公开(公告)号：JP2011118335A

公开(公告)日：2011-06-16

申请号：JP2010076454

申请日：2010-03-29

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YOSHITOME MASAHIRO ,  HIRANO SHUJI ,  SAEGUSA HIROSHI ,  IWATO KAORU ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F220/24 ,  C08F220/28 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/38 ,  Y10S430/108 ,  Y10S430/111

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having good pitch dependence and coverage dependence of CD and a resist pattern forming method using the same. SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit (a) having a cyano group and a group decomposing by the action of an acid to be made alkali-soluble; (B) a compound generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least either a fluorine atom or a silicon atom and a group decomposing by the action of an alkali developer to increase the solubility in an alkali developer. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供具有良好的螺距依赖性和CD的覆盖度依赖性的光化射线敏感或辐射敏感性树脂组合物和使用其的抗蚀剂图案形成方法。 光敏性或辐射敏感性树脂组合物包括：（A）通过酸作用增加在碱性显影剂中的溶解性的树脂，含有具有氰基的重复单元（a）的树脂 和通过酸的作用分解成碱溶性的基团; （B）在用光化射线或辐射照射时产生酸的化合物; 和（C）至少具有氟原子或硅原子的树脂和通过碱显影剂的作用分解的基团，以提高在碱性显影剂中的溶解度。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011118318A

公开(公告)日：2011-06-16

申请号：JP2009281058

申请日：2009-12-10

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： HIRANO SHUJI ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/10 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition allowing formation of a resist pattern, which is improved in elution of an acid, line edge roughness, reduction of development defects and scum generation, shows good followability for an immersion liquid in liquid immersion exposure, and further has various favorable performances in terms of particle suppression, a pattern profile and bubble defect prevention, and to provide a method of forming a pattern by using the actinic ray-sensitive or radiation-sensitive resin composition.
SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains: resin (A) capable of increasing the solubility with an alkali developing solution by an action of an acid; and resin (C) having at least either a fluorine atom or a silicon atom and containing repeating unit (c) having at least two polarity conversion groups.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供允许形成抗蚀剂图案的光化学射线敏感或辐射敏感性树脂组合物，其提高了酸的洗脱，线边缘粗糙度，减少显影缺陷和浮渣产生，显示出 液浸式浸渍液中的浸渍液的良好追随性，进一步在粒子抑制，图案形状和气泡缺陷防止方面具有各种有利的性能，并且提供通过使用光化射线敏感或辐射照射形成图案的方法， 敏感树脂组合物。 光敏射线敏感性或辐射敏感性树脂组合物含有：能够通过酸作用增强与碱性显影液的溶解性的树脂（A） 和至少具有氟原子或硅原子的含有至少具有两个极性转换基团的重复单元（c）的树脂（C）。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011053363A

公开(公告)日：2011-03-17

申请号：JP2009200909

申请日：2009-08-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  IIZUKA YUSUKE ,  SAEGUSA HIROSHI ,  HIRANO SHUJI ,  FUKUHARA TOSHIAKI

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition useful to form a fine pattern in semiconductor manufacturing and remarkably reducing pattern collapse, development defects, liquid immersion defects (residual water defects, bubble defects) and scum, and a pattern forming method using the same. SOLUTION: The actinic ray- or radiation-sensitive resin composition is characterized in that a receding contact angle of water at a surface of a film formed of the actinic ray- or radiation-sensitive resin composition is ≥65°, and a receding contact angle of water at a surface of the film processed with an alkali developer is ≤35°. The pattern forming method using the same is also provided. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供可用于在半导体制造中形成精细图案的光化射线或辐射敏感性树脂组合物，并且显着降低图案崩溃，显影缺陷，液浸缺陷（残留水缺陷，气泡缺陷）和 浮渣和使用其的图案形成方法。 光化射线或辐射敏感性树脂组合物的特征在于，由光化射线或辐射敏感性树脂组合物形成的膜的表面处的水的后退接触角为≥65°， 用碱性显影剂处理的膜表面的水的后退接触角≤35°。 还提供了使用该图案形成方法的图案形成方法。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011002805A

公开(公告)日：2011-01-06

申请号：JP2009281055

申请日：2009-12-10

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SAEGUSA HIROSHI ,  IWATO KAORU ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/28 ,  G03F7/004 ,  G03F7/075 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition, capable of forming a resist pattern improved in the elution of a generated acid, line edge roughness, development defects and generation of scums, less liable to profile degradation, and having proper conformability with an immersion liquid in immersion exposure, and to provide a pattern forming method that uses the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin, capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit, having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom. The pattern forming method that uses the composition is also provided.

Abstract translation: 要解决的问题：为了提供能够形成抗蚀剂图案的光化学射线敏感或辐射敏感性树脂组合物，其能够改善所产生的酸的洗脱，线边缘粗糙度，显影缺陷和浮渣的产生，不易形成轮廓退化 并且具有与浸渍曝光中的浸渍液体适当的一致性，并且提供使用该组合物的图案形成方法。解决方案：光化射线敏感或辐射敏感性树脂组合物包括：（A）能够增加 通过酸的作用在碱性显影剂中的溶解度，（B）在用光化射线或辐射照射时能够产生酸的化合物，和（C）含有（c）重复单元的树脂，其具有至少一个 极性转换基团，并且具有氟原子或硅原子中的至少一个。 还提供了使用该组合物的图案形成方法。

公开(公告)号：JP2010250063A

公开(公告)日：2010-11-04

申请号：JP2009099215

申请日：2009-04-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SUGIYAMA SHINICHI ,  HIRANO SHUJI ,  IIZUKA YUSUKE ,  IWATO KAORU ,  SAEGUSA HIROSHI

IPC: G03F7/004 ,  C08F20/26 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active ray sensitive or radiation sensitive resin composition which allows formation of a pattern having good properties of PEBS (post exposure bake sensitivity), MEEF (mask error enhancement factor), coverage dependence and bridge defects, and to provide a method for forming a pattern by using the composition. SOLUTION: The composition includes (A) a resin the solubility of which with an alkali developing solution is increased by an action of an acid, (B) a compound generating an acid by irradiation with active rays or radiation, and (C) a resin, which contains a repeating unit having a polarity converting group that is decomposed by an action of an alkali developing solution to increase the solubility with an alkali developing solution, and which contains at least either a fluorine atom or a silicon atom, wherein the composition contains as the compound (B), a compound that generates an acid expressed by general formula (I) by irradiation with active rays or radiation. In general formula (I), each Xf independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom; R 1 and R 2 each independently represent a hydrogen atom, a fluorine atom, an alkyl group or a group selected from alkyl groups substituted with at least one fluorine atom, and when a plurality of R 1 or R 2 are present, the respective groups may be identical or different from one another; L represents a divalent linking group and when a plurality of L are present, they may be identical or different from one another; A represents a group having a cyclic structure; x represents an integer of 1 to 20; y represents an integer of 0 to 10; and z represents an integer of 0 to 10. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供能够形成具有良好PEBS性质（曝光后感光度），MEEF（掩模误差增强因子），覆盖度依赖性和桥接缺陷的图案的活性射线敏感或辐射敏感性树脂组合物 并且提供通过使用该组合物形成图案的方法。 该组合物包含（A）通过酸的作用使其与碱性显影液的溶解度增加的树脂，（B）通过用活性射线或辐射照射产生酸的化合物和（C ）树脂，其含有具有通过碱显影液的作用分解的极性转换基的重复单元，以增加与碱性显影液的溶解度，并且至少含有氟原子或硅原子，其中 组合物含有化合物（B），通过用活性射线或辐射照射产生由通式（I）表示的酸的化合物。 在通式（I）中，Xf各自独立地表示氟原子或被至少一个氟原子取代的烷基; R 1 和R 2 各自独立地表示氢原子，氟原子，烷基或选自被至少一个氟原子取代的烷基的基团， 存在多个R 1 或R 2 ，各个组可以相同或不同; L表示二价连接基团，当存在多个L时，它们可以相同或不同; A表示具有环状结构的基团; x表示1〜20的整数， y表示0〜10的整数， z表示0〜10的整数。（C）2011，JPO＆INPIT

公开(公告)号：JP2009042748A

公开(公告)日：2009-02-26

申请号：JP2008180797

申请日：2008-07-10

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATO TAKAYUKI ,  SHIBUYA AKINORI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F2/38 ,  C08F220/02 ,  C08F232/06 ,  H01L21/027

CPC classification number: G03F7/0397 ,  C08F220/18 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

Abstract: PROBLEM TO BE SOLVED: To provide a positive-working resist composition which has high sensitivity and satisfies both of pattern falling and variation in line width, and a method for pattern formation.
SOLUTION: The positive-working resist composition uses a resin having a specific structure containing an acid decomposable group in its polymer main chain and having repeating units containing a plurality of specific acid decomposable groups. The method for pattern formation is also provided.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有高灵敏度并且满足图案下降和线宽的变化两者的正性抗蚀剂组合物和图案形成方法。 解决方案：正性抗蚀剂组合物使用在其聚合物主链中具有含有可酸分解基团的特定结构的树脂，并具有含有多个特定酸分解基团的重复单元。 还提供了图案形成的方法。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2013082648A

公开(公告)日：2013-05-09

申请号：JP2011222654

申请日：2011-10-07

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  OBAYASHI TATSUHIKO ,  MOROOKA NAOYUKI ,  IKEDA MORIHITO ,  TOKUOKA SHINSUKE

IPC: C07D251/34 ,  C08F236/02 ,  H01L33/56

CPC classification number: H01L2224/48091 ,  H01L2224/73265 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/00012

Abstract: PROBLEM TO BE SOLVED: To provide a method for refining isocyanurate compound capable of efficiently enhancing the concentration of a bifunctional isocyanurate compound useful as a sealant for a semiconductor light-emitting device in particular, to be independent of a complicated operation or time-consuming treatment, and to provide a method for producing sealant for the semiconductor light-emitting device using the method for refining isocyanurate compound, and also to provide a sealant for the semiconductor light-emitting device, a seal material for light semiconductor, and a light semiconductor element.SOLUTION: The method for producing the sealant for semiconductor light-emitting device containing isocyanurate compound includes treatment which enhances the mixing ratio of the compound represented by formula (II) for a raw material mixture containing a compound represented by the formula (II), a compound represented by formula (I) and a compound represented by formula (III) by undergoing at least a specific extraction process.

Abstract translation: 解决的问题：提供一种能够有效提高用作半导体发光装置的密封剂的双官能异氰脲酸酯化合物的浓度的异氰脲酸酯化合物的方法，特别是独立于复杂的操作或时间 并且提供一种使用精制异氰脲酸酯化合物的方法制造半导体发光装置的密封剂的方法，并且还提供用于半导体发光器件的密封剂，用于光半导体的密封材料和 光半导体元件。 解决方案：含有异氰脲酸酯化合物的半导体发光元件密封剂的制造方法包括提高由式（II）表示的化合物与含有式（II）表示的化合物的原料混合物的混合比的处理 ），由式（I）表示的化合物和通式（III）表示的化合物，通过至少进行特定的提取方法。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012093733A

公开(公告)日：2012-05-17

申请号：JP2011210645

申请日：2011-09-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMAMOTO KEI ,  IIZUKA YUSUKE ,  SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI

IPC: G03F7/004 ,  C07C309/17 ,  C07C381/12 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027

CPC classification number: G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  Y10T428/24835

Abstract: PROBLEM TO BE SOLVED: To provide a resist composition capable of reducing a watermark defect and forming an excellently shaped resist pattern, and to provide a resist film using the same and a patterning method.SOLUTION: A resist composition contains: (A) a resin that dissolves by an action of acid whose solubility in an alkaline developer increases; an onium salt that is a compound generating acid by irradiation of activated ray or radioactive ray and that includes the general formula (I), or a bis (alkylsulfonyl) imide anion and a tris (alkylsulfonyl) methide anion; (C) a resin that includes at least one of a fluorine atom and a silicon atom; and a combined solvent that includes a first solvent and a second solvent at least one of which has a standard boiling point of 200°C or higher.

Abstract translation: 要解决的问题：提供能够减少水印缺陷并形成优异的抗蚀剂图案的抗蚀剂组合物，并提供使用其的抗蚀剂膜和图案化方法。 抗蚀剂组合物包含：（A）通过酸在碱性显影剂中的溶解度增加而溶解的树脂; 作为通过激活射线或放射线照射产生酸的化合物的鎓盐，其包含通式（I）或双（烷基磺酰基）酰亚胺阴离子和三（烷基磺酰基）甲基化阴离子; （C）包含氟原子和硅原子中的至少一个的树脂; 以及包含第一溶剂和第二溶剂的组合溶剂，其中至少一种具有200℃或更高的标准沸点。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012073508A

公开(公告)日：2012-04-12

申请号：JP2010219515

申请日：2010-09-29

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMAGUCHI SHUHEI ,  SHIBUYA AKINORI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F212/14 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/004 ,  C08F12/20 ,  C08F12/22 ,  C08F12/26 ,  C08F12/30 ,  C08F212/12 ,  C08F212/14 ,  C08F220/42 ,  C08F2220/281 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  Y10S430/108 ,  C08F2220/1858 ,  C08F220/30 ,  C08F2220/1891

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which reduces generation of development defects and scum and can form a pattern excellent in followability to immersion liquid during liquid immersion exposure, an actinic ray-sensitive or radiation-sensitive film formed from the composition, and a pattern formation method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition includes (A) a compound which generates an acid upon exposure to actinic rays or radiation, (B) a resin of which solution rate in an alkali developer increases by an action of acid, and (C) a hydrophobic resin which contains a repeating unit derived from a monomer represented by the following general formula (1). (Each symbol in the formula represents meaning described in claims).

Abstract translation: 要解决的问题：提供光化学射线敏感或辐射敏感性树脂组合物，其减少显影缺陷和浮渣的产生，并且可以在液浸暴露期间形成对浸液的随动性优异的图案，光化学射线敏感 或由该组合物形成的辐射敏感膜，以及使用该组合物的图案形成方法。 光敏性或辐射敏感性树脂组合物包含（A）在暴露于光化射线或辐射时产生酸的化合物，（B）在碱显影剂中溶液速率增加的树脂 酸的作用，（C）含有由下述通式（1）表示的单体衍生的重复单元的疏水性树脂。 （公式中的每个符号表示权利要求中描述的含义）。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011215413A

公开(公告)日：2011-10-27

申请号：JP2010084198

申请日：2010-03-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  KOSHIJIMA KOSUKE

IPC: G03F7/039 ,  C08L101/02 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which is improved in developability and enables to form a pattern having good conformability to an immersion liquid in liquid immersion exposure, and a pattern forming method using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes a resin (B) which includes at least either a fluorine atom or a silicon atom and has a repeating unit having a group represented by general formula (1) and at least one repeating unit having one group selected from the group of the following (x) to (z), wherein a single content of the repeating unit having one group selected from the group of the following (x) to (z) is ≥45 mol% relative to all repeating units in the resin: (x) an alkali-soluble group, (y) a group which is decomposed by the action of an alkali developer to thereby exhibit increased solubility in the alkali developer, and (z) a group which is decomposed by the action of an acid to thereby exhibit increased solubility in an alkali developer.

Abstract translation: 要解决的问题：提供可显影性提高的光化射线敏感性或辐射敏感性树脂组合物，并且能够形成在液浸曝光中浸渍液具有良好贴合性的图案，以及使用该组合物的图案形成方法。 解决方案：光化射线敏感或辐射敏感性树脂组合物包括包含至少一个氟原子或硅原子的树脂（B），并且具有由通式（1）表示的基团的重复单元和至少一个 具有选自下述（x）〜（z）中的一个基团的重复单元，其中，具有选自下述（x）〜（z）中的一个基团的重复单元的单一含量为≥45摩尔％ 相对于树脂中的所有重复单元：（x）碱溶性基团，（y）通过碱显影剂的作用而分解，从而在碱显影剂中表现出增加的溶解度的基团，和（z） 是 通过酸的作用分解，从而在碱性显影剂中表现出增加的溶解度。