中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

49 records (took 0.038 seconds)

    Lithographic device and manufacturing method of device
    21.
    发明专利
    Lithographic device and manufacturing method of device 有权
    装置的制造装置和制造方法

    公开(公告)号：JP2005294834A

    公开(公告)日：2005-10-20

    申请号：JP2005098186

    申请日：2005-03-30

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  BEEMS MARCEL HENDRIKUS MARIA ,  LEENDERS MARTINUS HENDRIKUS AN

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70575 ,  G03F7/7005

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device and a manufacturing method of the device.
    SOLUTION: The lithographic device includes a radiation source designed to provide an illuminating system with the radiation, and is provided with the radiation source designed to provide a radiation in a first wavelength range, and a radiation in a second wavelength range different from the first wavelength range. A support is configured to support a patternizing device designed to impart a pattern onto the cross-section of the radiation. A substrate table is designed to hold the substrate, a projection system is designed to project the patternized radiation on the targeted portions of the substrate. The first wavelength range is a primary wavelength of the lithographic device. The second wavelength range can be used for setting up the lithographic device. The set-up includes one or a plurality out of calibration, approval, performance test and alignment. In addition, the other substrates can be also exposed by using the second wavelength range.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻设备和该设备的制造方法。 解决方案：光刻设备包括被设计成为照明系统提供辐射的辐射源，并且设置有被设计成提供第一波长范围内的辐射的辐射源和与第一波长范围不同的第二波长范围内的辐射 第一波长范围。 支撑构造成支撑设计成将图案赋予辐射横截面的图案化装置。 基板台被设计成保持基板，投影系统设计成将图案化的辐射投射到基板的目标部分上。 第一波长范围是光刻设备的主要波长。 第二波长范围可用于设置光刻设备。 该设置包括一个或多个校准，批准，性能测试和对齐。 此外，其他基板也可以通过使用第二波长范围曝光。 版权所有（C）2006，JPO＆NCIPI

    Lithography equipment, method of manufacturing device, and measuring device
    22.
    发明专利
    Lithography equipment, method of manufacturing device, and measuring device 有权
    光刻设备，制造装置的方法和测量装置

    公开(公告)号：JP2005229091A

    公开(公告)日：2005-08-25

    申请号：JP2004306279

    申请日：2004-10-21

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： BEEMS MARCEL HENDRIKUS MARIA ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/00 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography equipment, comprising measuring means for measuring the displacement of a direction which is orthogonal to the scanning direction in the mask stage or the wafer stage of a scanning-type exposure device. SOLUTION: A beam emitted from a beam source 17, fixed to a frame 15 is divided into two beams by a reflecting slit 26 fixed to a stage. Further, the beams are transmitted through transmission type second slits 18 and 19, third slits 24 and 25, and 1/4 wavelength plates 22 and 23. Then the beams are made into a single beam by the reflecting slit 26. The beam is made to be incident into a sensor. The sensor senses variation in the strength of the interference of the beam and measures the variational amount for the stage. COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻设备，包括测量装置，用于测量扫描型曝光装置的掩模台或晶片台中与扫描方向正交的方向的位移。 解决方案：固定在框架15上的从光束源17发射的光束被固定在舞台上的反射狭缝26分成两束。 此外，光束通过透射型第二狭缝18和19，第三狭缝24和25以及1/4波长板22和23透射。然后通过反射狭缝26将光束制成单个光束。将光束制成 被传入一个传感器。 传感器感测梁的干涉强度的变化，并测量舞台的变化量。 版权所有（C）2005，JPO＆NCIPI

    Stage system calibration method, stage system and lithographic apparatus with such stage system
    25.
    发明专利
    Stage system calibration method, stage system and lithographic apparatus with such stage system 有权
    阶段系统校准方法，阶段系统和具有这种系统的平面设备

    公开(公告)号：JP2009271062A

    公开(公告)日：2009-11-19

    申请号：JP2009095375

    申请日：2009-04-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/00 ,  G01D5/36 ,  H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70775 ,  G03F7/70516

    Abstract: PROBLEM TO BE SOLVED: To achieve accurate calibration of encoder stage position measurement. SOLUTION: In a calibration method to calibrate an encoder position measurement system of a stage, the encoder position measurement system includes an encoder grid and at least two sensor heads cooperating with the encoder grid, each sensor head providing a sensor head output signal showing position sensitivity in a horizontal and a vertical direction, and the method includes: (a) moving the stage such that the sensor heads are moved with respect to the encoder grid, or vice versa; (b) during the moving, measuring the position of the stage with respect to the encoder grid by the two sensor heads; (c) determining a vertical position data map from the sensor head output signals of the two sensor heads; (d) calculating a horizontal position data map from the vertical position data map; and (e) calibrating the encoder position measurement system by using the calculated horizontal position data map. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：实现编码器级位置测量的精确校准。 解决方案：在用于校准级的编码器位置测量系统的校准方法中，编码器位置测量系统包括编码器网格和与编码器网格协作的至少两个传感器头，每个传感器头提供传感器头部输出信号 显示在水平和垂直方向上的位置灵敏度，并且该方法包括：（a）移动台，使得传感器头相对于编码器网格移动，反之亦然; （b）在移动期间，通过两个传感器头测量相对于编码器网格的平台位置; （c）从所述两个传感器头的所述传感器头输出信号确定垂直位置数据图; （d）从垂直位置数据图计算水平位置数据图; 和（e）使用计算出的水平位置数据图校准编码器位置测量系统。 版权所有（C）2010，JPO＆INPIT

    Control system, lithographic projection apparatus, method of controlling support structure, and computer program product
    27.
    发明专利
    Control system, lithographic projection apparatus, method of controlling support structure, and computer program product 有权
    控制系统，平面投影设备，控制支持结构的方法和计算机程序产品

    公开(公告)号：JP2009016820A

    公开(公告)日：2009-01-22

    申请号：JP2008162270

    申请日：2008-06-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK R ,  VAN DER PASCH ENGELBERTUS ANTO ,  VAN DER WIJST MARC WILHELMUS M ,  EUSSEN EMIEL JOZEF MELANIE ,  KOENEN WILLEM HERMAN GERTRUDA

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/709 ,  G03F7/70775 ,  G03F7/70858 ,  G03F9/7096

    Abstract: PROBLEM TO BE SOLVED: To provide a control system for controlling a support structure in a lithographic apparatus. SOLUTION: The control system includes a first measurement system for measuring the position of a substrate supported by the support structure, the position being measured in a first coordinate system. The control system further includes a second measurement system for measuring the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. The control system further comprises a controller configured to control the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure in a manner dependent upon the position error signal. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于控制光刻设备中的支撑结构的控制系统。 解决方案：控制系统包括用于测量由支撑结构支撑的基板的位置的第一测量系统，该位置在第一坐标系中被测量。 所述控制系统还包括用于在第二坐标系中测量所述支撑结构的位置的第二测量系统，所述第一测量系统在所述第二坐标系中具有推测位置。 所述控制系统还包括控制器，所述控制器被配置为基于所述第二测量系统的测量来控制所述支撑结构的位置，以将所述基板的测量位置转换成所述支撑结构在所述第二坐标系中的转换位置， 基于转换位置的支撑结构，接收表示第二坐标系中的第一测量系统的推测位置和实际位置之间的差异的位置误差信号，并且以取决于位置的方式定位支撑结构 误差信号。 版权所有（C）2009，JPO＆INPIT

    Method for manufacturing lithographic apparatus and device and measuring device
    28.
    发明专利
    Method for manufacturing lithographic apparatus and device and measuring device 有权
    制造光刻装置和装置及测量装置的方法

    公开(公告)号：JP2008182249A

    公开(公告)日：2008-08-07

    申请号：JP2008022474

    申请日：2008-02-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BEEMS MARCEL HENDRIKUS MARIA ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/00 ,  H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide lithographic apparatus including a measuring means that measures displacements of a direction which intersects with a scanning direction in a mask stage or wafer stage of a scanning aligner. SOLUTION: A beam irradiated from a beam source 17 fixed to a frame 15 is divided into two beams by a reflective grid 26 fixed to a stage. Further, after each beam penetrates penetration type-second grids 18, 19, third grids 24, 25, and 1/4 wavelength plates 22, 23, the beams are converged at the grid 26 to allow the converged beam to be incident on a sensor. The sensor senses variation in strength with interference of the beam to measure varied amounts of the stage. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种光刻设备，包括测量装置，该测量装置测量在扫描对准器的掩模台或晶片台中与扫描方向相交的方向的位移。 解决方案：从固定到框架15的光束源17照射的光束被固定在平台上的反射栅26分成两束。 此外，在每个光束穿透穿透型 - 第二栅极18,19，第三栅极24,25和1/4波长板22,23之后，光束会聚在栅格26处，以使会聚光束入射到传感器 。 传感器通过光束的干涉来感测强度的变化，以测量舞台的不同量。 版权所有（C）2008，JPO＆INPIT

    Displacement measuring system, lithographic apparatus, and device manufacturing method
    29.
    发明专利
    Displacement measuring system, lithographic apparatus, and device manufacturing method 有权
    位移测量系统，平面设备和设备制造方法

    公开(公告)号：JP2007292735A

    公开(公告)日：2007-11-08

    申请号：JP2007064291

    申请日：2007-03-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KLAVER RENATUS GERARDUS ,  LOOPSTRA ERIK R ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/00 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G01D5/38 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide an improved precision measuring system hardly causing error, without requiring excessive space. SOLUTION: This system is designed so that a 1st radiant beam input in the measuring system is partitioned into a primary diffraction beam and negative primary diffraction beam by 1st grating, the primary diffraction beam and negative primary diffraction beam are further diffracted by 2nd grating, and then recombined to form a 2nd radiant beam. Additionally, this measuring system determines relative displacement of both the 1st and 2nd gratings based on determination of phase difference between the 1st component of 2nd beam derived from the primary diffraction radiant beam and the 2nd component of 2nd beam derived from the negative primary diffraction radiant beam. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供几乎不引起误差的改进的精密测量系统，而不需要太多的空间。 解决方案：该系统设计使得测量系统中的第一个辐射束输入通过第一个光栅分为初级衍射光束和负一次衍射光束，主衍射光束和负一次衍射光束进一步被第二次衍射 光栅，然后重组以形成第二辐射束。 另外，该测量系统基于从主衍射辐射束得到的第二光束的第一分量与从负的主衍射辐射束得到的第二光束的第二分量之间的相位差的确定来确定第一和第二光栅的相对位移 。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    30.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2007266581A

    公开(公告)日：2007-10-11

    申请号：JP2007027473

    申请日：2007-02-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  EUSSEN EMIEL JOZEF MELANIE

    IPC: H01L21/027 ,  G01B21/00 ,  G01B21/22 ,  G03F7/20

    CPC classification number: G03F7/70775 ,  G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To provide a high-accuracy displacement measuring system of a lithographic apparatus. SOLUTION: A lithographic apparatus comprises: an illumination system IL formed to adjust a radiation beam (B); and a mask supporting structure (MT) formed to support a patterning device (MA) and connected with a first positioning device (PM) that is formed to accurately position the patterning device according to a specific parameter. The lithographic apparatus also comprises a substrate table (e.g. a wafer table) (WT) that is formed to hold a substrate (W) and connected with a second positioning device (PW) formed to accurately position the substrate according to the specific parameter. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供光刻设备的高精度位移测量系统。 解决方案：光刻设备包括：形成以调节辐射束（B）的照明系统IL; 以及形成为支撑图案形成装置（MA）并与第一定位装置（PM）连接的掩模支撑结构（MT），所述第一定位装置形成为根据特定参数精确地定位图案形成装置。 光刻设备还包括形成为保持基板（W）并与形成为根据特定参数准确地定位基板的第二定位装置（PW）连接的基板台（例如晶片台）（WT）。 版权所有（C）2008，JPO＆INPIT

Patent Agency Ranking