公开(公告)号：JP2007288187A

公开(公告)日：2007-11-01

申请号：JP2007099005

申请日：2007-04-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ANTONIUS LEENDERS MARTINUS HEN ,  RIEPEN MICHEL ,  BOS MARTIN A

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion liquid that causes the relative velocity to be maximized, with which a part of a liquid supply apparatus and a substrate can be moved with respect to each other, in an immersion lithography exposure apparatus without collaping meniscus arranged among these components. SOLUTION: In an immersion lithography exposure apparatus for exposing a substrate to radiation beams via an immersion liquid, the pH of the immersion liquid is controlled to within 2 of a pH at which the zeta potential is zero when the immersion liquid is present on the surface of the substrate. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式液体，其使相对速度最大化，液体供应装置和基板的一部分可以相对于彼此移动，在浸没式光刻曝光装置中，没有 在这些组件之间布置弯曲半月板。 解决方案：在浸没式光刻曝光设备中，通过浸没液将衬底暴露于辐射束，浸入液体的pH值控制在浸没液体存在时ζ电位为零时的pH值的2之内 在基板的表面上。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007013150A

公开(公告)日：2007-01-18

申请号：JP2006176023

申请日：2006-06-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GRAAF ROELOF FREDERICK DE ,  LAMBERTUS DONDERS SJOERD NICOL ,  HOOGENDAM CHRISTIAAN A ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LIEBREGTS PAULUS MARTINUS MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD C ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus preventing the existence of bubbles in a liquid through which an emitted projection beam is passed, or taking countermeasures to reduce them.
SOLUTION: This is performed, for example, by ensuring that a gap between a substrate and a substrate table is filled with an immersion liquid, or by inducing a local flow from an optical axis toward a radially outward side in the vicinity of the edge of the substrate.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其防止在发射的投射光束通过的液体中存在气泡，或采取对策来减少它们。 解决方案：例如，这通过确保衬底和衬底台之间的间隙被浸没液体填充，或者通过引起局部从光轴朝向径向向外的侧面 衬底的边缘。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006054468A

公开(公告)日：2006-02-23

申请号：JP2005233909

申请日：2005-08-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing lithographic errors caused by immersion liquid. SOLUTION: A lithography apparatus comprises an illumination system so constituted as to control a radiation beam, a support so constituted as to support a pattern forming device which imparts patterns on a crosssection of the radiation beam to form a patternized radiation beam, a substrate table so constituted as to hold a substrate, a projection system so constituted as to project the patternized radiation beam on the target of the substrate, a liquid supply system so constituted as to fill at least part of a space between a final element of the projection system and the substrate with the liquid, a sealing member so disposed as to substantially enclose the liquid inside the space between the final element of the projection system and the substrate, and an element for controlling and/or compensate evaporation of the immersion liquid from the substrate. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种减少浸没液引起的平版印刷误差的系统。 解决方案：光刻设备包括照明系统，其被构造成控制辐射束，支撑件被构造成支撑图案形成装置，其在辐射束的横截面上施加图案以形成图案化的辐射束， 衬底台，其被构造成保持衬底;投影系统，其被构造成将图案化的辐射束投射到衬底的靶上;液体供应系统，其被构造成填充所述衬底的最终元件之间的至少一部分空间; 投影系统和具有液体的基板，密封构件，其被设置为基本上将液体包围在投影系统的最终元件和基板之间的空间内，以及用于控制和/或补偿浸没液体的蒸发的元件 底物。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2013251580A

公开(公告)日：2013-12-12

申请号：JP2013187139

申请日：2013-09-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ROPS CORNELIUS MARIA ,  KEMPER NICOLAAS R ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of at least reducing possibility of mixing of bubbles.SOLUTION: An immersion lithographic apparatus is disclosed. The immersion lithographic apparatus comprises: a fluid handling system for confining immersion liquid to be within a local space between a final element of a projection system and a substrate and/or a table; and a gas supply device for supplying gas whose solubility in the immersion liquid is higher than 5×10mol/kg, at a total pressure of 1 atm and 20°C into a region that adjoins the space.

Abstract translation: 要解决的问题：提供能够至少降低气泡混合可能性的光刻设备。解决方案：公开了一种浸没式光刻设备。 浸没式光刻设备包括：用于将浸没液体限制在投影系统的最终元件与基板和/或台之间的局部空间内的流体处理系统; 以及用于将在浸液中的溶解度高于5×10mol / kg的气体的气体供给装置，在1atm和20℃的总压力下进入与该空间相邻的区域。

公开(公告)号：JP2012064982A

公开(公告)日：2012-03-29

申请号：JP2011285516

申请日：2011-12-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIANUS GERARDUS MARIA DE MOL ,  MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABETH ,  MARCO COELHO STAUFEN ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MARIA ,  VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  STOYAN NIHTIANOV ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PETER ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors arising from an immersion liquid.SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device capable of imparting a pattern to the radiation beam in its cross section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with a liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 支撑构造以支撑能够在其横截面中将辐射束赋予图案以形成图案化辐射束的图案形成装置; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011176308A

公开(公告)日：2011-09-08

申请号：JP2011025713

申请日：2011-02-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  VAN DER GRAAF SANDRA ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  KANEKO TAKESHI ,  DZIOMKINA NINA VLADIMIROVNA ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS ,  EVANGELISTA FABRIZIO ,  BESSEMS DAVID ,  ROPS CORNELIUS MARIA ,  VERDONCK ADRIANUS MARINUS ,  KATE NICOLAAS TEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure for minimizing or preventing the sealing of bubbles within an immersion solution of an immersion lithographic apparatus. SOLUTION: A fluid handling structure is for a lithographic apparatus. At a boundary from a space configured to include an immersion fluid to a region external to the fluid handling structure, the fluid handling structure successively has an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种流体处理结构，用于使浸没式光刻设备的浸液中的气泡密封最小化或防止。 解决方案：流体处理结构用于光刻设备。 在从被构造为将浸没流体包括在流体处理结构外部的区域的空间的边界处，流体处理结构依次具有提取器，其具有布置在第一线中的至少一个开口，在使用中，至少一个开口指向基板 和/或在使用中面向基底和/或台面的表面上的桌子和液体操纵器，以减少表面上的液滴的聚结机会。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011071545A

公开(公告)日：2011-04-07

申请号：JP2010275375

申请日：2010-12-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus that prevents an adverse effect on pattern image quality due to existence of bubbles in immersion liquid.
SOLUTION: The liquid immersion lithographic exposure apparatus minimizes or prevents generation of bubbles in the immersion liquid by reducing a size or a volume of a gap between an object and the top of a substrate table and/or preparing a cover plate covering the gap. Additionally, an actuator for laterally moving the object in a hole in order to reduce the gap between an edge of the object and a side of the hole of the support table when the object and the table are in contact with the liquid, may be prepared.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种液浸光刻设备，其防止由于浸没液体中的气泡的存在而对图案图像质量的不利影响。 解决方案：液浸式光刻曝光装置通过减小物体与基板台顶部之间的间隙的尺寸或体积，和/或制备覆盖该基板台的盖板来最小化或防止在浸液中产生气泡 间隙。 此外，可以准备用于在物体和台面与液体接触的同时横向移动物体在孔中的致动器，以便减小物体的边缘与支撑台的孔的一侧之间的间隙 。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011003897A

公开(公告)日：2011-01-06

申请号：JP2010134782

申请日：2010-06-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  KEMPER NICOLAAS R ,  DANNY MARIA HUBERTUS PHILIPS ,  RIEPEN MICHEL ,  CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN ,  MAIKEL ADRIANUS CORNELIS SCHEPERS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To reduce or eliminate imaging defects caused by bubbles in an immersion liquid while increasing a table speed.SOLUTION: There is disclosed the immersion lithographic apparatus which includes: a projection system configured to direct a patterned beam of radiation on a substrate supported by a table; a liquid handling system configured to supply and confine the immersion liquid to a space defined between a projection system and the table or a substrate, or both of them; and a controller to control a moving speed of the table relative to liquid handling on the basis of a distance between moving direction switches.

Abstract translation: 要解决的问题：降低或消除浸没液体中由气泡引起的成像缺陷，同时提高台面速度。解决方案：公开了浸没式光刻设备，其包括：投影系统，其配置成将图案化的辐射束引导到基板上 由桌子支持; 液体处理系统，其配置成将浸没液体供应并限制在投影系统与桌子或基板之间或两者之间限定的空间中; 以及控制器，其基于移动方向开关之间的距离来控制工作台相对于液体处理的移动速度。

公开(公告)号：JP2010171455A

公开(公告)日：2010-08-05

申请号：JP2010096638

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To prevent the presence of air bubbles in an immersion liquid to cause an adverse effect on the quality of a pattern image in an immersion lithography apparatus. SOLUTION: In the immersion lithography apparatus, the formation of air bubbles in the immersion liquid can be minimized or prevented by reducing the size of a gap or a gap region between an object and a substrate table and/or providing a cover plate covering the gap. The immersion lithography apparatus may further include an actuator which laterally moves the object in a hole of the support table to reduce a gap between an end of the object and a side of the hole when the object is in contact with a liquid. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了防止浸没液体中的气泡的存在对浸没式光刻设备中的图案图像的质量产生不利影响。 解决方案：在浸没式光刻设备中，通过减小物体和基板台之间的间隙或间隙区域的尺寸和/或提供盖板，可以使浸没液中的气泡形成最小化或防止 弥补差距。 浸没式光刻设备还可以包括致动器，该致动器在物体与液体接触时横向移动物体在支撑台的孔中，以减小物体的端部与孔的一侧之间的间隙。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010050478A

公开(公告)日：2010-03-04

申请号：JP2009243837

申请日：2009-10-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MARTINUS HENDRIKUS ANTONIUS LEENDERS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  VAN DER TOORN JAN-GERARD CORNELIS ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: PROBLEM TO BE SOLVED: To reduce generation of bubbles in an immersion liquid and evaporation of the liquid. SOLUTION: An immersion lithographic apparatus includes a liquid containment structure 12 provided for at least partially defining a space 10 structured to contain a liquid between a projection system PL and a substrate W. A sectional area of the space 10 in a plane parallel to the substrate W is minimized to reduce a traverse of a rim of the substrate W whose image is to be formed (which sometimes brings a content of bubbles in the immersion liquid). The theoretically minimum size is that of a target part TP whose image is to be formed by the projection system PL. In addition, in one embodiment, a shape of a final element of the projection system PL is modified to have a size and/or a shape similar to the target part TP on a cross section parallel to the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：减少浸没液体中气泡的产生和液体的蒸发。 浸没式光刻设备包括液体容纳结构12，其设置用于至少部分地限定被构造成在投影系统PL和衬底W之间容纳液体的空间10.平面中的空间10的截面积平行 使基板W最小化，以减少要形成图像的基板W的边缘（其有时在浸渍液体中引起气泡的含量）的横越。 理论上的最小尺寸是由投影系统PL形成其图像的目标部分TP的尺寸。 此外，在一个实施例中，投影系统PL的最终元件的形状被修改为具有与平行于基板W的横截面上的目标部件TP类似的尺寸和/或形状。版权所有： （C）2010，JPO＆INPIT