公开(公告)号：JP2005150734A

公开(公告)日：2005-06-09

申请号：JP2004328567

申请日：2004-11-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a immersion-type lithography projection apparatus.
SOLUTION: In the immersion-type lithography apparatus, an immersion liquid is confined between a final element of a projection system and a substrate. Both of hydrophobic and hydrophilic layers are used on various elements of the apparatus. The use of them helps to prevent air-bubble formation in the immersion liquid, and reduce residues remained on the elements after immersion in the immersion liquid.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种浸没型光刻投影装置。 解决方案：在浸没式光刻设备中，浸没液体被限制在投影系统的最终元件和基板之间。 疏水层和亲水层都用在装置的各种元件上。 它们的使用有助于防止浸入液体中的气泡形成，并且减少浸入浸液中之后残留在元件上的残留物。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005045265A

公开(公告)日：2005-02-17

申请号：JP2004215042

申请日：2004-07-23

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HENRICUS JANSEN ,  BOOGAARD ARJEN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection equipment with a sensor excellent in durability which is used in the immersion type lithography equipment capable of high resolution treatment by pouring liquid of comparatively high refraction index to fill spacing between the final component of the projection system and the substrate and by sinking the substrate into the immersion liquid. SOLUTION: The lithography projection equipment comprises a liquid feed system configured so that immersion liquid may be provided in spacing between the final component of the projection system and the foregoing substrate, and the sensor attached to a substrate table so that it may be exposed by radiation while it is immersed into the immersion liquid supplied by the liquid feed system. The sensor includes an external surface contacted by the immersion liquid while it is irradiated. The external surface of the sensor is formed by continuous layers of one metal format, while the sensor is formed by single or several metal formats. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种具有耐久性优异的传感器的光刻投影设备，该传感器用于能够通过倾倒具有较高折射率的液体的高分辨率处理的浸渍式光刻设备中填充最终成分之间的间距 投影系统和衬底以及将衬底沉入浸液中。 光刻投影设备包括液体供给系统，该液体供给系统构造成可以在投影系统的最终部件和前述基板之间设置浸没液体，并且将传感器附接到基板台，使其可以是 当它被浸入由液体供给系统供应的浸液中时被辐射暴露。 传感器包括在被照射时与浸没液接触的外表面。 传感器的外表面由一种金属格式的连续层形成，而传感器由单一或多种金属形式形成。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005005707A

公开(公告)日：2005-01-06

申请号：JP2004169275

申请日：2004-06-08

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The highlights of this invention are that the lithography apparatus is equipped with a radiation system Ex to provide the projection beams PB of radiation including a radioactive source LA, a primary object table (mask table) MT connected to a primary positioning means to correctly position a mask against IL and a member PL, a secondary object table (substrate table) WT connected to a secondary positioning means to correctly position a substrate against the member PL, and a projection system PL to form an image of the irradiated part of the mask MA on the target part of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：本发明的亮点在于，光刻设备配备有辐射系统Ex以提供包括放射源LA的辐射投影束PB，连接到主要定位的主要物体台（掩模台）MT 用于将掩模正确地定位在IL和构件PL上的装置，连接到二次定位装置以将衬底正确地定位在构件PL上的第二对象台（衬底台）WT，以及用于形成照射的图像的投影系统PL 在基板W的目标部分上的掩模MA的一部分。版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004289127A

公开(公告)日：2004-10-14

申请号：JP2003417260

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To disclose a lithography projector in which a space between the final element of a projection system and a substrate is filled with liquid. SOLUTION: Hermetic edge sealing members 17 and 117 surround a substrate W on a substrate table WT or another object at least partially thus preventing the catastrophic loss of the liquid when the edge part of the substrate is imaged or illuminated. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：公开一种其中投影系统的最终元件和基板之间的空间被液体填充的光刻投影仪。 解决方案：密封边缘密封构件17和117围绕基板台WT或另一物体上的基板W，至少部分地防止当基板的边缘部分成像或照明时液体的灾难性损失。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2010232697A

公开(公告)日：2010-10-14

申请号：JP2010161717

申请日：2010-07-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOOGAARD ARJEN ,  SENGERS TIMOTHEUS FRANCISCUS ,  MARIA KETELAARS WILHELMUS SEBASTIANUS MARCUS ,  SPEE CAROLUS IDA MARIA ANTONIUS

IPC: H01L21/027

CPC classification number: G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a lithography exposure apparatus for reducing or eliminating adhesion of a pollution substance to various components of the exposure apparatus.
SOLUTION: A coating containing a semiconductor, a photocatalyst, and/or a metal oxide is imparted to at least a part of various components of the lithography exposure apparatus, such as a sensor arranged on a base table of the lithography exposure apparatus.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少或消除污染物质对曝光装置的各种部件的粘附的光刻曝光装置。 解决方案：将包含半导体，光催化剂和/或金属氧化物的涂层赋予光刻曝光设备的各种组分的至少一部分，例如布置在光刻曝光设备的基台上的传感器 。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010183112A

公开(公告)日：2010-08-19

申请号：JP2010116463

申请日：2010-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is sealed between a final element of a projection system and a substrate. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the liquid.
COPYRIGHT: (C)2010,JPO&INPIT

公开(公告)号：JP2010161421A

公开(公告)日：2010-07-22

申请号：JP2010097301

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008135742A

公开(公告)日：2008-06-12

申请号：JP2007300017

申请日：2007-11-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STOELDRAIJER JUDOCUS MARIE DOM ,  LOOPSTRA ERIK R ,  MULDER HEINE MELLE ,  SENGERS TIMOTHEUS FRANCISCUS ,  STOFFELS FREERK ADRIAAN ,  JORRITSMA LAURENTIUS CATRINUS ,  JUNGBLUT REINER MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70108 ,  G03F7/70216

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, capable of reducing an uneven heating effects on an element of a projection system, when using, for example, a local illumination mode, or to provide a method improved for reducing the uneven heating effects. SOLUTION: In the lithographic apparatus, a corrective irradiation step is performed by using an illumination mode arranged so as to heat a selected part on which a large amount of heat is not applied during the production exposure of the element of the projection system close to the pupil plane of the lithographic apparatus. The corrective irradiation step is performed to improve uniformity of optical component heating of the projection system and/or reduce the phase gradient. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其能够减少对投影系统的元件的不均匀的加热效应，当使用例如局部照明模式时，或提供改进以减少不均匀的方法 加热效果。 解决方案：在光刻设备中，通过使用照射模式来执行校正照射步骤，所述照射模式被布置为在投影系统的元件的生产曝光期间加热不施加大量热量的选定部分 靠近光刻设备的光瞳平面。 执行校正照射步骤以改善投影系统的光学部件加热的均匀性和/或降低相位梯度。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2005079587A

公开(公告)日：2005-03-24

申请号：JP2004247643

申请日：2004-08-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VEN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  VAN WEERT KEES

IPC: G01B15/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70775 ,  G03F7/70058 ,  G03F7/70191 ,  G03F7/70341 ,  G03F7/7055 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a sensor at a substrate height which is suitable for using with a high NA equipment, and has high sensitivity. SOLUTION: A lithographic apparatus comprises: an illumination system configured to condition a radiation beam; a support constructed to support the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and the sensor at substrate level comprising a radiation-receiving element, a transmissive plate supporting said radiation-receiving element, and a radiation-detecting means. In the apparatus, the sensor at a substrate level is arranged to avoid a loss of radiation between said radiation-receiving element and the final element of said radiation-detecting means. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供适合于使用高NA设备并且具有高灵敏度的基板高度的传感器。 解决方案：光刻设备包括：照明系统，被配置为调节辐射束; 构造成支撑图案形成装置的支撑件能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 并且在基底层处的传感器包括辐射接收元件，支撑所述辐射接收元件的透射板和辐射检测装置。 在该装置中，布置基板级的传感器以避免所述辐射接收元件与所述辐射检测装置的最终元件之间的辐射损失。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004289128A

公开(公告)日：2004-10-14

申请号：JP2003417261

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： ANTONIUS THEODORUS ANNA MARIA ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  LOF JOERI ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/707 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. SOLUTION: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to take the place of the substrate in containing the liquid in the liquid supply system during substrate exchange. COPYRIGHT: (C)2005,JPO&NCIPI