Abstract:
PROBLEM TO BE SOLVED: To provide a coloring composition and a colored radiation-sensitive composition, suppressing elution of colorant during development, infiltration or color migration of colorant, and development residues and allowing formation of a colored film having excellent roughness (color irregularity).SOLUTION: The coloring composition contains a dye polymer, which is produced by drop-wise polymerization where 15-70 mass% of the total dye monomers required for synthesizing dye polymers is blended and the rest is dropped thereto, which satisfies a formula (1), where the content (mol%) of the structural unit represented by a general formula (A2) is (a2) and the content of the structural unit represented by a general formula (A1) is (a1), and which contains the dye polymer containing an alkali-soluble group in the molecule. In the formula, Xand Xdenote a linking group formed by polymerization; Land Ldenote a single bond or a divalent linking group; Dye denotes a dye residue in which one optional hydrogen atom is removed from a dye compound; and R denotes a monovalent substituent including a partial structure having a hydrogen atom, an alkyl group or the like. Formula (1): (a2)/(a1)≥0.3.
Abstract:
PROBLEM TO BE SOLVED: To provide a method for inexpensively producing an acid halide having a leaving group and a bulky group with high accuracy in selectiveness.SOLUTION: The production method of the acid halide includes a process for obtaining a compound expressed by a general formula (II) by making a compound expressed by a general formula (III) and the acid halide react with each other, and expressed by a general formula (I) by making a compound expressed by the general formula (II) and an acid halide agent react with each other. In the general formula (I), A denotes a bivalent coupling group which is obtained by extracting one atom from a univalent substituent whose Es' value being a three-dimensional parameter is not smaller than 1.5, and Xdenotes a halogen atom. Ldenotes the leaving group. In the general formula (II), A and Lare synonymous with A and Lin the general formula (I), respectively. In the general formula (III), A and Lare synonymous with A and Lin the general formula (I), respectively.
Abstract:
PROBLEM TO BE SOLVED: To provide a color composition for a color filter enabling a high-contrast colored image to be formed using a dye.SOLUTION: The color composition for the color filter includes the dye and a compound represented by a following general formula (I) (in which each of R-Rrepresents an alkyl group having 1-20 carbon atoms, an alkoxy group having 1-20 carbon atoms, an alkenyl group having 2-20 carbon atoms, a nitro group, a sulfamoyl group, a N-substituted sulfamoyl group, an alkoxycarbonyl group having 1-20 carbon atoms, an alkylsulfonyl group having 1-20 carbon atoms, -NRaRb or a hydrogen atom; and each of Ra and Rb represents an alkyl group having 1-20 carbon atoms, an alkoxy group having 1-20 carbon atoms, an alkenyl group having 2-20 carbon atoms, a nitro group, a sulfamoyl group, a N-substituted sulfamoyl group, an alkoxycarbonyl group having 1-20 carbon atoms, an alkylsulfonyl group having 1-20 carbon atoms or a hydrogen atom).
Abstract translation:要解决的问题:提供一种能够使用染料形成高对比度彩色图像的滤色器的颜色组合物。 滤色器的颜色组合物包括染料和由以下通式(I)表示的化合物(其中R 1 SP> -R 表示具有1-20个碳原子的烷基,具有1-20个碳原子的烷氧基,具有2-20个碳原子的烯基,硝基,氨磺酰基, N-取代氨磺酰基,具有1-20个碳原子的烷氧基羰基,具有1-20个碳原子的烷基磺酰基,-NR a R b或氢原子; R a和R b各自表示具有1-20个碳原子的烷基 ,具有1-20个碳原子的烷氧基,具有2-20个碳原子的烯基,硝基,氨磺酰基,N-取代的氨磺酰基,具有1-20个碳原子的烷氧基羰基,烷基磺酰基具有 1-20个碳原子或氢原子)。 版权所有(C)2012,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a color filter that can improve white luminance while maintaining chromaticity of red (R), green (G), and blue (B) and chromaticity of white equivalent to those of prior arts, and an electronic display apparatus using the color filter.SOLUTION: The color filter includes at least a red (R) pixel, a green (G) pixel, and a blue (B) pixel. At least one of the red (R) pixel, the green (G) pixel, and the blue (B) pixel includes at least one or more pigments and at least one or more dye, and a pixel area of each of the colors is not identical to each other. It is preferable that a pixel area of a pixel with a pigment and a dye is smaller than the pixel area of a pixel without a dye.
Abstract:
PROBLEM TO BE SOLVED: To provide a colored curable composition capable of forming a coloring pattern with suppressed color bleeding. SOLUTION: The colored curable composition comprises a phthalocyanine-based pigment, a dye multimer including a polymerizable group and a group derived from a dipyrromethene dye, a polymerization initiator, a polymerizable compound, and a solvent. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a pigment dispersion which is superior in dispersibility and dispersion stability of a pigment and forms a coating film having a high color value and superior heat resistance and light resistance, and to provide a coloring curable composition which is obtained by using the pigment dispersion, has superior pattern formability, and forms a cured film having a high color value and superior heat resistance and light resistance. SOLUTION: The pigment dispersion contains (A) a pigment dispersing agent having a dye skeleton, (B) a pigment, and (C) a solvent. In the pigment dispersion, a difference between the maximum absorption wavelength of the pigment dispersing agent (A) having a dye skeleton and the maximum absorption wavelength of the pigment (B) is ≤200 nm. The coloring curable composition contains the pigment dispersion, (E) a photopolymerization initiator, and (F) a polymerizable compound. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a colored curable composition that includes a high dyestuff concentration (preferably larger than 35 mass%) and is excellent in color density and purity. SOLUTION: This is a colored curable composition containing a diopyrromethane system metal complex compound obtained by using a compound expressed by general formula (1) and a metal or metal compound, or its tautomer. R 1 : H, halogen atom, alkyl group, alkoxy group, amino group, monoalkyl amino group, dialkylamino group, NO 2 group, CF 3 group, hydroxy group. m=0-3. A 1 : remaining groups obtained by removing at least one hydrogen atom from the compounds R 2 -R 8 expressed by general formula (2). R 2 -R 7 : H, substitution group. R 8 : H, halogen atom, alkyl group, aryl group, heterocycle ring group. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a pattern forming method showing excellence in reduction of bridge defects and restrained in generation of particles in forming a fine pattern with a line width of 50 nm or less by a developing method using an organic developing solution, and to provide an actinic ray-sensitive or radiation-sensitive resin composition used for the method, a resist film, a method for manufacturing an electronic device, and an electronic device.SOLUTION: The pattern forming method includes steps of: (i) forming a film of an actinic ray-sensitive or radiation-sensitive resin composition; (ii) exposing the film; and (iii) developing the film by using a developing solution containing an organic solvent to form a negative pattern. The actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin showing an increase in the polarity by an action of an acid to decrease the solubility with a developing solution containing an organic solvent, (B) a compound that generates an acid by irradiation with actinic rays or radiation, (C) a solvent, and (D) a resin having a structural unit including a fluorine atom but no CFmoiety structure.
Abstract:
PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition excellent in DOF and pattern roughness characteristics such as LWR without much deterioration in performance over time; an actinic ray-sensitive or radiation-sensitive film and a pattern formation method which use the composition; and an electronic device manufacturing method and an electronic device.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin whose solubility in an alkaline developer is increased by the action of an acid, (B) a compound which is represented by the specified general formula (1) and generates an acid upon exposure to an actinic ray or radiation, and (C) a low molecular weight compound having on a nitrogen atom a group leaving by the action of an acid. (The meaning of each symbol in the formula is described in the claims.)
Abstract:
PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that allows formation of a pattern, upon forming a fine pattern, with excellent uniformity in a local pattern dimension and exposure latitude while reducing generation of scum and residual water defects, and to provide a pattern forming method, a resist film, a method for manufacturing an electronic device, and an electronic device using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises: (A) a resin having a repeating unit expressed by general formula (I); (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) a resin having at least one repeating unit (x) in a repeating unit expressed by general formula (II) and a repeating unit expressed by general formula (III), in which the content of the repeating unit (x) is 90 mol% or more with respect to the whole repeating units in the resin (C).