REIN ,  OTTENS JOOST JEROEN

IPC: H01L21/027 ,  H01L21/683 ,  G03F7/20

CPC classification number: G03F7/707 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide photo lithographic equipment in which the amount of remaining energy is not harmful for a wafer and/or a wafer holder when the wafer is finally released from the wafer holder, and to provide a method of manufacturing a device. SOLUTION: The wafer is released by adding a releasing force with an unloading pin to the wafer held by the wafer holder. The releasing force is weaken by a controller at just before the final release to lower the energy obtained by the wafer, so that the energy do not damage the wafer and/or the wafer holder during the release. The surplus energy can be absorbed by a protection rim formed surrounding the projection forming a wafer holding plane. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供当晶片最终从晶片保持器释放时剩余能量对晶片和/或晶片保持器无害的照相光刻设备，并提供制造方法 一个装置。 解决方案：通过用卸载销向由晶片保持器保持的晶片添加释放力来释放晶片。 释放力在最后释放之前由控制器削弱，以降低由晶片获得的能量，使得能量在释放期间不会损坏晶片和/或晶片保持器。 剩余能量可以被围绕形成晶片保持平面的突起形成的保护边缘吸收。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007281462A

公开(公告)日：2007-10-25

申请号：JP2007090110

申请日：2007-03-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  ANTONIUS LEENDERS MARTINUS HEN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To vary fluid pressure by accelerating a substrate table and accelerating regulating fluid in a supplying device, in a removing device and/or in the substrate table. SOLUTION: A lithography apparatus comprises the substrate table WT which is formed for holding a substrate W and retains the regulating fluid and a regulation system 100 for regulating the substrate table. The regulation system 100 comprises a pressure damper 104 which is communicated with the regulation system 100 through fluid and controls pressure change of the system 100. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过加速衬底台和加速供给装置中的调节流体，在去除装置和/或衬底台中来改变流体压力。 解决方案：光刻设备包括形成用于保持基板W并保持调节流体的基板台WT和用于调节基板台的调节系统100。 调节系统100包括压力调节器104，其通过流体与调节系统100连通并控制系统100的压力变化。版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006128676A

公开(公告)日：2006-05-18

申请号：JP2005306503

申请日：2005-10-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： NEERHOF HENDRIK ANTONY JOHANNE ,  MOORS JOHANNES HUBERTUS JOSEPH ,  OTTENS JOOST JEROEN ,  LE KLUSE MARCO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/707 ,  G03F7/70708 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device provided with a structure for preventing the deformation of an article supported by an article support.
SOLUTION: The lithographic device includes an illuminating system adapted to provide a radiation beam, the article support adapted to support the article disposed in a beam path of the radiation beam, a multi-electrode clamp adapted to apply a clamping force for clamping the article against the article support, and a bias voltage circuit adapted to bias at least one electrode of the multi-electrode clamp so as to be able to avoid the formation of ridges appearing by electrostatic charge on the article.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种设置有用于防止由物品支撑件支撑的物品变形的结构的光刻设备。 解决方案：光刻设备包括适于提供辐射束的照明系统，所述物品支撑件适于支撑设置在辐射束的光束路径中的物品，多电极夹具适于施加用于夹紧的夹紧力 所述制品抵靠所述物品支撑，以及偏置电压电路，其适于偏置所述多电极夹的至少一个电极，以便能够避免形成由所述物品上的静电电荷出现的脊。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005328045A

公开(公告)日：2005-11-24

申请号：JP2005130909

申请日：2005-04-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  VAN MEER ASCHWIN LODEWIJK HEND ,  OTTENS JOOST JEROEN

IPC: H01L21/683 ,  G03B27/62 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, an article support member and a method of manufacturing the article support member. SOLUTION: The lithographic apparatus comprises a lighting system for offering a projection radiation beam, the article support member for supporting on an article support an article to be arranged on a beam path of the projection radiation beam, and a clamp for offering a clamped pressure for clamping the article to the article support during projection. The article support member is provided with a section which is trimmed for locally adjusting the clamped pressure. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备，物品支撑构件和制造物品支撑构件的方法。 光刻设备包括用于提供投影辐射束的照明系统，用于在物品支撑件上支撑物品以配置在投影辐射束的光束路径上的物品和用于提供投影辐射束的夹具 夹紧压力，用于在投影期间将物品夹持到物品支撑件。 物品支撑构件设置有用于局部调节夹紧压力的部分。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005191569A

公开(公告)日：2005-07-14

申请号：JP2004371045

申请日：2004-12-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  VEN DER SCHOOT HARMEN KLAAS ,  STARREVELD JEROEN P ,  PETRUS MARIA MAAS WOUTERUS J ,  VENEMA WILLEM JURRIANUS ,  MENCHTCHIKOV BORIS

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70616 ,  G03F7/70783 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To correct the heat inducing deformation of a wafer substrate in a lithographic device. SOLUTION: The method comprises a step P204 for exposing one pattern on a plurality of fields on the substrate, in accordance with a predesignated exposure information P204 and steps P206, P208 for measuring the attribute of the fields, to evaluate the deformation of the fields inducted by the heat effect of the exposure processing. The method further comprises a step for determining correction information, based on the measured information and a step P210 for controlling the predesignated exposure information, based on the corrected information to correct the heat inductive field deformation. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：校正光刻设备中的晶片衬底的热诱导变形。 解决方案：该方法包括步骤P204，用于根据预先指定的曝光信息P204和用于测量场的属性的步骤P206，P208，在基板上的多个场上曝光一个图案，以评估变形 通过曝光处理的热效应引入的场。 该方法还包括基于测量信息确定校正信息的步骤，以及基于校正信息来校正热感应场变形的用于控制预定指定的曝光信息的步骤P210。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005183973A

公开(公告)日：2005-07-07

申请号：JP2004363842

申请日：2004-12-16

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  GIESEN PETER THEODORUS M

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68

CPC classification number: H01L21/6831 ,  G03F7/707 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device and a manufacturing method for the device. SOLUTION: The lithographic device has an illumination system providing the projection beams of a radiation and an article supporter for supporting a flat article arranged in the beam path of the projection beams of the radiation on the article supporter. The lithographic device further has an electrostatic clamp for fixing the article while brought into contact with the article supporter and a recessed filled-gas supply arranged in the article supporter for supplying the rear side of the article with a filled gas when the article is supported by the article supporter in an electrostatic field during a projection. According to the device, the recessed filled-gas supply has a shielding layer for shielding a path structure from the electrostatic field. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备及其制造方法。 解决方案：光刻设备具有提供辐射的投影光束和物品支撑件的照明系统，用于支撑布置在物品支撑件上的辐射的投影光束的光束路径中的平坦物品。 平版印刷装置还具有用于固定物品的静电夹具，同时与物品支撑件接触并设置在物品支撑件中的凹入的填充气体供应源，用于当物品被填充气体支撑时向物品的后侧供应填充气体 在投影期间静电场中的物品支撑物。 根据该装置，凹入的填充气体源具有用于屏蔽路径结构与静电场的屏蔽层。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005142570A

公开(公告)日：2005-06-02

申请号：JP2004321463

申请日：2004-11-05

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  DONDERS SJOERD NICOLAAS LAMBER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/708

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can overcome the problem of the conventional lithographic apparatus such as the local bend etc., of an article.
SOLUTION: The lithographic apparatus comprises a lighting system which supplies a projected radiant beam; an article supporting body which supports a flat article disposed in the route of the projected radiant beam, and contains a plurality of supporting projections which demarcate a supporting area forming a flat supporting surface; and a filler gas supplier which improves the thermal conduction between the article and article supporting body by supplying a filler gas to the rear side of the article supported by the article supporting body, and contains a filler gas discharging area formed in the supporting area. The filler gas discharging area substantially surrounds the supporting area.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供可以克服诸如制品的局部弯曲等常规光刻设备的问题的光刻设备。 光刻设备包括提供投射的辐射束的照明系统; 物品支撑体，其支撑设置在所述投影辐射束的路径中的平坦物品，并且包含多个支撑突起，所述支撑突起限定形成平坦支撑表面的支撑区域; 以及填充气体供给器，其通过向由所述物品支撑体支撑的物品的后侧供给填充气体，并且在所述支撑区域中形成有填充气体排出区域，从而改善所述物品与所述物品支撑体的热传导。 填充气体排放区域基本上围绕支撑区域。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005079586A

公开(公告)日：2005-03-24

申请号：JP2004247641

申请日：2004-08-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MIEDEMA JAN REIN ,  ZAAL KOEN JACOBUS JOHANNES MAR

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68

CPC classification number: G03F7/707 ,  G03F7/70825

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; an article support for supporting a flat article to be placed in a beam path of the projection beam of radiation on the article support, comprising a plurality of supporting protrusions defining a protrusion configuration for providing a plane of support; and releasing means for releasing the article from the article support. SOLUTION: The article support comprises at least one protective member located near a boundary of the plurality of protrusions so as to protect at least a boundary portion of the plurality of protrusions during release. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，包括：照明系统，用于提供投影射束; 用于支撑待放置在所述物品支撑件上的所述投影辐射束的光束路径中的平坦物品的物品支撑件，包括限定用于提供支撑平面的突起构造的多个支撑突起; 以及用于将物品从物品支撑件释放的释放装置。 解决方案：物品支撑件包括位于多个突起的边界附近的至少一个保护构件，以便在释放期间至少保护多个突起的边界部分。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005045259A

公开(公告)日：2005-02-17

申请号：JP2004213700

申请日：2004-07-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  OTTENS JOOST JEROEN ,  HOPMAN JAN

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/707 ,  G03F7/70708 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment having a retainer so prepared that a substrate to be processed may be supported at a more uniform height and an electric-field changing structure for leveling the dispersion of the local heights. SOLUTION: The lithography equipment has an irradiation system for supplying a radiation projection beam and a parts retainer containing multiple projections defining a projection structure so arranged that a flat surface of a support to support substantially flat parts to be arranged in the beam path for the radiation projection beam, and this parts retainer contains at least one clamping electrode for generating an electrostatic clamping force so that parts may be clamped to the parts retainer. According to this invention, at least the one clamping electrode has an electric-field alteration structure that alters the electrostatic clamping force locally in order to level off the dispersion of local heights of the substrate. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有如下制备的保持器的光刻设备，使得待加工的基板可以以更均匀的高度被支撑，并且电场改变结构用于调平局部高度的分散。 解决方案：光刻设备具有用于提供辐射投射光束的照射系统和包含多个突起的部件保持器，该多个突出部限定突出结构，使得支撑体的平坦表面支撑基本上平坦的部分以布置在光束路径 对于辐射投影光束，并且该部件保持器包含用于产生静电夹持力的至少一个夹紧电极，使得部件可以夹紧到部件保持器。 根据本发明，至少一个夹持电极具有电场改变结构，其局部改变静电夹紧力，以便平衡基板的局部高度的分散。 版权所有（C）2005，JPO＆NCIPI