21.
    发明专利
    未知

    公开(公告)号:IT1280841B1

    公开(公告)日:1998-02-11

    申请号:ITTO950259

    申请日:1995-04-05

    Inventor: TALLONE LUIGI

    Abstract: A light beam is sent on a wafer (4), at different angles of incidence, thus giving rise to fluctuations in the transmittance of the wafer, as the angle of incidence varies, because of interference due to multiple reflections of the beam inside the wafer (4). The transmittance of the wafer (4) is measured as the angle of incidence varies; the angular positions of transmittance maxima and minima are determined with respect to a maximum or minimum corresponding to normal incidence, and the refractive index is obtained from these positions and from the number of maxima and minima in the different angles. The device performing the method is also provided.

    22.
    发明专利
    未知

    公开(公告)号:DE736766T1

    公开(公告)日:1997-04-03

    申请号:DE96105471

    申请日:1996-04-04

    Inventor: TALLONE LUIGI

    Abstract: A light beam is sent on a wafer (4), at different angles of incidence, thus giving rise to fluctuations in the transmittance of the wafer, as the angle of incidence varies, because of interference due to multiple reflections of the beam inside the wafer (4). The transmittance of the wafer (4) is measured as the angle of incidence varies; the angular positions of transmittance maxima and minima are determined with respect to a maximum or minimum corresponding to normal incidence, and the refractive index is obtained from these positions and from the number of maxima and minima in the different angles. The device performing the method is also provided.

    23.
    发明专利
    未知

    公开(公告)号:DE69201917T2

    公开(公告)日:1995-09-07

    申请号:DE69201917

    申请日:1992-06-26

    Abstract: The radiation to be analysed is sent onto an interference filter (6) which selects different portions of the radiation spectrum in correspondence with different incidence angles. The intensity values of the radiation outgoing from the element (6) are stored by a measuring and data processing unit (9) which processes such values with the transfer function of the element to obtain the information on the spectrum.

    HIGH RESOLUTION SPECTROSCOPY SYSTEM

    公开(公告)号:CA2070330C

    公开(公告)日:1996-02-13

    申请号:CA2070330

    申请日:1992-06-03

    Abstract: A spectroscopy system based on the use of interference filters is provided, which allows high resolution and high sensitivity to be achieved without specific filter band requirements and without movement of the filter in order to scan wavelengths of interest. The radiation to be analyzed is applied to an interference filter which selects different portions of the radiation spectrum in correspondence with different incidence angles. The intensity values of radiation leaving the filter are stored by a measuring and data processing unit which processes such values using the transfer function of the filter to obtain data as to the spectrum.

    29.
    发明专利
    未知

    公开(公告)号:DE69201917D1

    公开(公告)日:1995-05-11

    申请号:DE69201917

    申请日:1992-06-26

    Abstract: The radiation to be analysed is sent onto an interference filter (6) which selects different portions of the radiation spectrum in correspondence with different incidence angles. The intensity values of the radiation outgoing from the element (6) are stored by a measuring and data processing unit (9) which processes such values with the transfer function of the element to obtain the information on the spectrum.

    30.
    发明专利
    未知

    公开(公告)号:ITTO950259D0

    公开(公告)日:1995-04-05

    申请号:ITTO950259

    申请日:1995-04-05

    Inventor: TALLONE LUIGI

    Abstract: A light beam is sent on a wafer (4), at different angles of incidence, thus giving rise to fluctuations in the transmittance of the wafer, as the angle of incidence varies, because of interference due to multiple reflections of the beam inside the wafer (4). The transmittance of the wafer (4) is measured as the angle of incidence varies; the angular positions of transmittance maxima and minima are determined with respect to a maximum or minimum corresponding to normal incidence, and the refractive index is obtained from these positions and from the number of maxima and minima in the different angles. The device performing the method is also provided.

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