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    Lithographic apparatus and device manufacturing method utilizing continuous light beam in combination with pixel grid drawing
    24.
    发明专利
    Lithographic apparatus and device manufacturing method utilizing continuous light beam in combination with pixel grid drawing 有权
    连续光束使用像素网格绘图的平面设备和设备制造方法

    公开(公告)号：JP2010118683A

    公开(公告)日：2010-05-27

    申请号：JP2010017243

    申请日：2010-01-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  DE JAGER PIETER WILLIEM HERMAN

    IPC: H01L21/027

    CPC classification number: G03F7/70358 ,  G03F7/70275 ,  G03F7/70291

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method utilizing a continuous light beam in combination with pixel grid imaging.
    SOLUTION: A continuous source of radiation such as a lamp, for example, is used in conjugation with pixel grid imaging. In one embodiment, an individually-controllable element is operated at a frequency of at least about 50 kHz. To compensate for the distortion of an exposed spot, a point spread function is adjusted to be shorter in a scanning direction.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种与像素网格成像相结合的利用连续光束的光刻设备和设备制造方法。 解决方案：连续的辐射源（例如灯）例如用于与像素网格成像共轭。 在一个实施例中，独立可控元件以至少约50kHz的频率工作。 为了补偿曝光光斑的畸变，点扩散函数被调整为在扫描方向上更短。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    25.
    发明专利
    Lithographic apparatus and device manufacturing method 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009094529A

    公开(公告)日：2009-04-30

    申请号：JP2008298704

    申请日：2008-11-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JANSEN HANS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN DER TOORN JAN-GERARD CORNE

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and a method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. SOLUTION: To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种当封闭表面用于将液体限制在液体供应系统中时减少光刻设备中浸没液体的污染的装置和方法。 解决方案：为了避免或减少由与液体供应系统碰撞的关闭表面引起的颗粒污染，闭合表面保持与液体供应系统相距一定距离，使得闭合表面和液体之间没有碰撞 供应系统，但液体仍然受到限制。 版权所有（C）2009，JPO＆INPIT

    Uniform background radiation of maskless lithography
    26.
    发明专利
    Uniform background radiation of maskless lithography 有权
    统一的背景辐射

    公开(公告)号：JP2008235909A

    公开(公告)日：2008-10-02

    申请号：JP2008073319

    申请日：2008-03-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DESMEDT PAUL ANTOON CYRIEL ,  TINNEMANS PATRICIUS ALOYSIUS J ,  CUPERUS MINNE ,  GOSSE CHARLES DE BURIISU

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70475 ,  G03F7/70283 ,  G03F7/70291

    Abstract: PROBLEM TO BE SOLVED: To solve at least one of problems which are caused at a joint portion of patterns formed by using an array of a large number of individually controllable elements, or to substantially solve the one of the problems. SOLUTION: A device manufacturing method includes a process that a pattern is given to an array of a plurality of individually controllable elements so as to modulate a radiation beam, and the modulated radiation beam is projected to a substrate. The patterns given to the plurality of individually controllable elements are set so that the modulated radiation beam includes the background radiation of a predetermined magnitude. The predetermined magnitude of the background radiation depends on a position of the array of the individually controllable elements. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：为了解决在通过使用大量可单独控制的元件的阵列形成的图案的联合部分引起的问题中的至少一个，或者基本上解决了一个问题。 解决方案：一种器件制造方法包括将图案赋予多个独立可控元件的阵列以便调制辐射束的过程，并且调制的辐射束投射到衬底。 设置给多个独立可控元件的图案被设置成使得调制的辐射束包括预定大小的背景辐射。 背景辐射的预定幅度取决于单独可控元件阵列的位置。 版权所有（C）2009，JPO＆INPIT

    Control system of pattern generator in maskless lithography
    28.
    发明专利
    Control system of pattern generator in maskless lithography 审中-公开
    图案发生器的控制系统在MASKLESS LITHOGRAPHY

    公开(公告)号：JP2008047875A

    公开(公告)日：2008-02-28

    申请号：JP2007171553

    申请日：2007-06-29

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： TINNEMANS PATRICIUS ALOYSIUS J

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70291

    Abstract: PROBLEM TO BE SOLVED: To provide a calculating method for controlling an individually controllable element array in a maskless lithography. SOLUTION: A lithographic apparatus is provided with: an illumination optical system IL; an individually controllable element array PD; a projection system PS; and a control system CS. The illumination optical system is configured so as to adjust a radiation beam B. The individual controllable element array modulates the cross section of the radiation beam. The projection optical system is configured so as to project the modulated radiation beam onto a target of a substrate. The control system is disposed so as to transmit a control signal for controlling the individually controllable element array, so that a desired pattern is projected onto the substrate. The control system calculates the control signal using a band limit base function or a combination of a plurality of band limit base functions. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于在无掩模光刻中控制独立可控元件阵列的计算方法。 光刻设备具有：照明光学系统IL; 单独可控元件阵列PD; 投影系统PS; 和控制系统CS。 照明光学系统被配置为调节辐射束B.单独的可控元件阵列调制辐射束的横截面。 投影光学系统被配置为将调制的辐射束投影到基板的目标上。 控制系统设置成传送用于控制单独可控元件阵列的控制信号，使得期望的图案投影到基板上。 控制系统使用频带限制基础功能或多个频带限制基本功能的组合来计算控制信号。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus and device manufacturing method utilizing data filtering
    30.
    发明专利
    Lithographic apparatus and device manufacturing method utilizing data filtering 有权
    利用数据过滤的平面设备和设备制造方法

    公开(公告)号：JP2006285243A

    公开(公告)日：2006-10-19

    申请号：JP2006089853

    申请日：2006-03-29

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BASELMANS JOHANNES JACOBUS MAT

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and method for efficiently implementing maskless lithography. SOLUTION: The apparatus and method comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning device modulates the sub-beams of radiation to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种有效地实现无掩模光刻的装置和方法。 解决方案：该装置和方法包括投影系统，图案形成装置，低通滤波器和数据操作装置。 投影系统将辐射束投射到基板上作为辐射子束阵列。 图案形成装置调制辐射的子光束以在衬底上基本上产生所要求的剂量图案。 低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。 数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。 版权所有（C）2007，JPO＆INPIT

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