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    Lithography equipment and process for fabricating device
    21.
    发明专利
    Lithography equipment and process for fabricating device 有权
    雕刻设备和制作装置的过程

    公开(公告)号：JP2006313910A

    公开(公告)日：2006-11-16

    申请号：JP2006128497

    申请日：2006-05-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  RIEPEN MICHEL

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment suitable for preventing or reducing generation of bubbles by preventing bubbles from leaking to a radiation beam passage through one or more gaps in a substrate table, or by extracting bubbles possibly generated in the gap. SOLUTION: The lithography equipment is arranged to project an image of desired pattern onto a substrate W held on a substrate table WT through liquid. A gap 22 exists in the surface of the substrate table between the substrate table and the outer edge of the substrate, or between the substrate table and other component touching the liquid during normal use. The lithography equipment is provided, in the gap, with a bubble holding device arranged to hold a bubble 24 possibly generated in the gap. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：通过防止气泡通过衬底台中的一个或多个间隙而泄漏到辐射束通道中，或通过提取可能在间隙中产生的气泡来提供适于防止或减少气泡产生的浸没式光刻设备 。 解决方案：光刻设备被布置成通过液体将所需图案的图像投影到保持在基板台WT上的基板W上。 在衬底台与衬底的外边缘之间，或在正常使用过程中，在衬底台和其他部件接触液体之间，衬底台表面上存在间隙22。 光刻设备在间隙中设置有气泡保持装置，其被布置成保持可能在间隙中产生的气泡24。 版权所有（C）2007，JPO＆INPIT

    Lithographic device
    22.
    发明专利
    Lithographic device 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2006041520A

    公开(公告)日：2006-02-09

    申请号：JP2005210785

    申请日：2005-07-21

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  STREEFKERK BOB

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/707 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a substrate releasing mechanism used in an immersion-type lithographic device that is configured to be isolated from a substrate table by dislocating a substrate after a step including the immersing while holding the substrate on the substrate table. SOLUTION: In the immersion-type lithographic device that immerses the surface of the substrate in a liquid during an exposure operation, the substrate is held with the same contacted with the substrate table. After the exposure operation is over, the substrate is lifted and isolated from the substrate table. To overcome a condition that the substrate tends to be affixed to the substrate table with the film of a residual liquid, a pin for lifting the substrate is disposed so as to apply a force to the substrate at a position that is offset from a central axis at least first and is actuated. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备中使用的基板释放机构，其被配置为在将基板保持在基板台上之后，在包括浸渍的步骤之后使基板脱离基板而与基板台隔离 。 解决方案：在曝光操作期间，将基板表面浸入液体的浸没式光刻设备中，将基板保持与基板台相同的基板。 曝光操作结束后，将衬底从衬底台上提起并隔离。 为了克服基板倾向于用残留液体的膜固定到基板台的条件，设置用于提升基板的销，以便在偏离中心轴线的位置处向基板施加力 至少首先被致动。 版权所有（C）2006，JPO＆NCIPI

    Lithographic apparatus and device manufacturing method
    25.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2005051231A

    公开(公告)日：2005-02-24

    申请号：JP2004207959

    申请日：2004-07-15

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

    Abstract: PROBLEM TO BE SOLVED: To reduce the distortion of an image due to the temperature gradient of a substrate and an immersion liquid, in a liquid immersed projection exposure apparatus.
    SOLUTION: In an immersed lithographic apparatus including a temperature control unit for adjusting the temperature of a member in the final state of a projection exposure apparatus PL, a substrate, and an immersion liquid to a common target temperature T4, the temperature gradient is reduced, by adjusting the total temperature of these constituent components. By doing so, the matching properties of image formation and the total performance are improved. The means to be used includes a control of the flow rate of the immersion liquid and the temperature by a feedback circuit.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：在液浸式投影曝光装置中，为了减少由于基板和浸没液体的温度梯度引起的图像的变形。 解决方案：在包括用于将投影曝光装置PL，基板和浸入液体的最终状态下的部件的温度调节到共同目标温度T4的温度控制单元的浸没式光刻设备中，温度梯度 通过调节这些构成成分的总温度来减少。 通过这样做，提高了图像形成的匹配性能和总性能。 要使用的手段包括通过反馈电路控制浸液的流量和温度。 版权所有（C）2005，JPO＆NCIPI

    Lithographic apparatus, and device manufacturing method
    28.
    发明专利
    Lithographic apparatus, and device manufacturing method 有权
    LITHOGRAPHIC设备和设备制造方法

    公开(公告)号：JP2011018915A

    公开(公告)日：2011-01-27

    申请号：JP2010187099

    申请日：2010-08-24

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70425

    Abstract: PROBLEM TO BE SOLVED: To reduce defects caused by using an immersion liquid in an immersion liquid lithographic apparatus.SOLUTION: The lithographic apparatus includes: a support configured to support a patterning device, where the patterning device can impart a radiation beam with a pattern in its cross-section, to form a patterned radiation beam; a substrate table configured to hold a substrate; a liquid supply system configured to provide a liquid to a local area of a top surface of a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate through the liquid. The lithographic apparatus is configured to coordinate movement of the substrate table and the support during imaging of a line of dies across the substrate and this is accomplished by movement of the line of dies under the projection system backwards and/or forwards only in a direction substantially parallel to a first direction, where the first direction is in a plane substantially parallel to the top surface.

    Abstract translation: 要解决的问题：减少在浸没液体光刻设备中使用浸没液体引起的缺陷。解决方案：光刻设备包括：支撑构造成支撑图案形成装置的支撑件，其中图案形成装置可以将辐射束赋予图案 其横截面，以形成图案化的辐射束; 被配置为保持基板的基板台; 液体供应系统，被配置为向衬底的顶表面的局部区域提供液体; 以及投影系统，被配置为通过液体将图案化的辐射束投影到基板的目标部分上。 光刻设备被配置为在跨越衬底的一行模具成像期间协调衬底台和支撑件的移动，并且这通过在投影系统下方的模具线在大致方向上向后和/或向前移动来实现 平行于第一方向，其中第一方向在基本上平行于顶表面的平面中。

    Sensor shield
    30.
    发明专利
    Sensor shield 审中-公开
    传感器屏蔽

    公开(公告)号：JP2009283987A

    公开(公告)日：2009-12-03

    申请号：JP2009204590

    申请日：2009-09-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BASELMANS JOHANNES JACOBUS MAT ,  LAMBERTUS DONDERS SJOERD NICOL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MERTENS JEROEN JOHANNES SOPHIA ,  HUBERTUS MULKENS JOHANNES C ,  STREEFKERK BOB

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70808

    Abstract: PROBLEM TO BE SOLVED: To take countermeasures against a bad influence of a liquid in an immersion lithographic apparatus. SOLUTION: The lithographic apparatus includes a supporting structure MT for supporting a pattern providing device MA. The pattern providing device provides a pattern to a radiation beam PB in accordance with a desired pattern. The lithographic apparatus further includes a substrate table WT for supporting a substrate; a projection system PL for projecting a pattern-provided beam to a target portion of the substrate W; a measurement system for measuring a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system or (d) a combination of any of (a)-(c); and a liquid supplying system for supplying a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield arranged near one part of the measurement system, and shielding the part of the measurement system from the liquid. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：采取对抗浸没式光刻设备中液体的不良影响的对策。 解决方案：光刻设备包括用于支撑图案提供装置MA的支撑结构MT。 图案提供装置根据期望的图案向辐射束PB提供图案。 光刻设备还包括用于支撑衬底的衬底台WT; 用于将图案提供的光束投影到基板W的目标部分的投影系统PL; 用于测量（a）衬底台的参数的测量系统，或（b）衬底，或（c）由投影系统投影的图像，或（d）（a） - （c）中任何一个的组合; 以及用于将液体供应到基板和投影系统之间的空间的液体供应系统。 光刻设备还包括靠近测量系统的一部分附近的屏蔽，并且将测量系统的一部分与液体隔离。 版权所有（C）2010，JPO＆INPIT

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